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    • 4. 发明授权
    • Stereo-based visual odometry method and system
    • 立体视觉测距法和系统
    • US07925049B2
    • 2011-04-12
    • US11833498
    • 2007-08-03
    • Zhiwei ZhuTaragay OskiperOleg NaroditskySupun SamarasekeraHarpreet Singh SawhneyRakesh Kumar
    • Zhiwei ZhuTaragay OskiperOleg NaroditskySupun SamarasekeraHarpreet Singh SawhneyRakesh Kumar
    • G06F9/00
    • G06K9/32G06K2209/40G06T7/248G06T7/593G06T7/74G06T2207/10021G06T2207/20164G06T2207/30212G06T2207/30252
    • A method for estimating pose from a sequence of images, which includes the steps of detecting at least three feature points in both the left image and right image of a first pair of stereo images at a first point in time; matching the at least three feature points in the left image to the at least three feature points in the right image to obtain at least three two-dimensional feature correspondences; calculating the three-dimensional coordinates of the at least three two-dimensional feature correspondences to obtain at least three three-dimensional reference feature points; tracking the at least three feature points in one of the left image and right image of a second pair of stereo images at a second point in time different from the first point in time to obtain at least three two-dimensional reference feature points; and calculating a pose based on the at least three three-dimensional reference feature points and its corresponding two-dimensional reference feature points in the stereo images. The pose is found by minimizing projection residuals of a set of three-dimensional reference feature points in an image plane.
    • 一种用于从图像序列估计姿态的方法,其包括以下步骤:在第一时间点检测第一对立体图像的左图像和右图像中的至少三个特征点; 将左图像中的至少三个特征点与右图像中的至少三个特征点匹配以获得至少三个二维特征对应; 计算所述至少三个二维特征对应的三维坐标以获得至少三个三维参考特征点; 在与第一时间点不同的第二时间点跟踪第二对立体图像的左图像和右图像之一中的至少三个特征点,以获得至少三个二维参考特征点; 以及基于立体图像中的至少三个三维参考特征点及其对应的二维参考特征点来计算姿势。 通过使图像平面中的一组三维参考特征点的投影残差最小化来发现该姿势。
    • 6. 发明申请
    • Stereo-Based Visual Odometry Method and System
    • 立体声视觉测距法和系统
    • US20080144925A1
    • 2008-06-19
    • US11833498
    • 2007-08-03
    • Zhiwei ZhuTaragay OskiperOleg NaroditskySupun SamarasekeraHarpreet Singh SawhneyRakesh Kumar
    • Zhiwei ZhuTaragay OskiperOleg NaroditskySupun SamarasekeraHarpreet Singh SawhneyRakesh Kumar
    • G06K9/00
    • G06K9/32G06K2209/40G06T7/248G06T7/593G06T7/74G06T2207/10021G06T2207/20164G06T2207/30212G06T2207/30252
    • A method for estimating pose from a sequence of images, which includes the steps of detecting at least three feature points in both the left image and right image of a first pair of stereo images at a first point in time; matching the at least three feature points in the left image to the at least three feature points in the right image to obtain at least three two-dimensional feature correspondences; calculating the three-dimensional coordinates of the at least three two-dimensional feature correspondences to obtain at least three three-dimensional reference feature points; tracking the at least three feature points in one of the left image and right image of a second pair of stereo images at a second point in time different from the first point in time to obtain at least three two-dimensional reference feature points; and calculating a pose based on the at least three three-dimensional reference feature points and its corresponding two-dimensional reference feature points in the stereo images. The pose is found by minimizing projection residuals of a set of three-dimensional reference feature points in an image plane.
    • 一种用于从图像序列估计姿态的方法,其包括以下步骤:在第一时间点检测第一对立体图像的左图像和右图像中的至少三个特征点; 将左图像中的至少三个特征点与右图像中的至少三个特征点匹配以获得至少三个二维特征对应; 计算所述至少三个二维特征对应的三维坐标以获得至少三个三维参考特征点; 在与第一时间点不同的第二时间点跟踪第二对立体图像的左图像和右图像之一中的至少三个特征点,以获得至少三个二维参考特征点; 以及基于立体图像中的至少三个三维参考特征点及其对应的二维参考特征点来计算姿势。 通过使图像平面中的一组三维参考特征点的投影残差最小化来发现该姿势。
    • 8. 发明授权
    • Schottky junction source/drain transistor and method of making
    • 肖特基结源极/漏极晶体管及其制造方法
    • US08697529B2
    • 2014-04-15
    • US13508731
    • 2011-09-28
    • Dongping WuJun LuoYinghua PiaoZhiwei ZhuShili ZhangWei Zhang
    • Dongping WuJun LuoYinghua PiaoZhiwei ZhuShili ZhangWei Zhang
    • H01L21/336H01L21/338
    • H01L29/7839H01L29/6653H01L29/66848
    • A method of making a transistor, comprising: providing a semiconductor substrate; forming a gate stack over the semiconductor substrate; forming an insulating layer over the semiconductor substrate; forming a depleting layer over the insulating layer; etching the depleting layer and the insulating layer; forming a metal layer over the semiconductor substrate; performing thermal annealing; and removing the metal layer. As advantages of the present invention, an upper outside part of each of the sidewalls include a material that can react with the metal layer, so that metal on two sides of the sidewalls is absorbed during the annealing process, preventing the metal from diffusing toward the semiconductor layer, and ensuring that the formed Schottky junctions can be ultra-thin and uniform, and have controllable and suppressed lateral growth.
    • 一种制造晶体管的方法,包括:提供半导体衬底; 在所述半导体衬底上形成栅叠层; 在半导体衬底上形成绝缘层; 在绝缘层上形成耗尽层; 蚀刻耗尽层和绝缘层; 在所述半导体衬底上形成金属层; 进行热退火; 并去除金属层。 作为本发明的优点,每个侧壁的上部外侧部分包括能够与金属层反应的材料,从而在退火过程中吸收侧壁两侧的金属,从而防止金属朝向 半导体层,并且确保形成的肖特基结可以是超薄和均匀的,并且具有可控和抑制的横向生长。