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    • 2. 发明申请
    • Process for producing benzofuran derivative
    • 苯并呋喃衍生物的制备方法
    • US20060142598A1
    • 2006-06-29
    • US11359023
    • 2006-02-22
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • C07D493/00
    • C07D307/79Y02P20/55
    • A novel process for efficiently and easily producing a compound represented by the formula: wherein ring A is a benzene ring that may be optionally further substituted in addition to the group represented by W, or a salt thereof; which comprises reacting a compound represented by the formula: wherein R1 and R2 are the same or different and each is a hydrogen atom, an optionally substituted hydrocarbon group or an optionally substituted heterocyclic group, Y is a halogen atom, ring A is a benzene ring that may be optionally further substituted in addition to the group represented by Y and ring B is an optionally substituted benzene ring, or a salt thereof, with a compound represented by the formula: WH wherein W is wherein ring C is an optionally substituted benzene ring, ring D is an optionally substituted 5- to 7-membered nitrogen-containing heterocyclic ring, R3 is a hydrogen atom, an aliphatic hydrocarbon group containing an aromatic group or an acyl group, and R4 is a hydrogen atom, an optionally substituted hydrocarbon group or an acyl group, or a salt thereof and thereafter, if necessary, deprotecting the resultant product, which is suitable for industrial production.
    • 一种用于有效且容易地制备由下式表示的化合物的新方法:其中环A是可以任选进一步被W代表的基团进一步取代的苯环或其盐; 其包括使下式表示的化合物:其中R 1和R 2彼此相同或不同,并且各自为氢原子,任选取代的烃基或任选地 取代的杂环基,Y是卤素原子,环A是可以任选地进一步被Y代表的基团进一步取代的苯环,并且环B是任选取代的苯环或其盐与由 式中W为W,其中环C为任选取代的苯环,环D为任选取代的5至7元含氮杂环,R 3为氢原子, 含有芳基或酰基的脂族烃基,R 4为氢原子,任选取代的烃基或酰基,或其盐,然后如果需要,将所得物 产品,适用于工业产品 说明。
    • 5. 发明授权
    • Process for producing benzofuran derivative
    • 苯并呋喃衍生物的制备方法
    • US07034166B2
    • 2006-04-25
    • US10483089
    • 2002-07-11
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • C07D307/79C07C49/76C07C43/23
    • C07D307/79Y02P20/55
    • A novel process for efficiently and easily producing a compound represented by the formula: wherein ring A is a benzene ring that may be optionally further substituted in addition to the group represented by W, or a salt thereof; which comprises reacting a compound represented by the formula: wherein R1 and R2 are the same or different and each is a hydrogen atom, an optionally substituted hydrocarbon group or an optionally substituted heterocyclic group, Y is a halogen atom, ring A is a benzene ring that may be optionally further substituted in addition to the group represented by Y and ring B is an optionally substituted benzene ring, or a salt thereof, with a compound represented by the formula: WH wherein W is wherein ring C is an optionally substituted benzene ring, ring D is an optionally substituted 5- to 7-membered nitrogen-containing heterocyclic ring, R3 is a hydrogen atom, an aliphatic hydrocarbon group containing an aromatic group or an acyl group, and R4 is a hydrogen atom, an optionally substituted hydrocarbon group or an acyl group, or a salt thereof and thereafter, if necessary, deprotecting the resultant product, which is suitable for industrial production.
    • 一种用于有效且容易地制备由下式表示的化合物的新方法:其中环A是可以任选进一步被W代表的基团进一步取代的苯环或其盐; 其包括使下式表示的化合物:其中R 1和R 2彼此相同或不同,并且各自为氢原子,任选取代的烃基或任选地 取代的杂环基,Y是卤素原子,环A是可以任选地进一步被Y代表的基团进一步取代的苯环,并且环B是任选取代的苯环或其盐与由 公式:<?in-line-formula description =“In-line Formulas”end =“lead”?> WH <?in-line-formula description =“In-line Formulas”end =“tail”?>其中W 其中环C是任选取代的苯环,环D是任选取代的5-至7-元含氮杂环,R 3是氢原子,含有芳族的脂族烃基 基团或酰基,R 4是氢原子,任选取代的烃基或酰基 ,或其盐,此后,如果需要,将所得产物脱保护,其适用于工业生产。
    • 9. 发明授权
    • Process for producing benzofuran derivative
    • 苯并呋喃衍生物的制备方法
    • US07323577B2
    • 2008-01-29
    • US11359023
    • 2006-02-22
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • Hiroyuki TawadaMakoto YamashitaYujiro Ono
    • C07D493/00
    • C07D307/79Y02P20/55
    • A novel process for efficiently and easily producing a compound represented by the formula: wherein ring A is a benzene ring that may be optionally further substituted in addition to the group represented by W, or a salt thereof; which comprises reacting a compound represented by the formula: wherein R1 and R2 are the same or different and each is a hydrogen atom, an optionally substituted hydrocarbon group or an optionally substituted heterocyclic group, Y is a halogen atom, ring A is a benzene ring that may be optionally further substituted in addition to the group represented by Y and ring B is an optionally substituted benzene ring, or a salt thereof, with a compound represented by the formula: WH wherein W is wherein ring C is an optionally substituted benzene ring, ring D is an optionally substituted 5- to 7-membered nitrogen-containing heterocyclic ring, R3 is a hydrogen atom, an aliphatic hydrocarbon group containing an aromatic group or an acyl group, and R4 is a hydrogen atom, an optionally substituted hydrocarbon group or an acyl group, or a salt thereof and thereafter, if necessary, deprotecting the resultant product, which is suitable for industrial production.
    • 一种用于有效且容易地制备由下式表示的化合物的新方法:其中环A是可以任选进一步被W代表的基团进一步取代的苯环或其盐; 其包括使下式表示的化合物:其中R 1和R 2彼此相同或不同,并且各自为氢原子,任选取代的烃基或任选地 取代的杂环基,Y是卤素原子,环A是可以任选地进一步被Y代表的基团进一步取代的苯环,并且环B是任选取代的苯环或其盐与由 公式:<?in-line-formula description =“In-line Formulas”end =“lead”?> WH <?in-line-formula description =“In-line Formulas”end =“tail”?>其中W 其中环C是任选取代的苯环,环D是任选取代的5-至7-元含氮杂环,R 3是氢原子,含有芳族的脂族烃基 基团或酰基,R 4是氢原子,任选取代的烃基或酰基 ,或其盐,此后,如果需要,将所得产物脱保护,其适用于工业生产。