会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Process for forming magnetic memory structures
    • 用于形成磁记忆体结构的方法
    • US07267997B1
    • 2007-09-11
    • US11118828
    • 2005-04-29
    • Manish SharmaLung Tran
    • Manish SharmaLung Tran
    • H01L21/00
    • H01L43/12B82Y25/00H01F10/3254H01F10/3281H01F41/32
    • An exemplary method for making a memory structure comprises forming a first ferromagnetic layer, forming a spacer layer above the first ferromagnetic layer, forming a second ferromagnetic layer above the spacer layer by applying a first deposition process to form a thin layer of ferromagnetic material substantially covering the spacer layer, the first layer being formed at a first energy level, and applying a second deposition process to form the remainder of the second ferromagnetic layer above the thin layer of ferromagnetic material, the second ferromagnetic layer being formed at a second energy level, higher than the first energy level. This way, the spacer layer is protected by the thin layer during the second energy level deposition.
    • 用于制造存储器结构的示例性方法包括形成第一铁磁层,在第一铁磁层之上形成间隔层,通过施加第一沉积工艺形成基本覆盖的铁磁材料的薄层,在间隔层上方形成第二铁磁层 所述间隔层,所述第一层以第一能级形成,并且施加第二沉积工艺以在所述铁磁材料的薄层之上形成所述第二铁磁层的其余部分,所述第二铁磁层形成在第二能级, 高于第一能级。 这样,间隔层在第二能级沉积期间被薄层保护。