专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07292310B2 Lithographic apparatus and a device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07292310B2
公开(公告)日：2007-11-06
申请号：US10882671
申请日：2004-07-02
申请人： Maarten Constant Bernhard Dekker , Edwin Eduard Nicolaas Josephus Krijnen
发明人： Maarten Constant Bernhard Dekker , Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70833
摘要： A lithographic apparatus and device manufacturing method are disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes a shaft having a first threaded section and a second threaded section. The first threaded section and the second threaded section have different pitches.
摘要翻译：公开了一种光刻设备和设备的制造方法。该装置包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于使辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于将装置的第一部分紧固到装置的第二部分的至少一个紧固件。紧固件包括具有第一螺纹部分和第二螺纹部分的轴。第一螺纹部分和第二螺纹部分具有不同的间距。

2. 发明授权

US07280228B2 System and method of measurement, system and method of alignment, lithographic apparatus and method 有权
标题翻译：系统和测量方法，系统和对准方法，光刻设备和方法
公开(公告)号：US07280228B2
公开(公告)日：2007-10-09
申请号：US10882685
申请日：2004-07-02
申请人： Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Jeroen Thomas Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Josephus Krijnen , Robbert Edgar Van Leeuwen , Roeland Nicolaas Maria Vanneer , Cornelis Christiaan Ottens
发明人： Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Jeroen Thomas Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Josephus Krijnen , Robbert Edgar Van Leeuwen , Roeland Nicolaas Maria Vanneer , Cornelis Christiaan Ottens
IPC分类号： G01B11/14
CPC分类号： G03F9/7088 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F9/7015 , G03F9/7096 , H01L21/682
摘要： A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
摘要翻译：光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。电气部件被配置为散热。光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。在第一框架和第二框架之间设置光耦合器。

3. 发明申请

US20080100816A1 Lithographic apparatus and method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20080100816A1
公开(公告)日：2008-05-01
申请号：US11589990
申请日：2006-10-31
申请人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
发明人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： G03B27/80
CPC分类号： G03B27/522 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.
摘要翻译：公开了一种用于光刻设备的照明器，所述照明器包括能够改变入射照射光束的角度强度分布的独立可控反射元件的阵列，其中所述独立可控反射元件阵列设置在弯曲的支撑结构上，或者可单独控制的反射元件的阵列被布置成用作弯曲的反射表面。

4. 发明授权

US07352472B2 Lithographic apparatus, device manufacturing method, and method for determining z-displacement 有权
标题翻译：光刻设备，器件制造方法和用于确定z-位移的方法
公开(公告)号：US07352472B2
公开(公告)日：2008-04-01
申请号：US10779864
申请日：2004-02-18
申请人： Edwin Eduard Nicolaas Josephus Krijnen
发明人： Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： G01B11/14
CPC分类号： G03F7/70775
摘要： The present invention provides an apparatus and method for determining displacement along the z-direction of an object, which is fixed in a holder of an apparatus and is illuminated by a beam of radiation, the beam being provided by the apparatus and having an optical axis extending in the z-direction. The method comprises arranging the measuring mirror(s) and/or measuring laser beam of an interferometer system such that no relevant part of the laser beam is parallel to the z-direction. This ensures that the interferometer system and its parts may be arranged away from the beam of radiation, allowing larger diameter projection systems for the beam of radiation, as well as more homogeneous air showers around the object. Thus the quality of the illumination of the object may be improved.
摘要翻译：本发明提供了一种用于确定沿着物体的z方向的位移的装置和方法，该装置和方法固定在设备的保持器中并且被辐射束照射，该光束由该设备提供并具有光轴在z方向上延伸。该方法包括布置测量镜和/或测量干涉仪系统的激光束，使得激光束的相关部分不与z方向平行。这确保干涉仪系统及其部件可以远离辐射束布置，允许用于辐射束的更大直径的投影系统以及围绕物体的更均匀的空气淋浴。因此，可以提高对象的照明质量。

5. 发明授权

US07315032B2 Lithographic apparatus and a device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07315032B2
公开(公告)日：2008-01-01
申请号：US10847660
申请日：2004-05-18
申请人： Edwin Eduard Nicolaas Josephus Krijnen
发明人： Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： A01J5/00
CPC分类号： G03F7/70825
摘要： A lithographic apparatus including an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; at least one mounting bracket configured to couple a second part of the apparatus to a first part thereof, the mounting bracket including a first rigid part, a second rigid part, and an elastic part connecting the first and second rigid parts, wherein a fixing mechanism is provided to fix the positions of the first rigid part and the second rigid part with respect to each other, the elastic part being less rigid than each of the rigid bracket parts, and the fixing mechanism is configured to couple the first and second rigid parts of the mounting bracket substantially by form fixation.
摘要翻译：一种光刻设备，包括配置成提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案化构造成使得所述投影光束在其横截面中具有图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 至少一个安装支架，其被配置为将所述装置的第二部分耦合到其第一部分，所述安装支架包括第一刚性部分，第二刚性部分和连接所述第一和第二刚性部分的弹性部分，其中固定机构提供固定第一刚性部分和第二刚性部分相对于彼此的位置，弹性部分比每个刚性支架部分刚性小，并且固定机构构造成将第一和第二刚性部件大体上通过形式固定安装支架。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式