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1. 发明授权

US07827779B1 Liquid metal ion thruster array 有权
标题翻译：液态金属离子推进器阵列
公开(公告)号：US07827779B1
公开(公告)日：2010-11-09
申请号：US11900372
申请日：2007-09-10
申请人： Mahadevan Krishnan , Kristi Wilson , Kelan Champagne , Jason D. Wright , Andrew N. Gerhan
发明人： Mahadevan Krishnan , Kristi Wilson , Kelan Champagne , Jason D. Wright , Andrew N. Gerhan
IPC分类号： F03H1/00
CPC分类号： F03H1/0012 , F03H1/0037 , H01J27/26
摘要： A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.
摘要翻译：一种液体金属离子推进器（LMIT）具有一个具有多个基座的基板，底座的一端连接到该基板上，并且底座的相对端具有尖端，该基座具有凹槽，该基板还具有连接到彼此和液态金属的来源。平行于基板并且在基座尖端上方设置的提取器电极提供足以加速离子从基座的尖端通过提取器电极的静电引出场。具有匹配孔的一系列聚焦电极提供基本上平行的离子轨迹的流动，并且可选的负离子源提供电荷中和以防止离开的加速离子的空间电荷扩展。该组件适用于为卫星提供推力，同时保持高的运行效率。

2. 发明授权

US08038858B1 Coaxial plasma arc vapor deposition apparatus and method 有权
标题翻译：同轴等离子体电弧蒸镀装置及方法
公开(公告)号：US08038858B1
公开(公告)日：2011-10-18
申请号：US11268167
申请日：2005-11-07
申请人： Brian L. Bures , Jason D. Wright , Michael Y. Au , Andrew N. Gerhan , Mahadevan Krishnan
发明人： Brian L. Bures , Jason D. Wright , Michael Y. Au , Andrew N. Gerhan , Mahadevan Krishnan
IPC分类号： C23C14/54
CPC分类号： C23C14/046 , C23C14/0635 , C23C14/325 , H01J37/32055 , H01J37/32614 , H01J37/34
摘要： An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.
摘要翻译：用于沉积等离子体反应膜的装置包括用于沉积薄膜或厚膜的衬底。衬底还允许粘附到衬底上的膜沉积，以及沉积后可以去除的膜。阴极可以由单独的导线制造，或者可以由单个导体制造。可以在多孔阴极和沉积表面之间引入优先捕获较大颗粒的宏粒子过滤器。宏粒子滤波器还可以承载用于产生磁场的电流，使得洛伦兹力优先作用于电离粒子，允许它们在捕获不受磁场影响的大颗粒的同时通过过滤器。

3. 发明授权

US07867366B1 Coaxial plasma arc vapor deposition apparatus and method 有权
标题翻译：同轴等离子体电弧蒸镀装置及方法
公开(公告)号：US07867366B1
公开(公告)日：2011-01-11
申请号：US10834592
申请日：2004-04-28
申请人： Michael D. McFarland , Mahadevan Krishnan , Jason D. Wright , Andrew N. Gerhan , Benjamin Tang
发明人： Michael D. McFarland , Mahadevan Krishnan , Jason D. Wright , Andrew N. Gerhan , Benjamin Tang
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： C23C14/325 , C23C14/046 , C23C14/0635 , H01J37/32055 , H01J37/32614
摘要： An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.
摘要翻译：用于将可变厚度涂层沉积到圆柱形管内部的装置包括可变压力气体，同轴位于气缸内的阴极和施加在阴极和圆柱形管之间的电压源，其用作阳极。在圆柱体的起点处，在阳极和阴极之间产生径向等离子弧，等离子体电弧沿着圆柱体的中心轴向下移动，在气缸的内侧提供螺旋形沉积区域。选择阴极材料和气体的组合使得等离子体能够产生在等离子体区域中沉积在阳极圆柱体上的离子材料。通过改变每个螺旋路径的可变压力气体的压力，可以改变该沉积膜的组成。

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