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1. 发明申请

US20140096715A1 Apparatus for filtration and gas-vapor mixing in thin film deposition 审中-公开
标题翻译：薄膜沉积过滤和气 - 气混合装置
公开(公告)号：US20140096715A1
公开(公告)日：2014-04-10
申请号：US14107718
申请日：2013-12-16
申请人： MSP Corporation
发明人： Benjamin Y.H. Liu , Yamin Ma , Thuc Dinh
IPC分类号： B01D46/00 , F22B1/28 , C23C16/44
CPC分类号： B01D46/0027 , C23C16/4402 , F22B1/28
摘要： An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.
摘要翻译：一种装置从气体/蒸汽混合物中除去颗粒，同时改善气体/蒸气混合物的均匀性，以产生用于薄膜沉积和半导体器件制造的更均匀混合的混合物流。

2. 发明申请

US20130292485A1 Fine droplet atomizer for liquid precursor vaporization 有权
标题翻译：用于液体前体蒸发的细微雾化器
公开(公告)号：US20130292485A1
公开(公告)日：2013-11-07
申请号：US13937996
申请日：2013-07-09
申请人： MSP Corporation
发明人： Benjamin Y.H. Liu , Thuc M. Dinh , Yamin Ma
IPC分类号： B05B17/04
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及一种用于形成用于蒸发并随后在基板上的薄膜沉积的液滴气溶胶的装置和方法。该装置包括一个控制流过该装置的液体流速的机构，该机构包括用于调节液体流速的压电致动器和从压缩气体源引出气体的雾化机构，使得当气体源与液体结合时，液体被雾化以形成悬浮在气体中的液滴，从而形成适用于随后的薄膜沉积在基底上的液滴气溶胶。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系结合，其中气体与液体接合以形成适于蒸发的液滴和随后的薄膜沉积在基底上。

3. 发明申请

US20160334099A1 Apparatus and method for vapor generation and film deposition 有权
标题翻译：用于蒸气产生和膜沉积的装置和方法
公开(公告)号：US20160334099A1
公开(公告)日：2016-11-17
申请号：US14709055
申请日：2015-05-11
申请人： MSP Corporation
发明人： Thuc M. Dinh , Yamin Ma , Benjamin Y.H. Liu
IPC分类号： F22B1/28 , C23C16/448
CPC分类号： F22B1/282 , C23C16/4486 , F01K5/00
摘要： An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.
摘要翻译：一种用于产生具有紧凑的蒸发器设计的蒸汽的装置和方法，并将气体和液体混合物暴露于最小温度降低。气体和液滴流经金属壳体，其构造成加热用于蒸发的气液和液滴混合物流，包括引导气体和液滴混合物通过金属壳体的入口并使气体流过由多个的管状流动通道围绕中心轴布置以进行蒸发。残留的液滴可以通过流过第二金属壳体进一步蒸发，该第二金属壳体被配置为加热用于蒸发的气液和液滴混合物，并且具有与第一金属壳体相似的构造并提供第二折叠流动路径。

4. 发明授权

US10287679B2 Apparatus and method for vapor generation and film deposition 有权
公开(公告)号：US10287679B2
公开(公告)日：2019-05-14
申请号：US15790906
申请日：2017-10-23
申请人： MSP Corporation
发明人： Thuc M. Dinh , Yamin Ma , Benjamin Y. H. Liu
IPC分类号： F01K5/00 , F16T1/00 , F22B1/28 , C23C16/448
摘要： An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. The flow path is directed through a heat exchanger including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

5. 发明申请

US20180044789A1 Apparatus and method for vapor generation and film deposition 审中-公开
公开(公告)号：US20180044789A1
公开(公告)日：2018-02-15
申请号：US15790906
申请日：2017-10-23
申请人： MSP Corporation
发明人： Thuc M. Dinh , Yamin Ma , Benjamin Y.H. Liu
IPC分类号： C23C16/448
CPC分类号： C23C16/4481 , C23C16/4486 , F01K5/00 , F16T1/00 , F22B1/282
摘要： An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. The flow path is directed through a heat exchanger including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

6. 发明申请

US20130312674A1 Integrated system for vapor generation and thin film deposition 审中-公开
标题翻译：用于蒸气产生和薄膜沉积的集成系统
公开(公告)号：US20130312674A1
公开(公告)日：2013-11-28
申请号：US13960571
申请日：2013-08-06
申请人： MSP Corporation
发明人： Benjamin Y.H. Liu , Yamin Ma , Thuc Dinh
IPC分类号： F01K17/04
CPC分类号： F01K17/04 , Y10T137/0318 , Y10T137/0379 , Y10T137/7761 , Y10T137/8593
摘要： An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet section in fluid communication with a downstream vaporization chamber section. The inlet section comprises a gas inlet for receiving gas from a gas source through a gas flow sensor and a gas flow control valve and a liquid inlet for receiving liquid from a liquid source through a liquid flow sensor and a liquid flow control valve. An electronic controller controls the gas and liquid flow control valves thereby controlling the rates of gas and liquid flow into the inlet section to generate vapor in the downstream vaporization chamber section for thin film deposition on the substrate.
摘要翻译：用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上，包括与下游蒸发室部分流体连通的入口部分。入口部分包括用于从气体源通过气体流量传感器和气体流量控制阀接收气体的气体入口和用于通过液体流量传感器和液体流量控制阀从液体源接收液体的液体入口。电子控制器控制气体和液体流量控制阀，从而控制进入入口部分的气体和液体流量的速率，以在下游蒸发室部分中产生蒸汽，用于在基板上进行薄膜沉积。

7. 发明申请

US20130295776A1 Method for vapor condensation and recovery 审中-公开
标题翻译：蒸气冷凝和回收方法
公开(公告)号：US20130295776A1
公开(公告)日：2013-11-07
申请号：US13875995
申请日：2013-05-02
申请人： MSP CORPORATION
发明人： Benjamin Y.H. Liu , Thuc M. Dinh , Yamin Ma
IPC分类号： H01L21/02 , F25B39/04 , F25B21/02
CPC分类号： H01L21/02617 , B01D5/0042 , C23C16/4412 , F25B21/02 , F25B39/04 , F25J1/00 , H01L21/0228
摘要： Methods for recovery of precursor vapor from a gas and precursor vapor mixture used in a deposition process. The gas and precursor vapor mixture is passed through a multitude of heat transfer surfaces in a heat conducting housing causing the precursor vapor to condense. The precursor vapor in liquid form is then collected after condensation.
摘要翻译：用于从沉积过程中使用的气体和前体蒸汽混合物中回收前体蒸气的方法。气体和前体蒸气混合物通过导热壳体中的大量传热表面，导致前体蒸汽冷凝。然后在冷凝后收集液体形式的前体蒸气。

8. 发明授权

US09797593B2 Apparatus and method for vapor generation and film deposition 有权
公开(公告)号：US09797593B2
公开(公告)日：2017-10-24
申请号：US14709055
申请日：2015-05-11
申请人： MSP Corporation
发明人： Thuc M. Dinh , Yamin Ma , Benjamin Y. H. Liu
IPC分类号： F22B29/06 , F22B1/28 , C23C16/448 , F01K5/00
CPC分类号： F22B1/282 , C23C16/4486 , F01K5/00
摘要： An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

9. 发明授权

US08986784B2 Fine droplet atomization for liquid precursor vaporization 有权
标题翻译：用于液体前体气化的微小液滴雾化
公开(公告)号：US08986784B2
公开(公告)日：2015-03-24
申请号：US13937996
申请日：2013-07-09
申请人： MSP Corporation
发明人： Benjamin Y. H. Liu , Thuc M. Dinh , Yamin Ma
IPC分类号： B05B17/04 , B05B1/08 , B01F3/04 , C23C16/448
CPC分类号： B05B17/04 , C23C16/4486
摘要： A method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：一种用于形成用于汽化和随后的薄膜沉积在基底上的液滴气溶胶的方法。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系结合，其中气体与液体接合以形成适于蒸发的液滴和随后的薄膜沉积在基底上。

10. 发明授权

US08945281B1 Method and apparatus for vapor generation and wafer cleaning 有权
标题翻译：用于蒸气发生和晶片清洗的方法和装置
公开(公告)号：US08945281B1
公开(公告)日：2015-02-03
申请号：US14168692
申请日：2014-01-30
申请人： MSP Corporation
发明人： Thuc M. Dinh , Yamin Ma , Benjamin Y. H. Liu
IPC分类号： B01D19/00 , H01L21/02
CPC分类号： H01L21/67109 , H01L21/02052 , H01L21/67051
摘要： The present disclosure describes an apparatus and a method for generating IPA vapor for condensation on a substrate in order to provide a vapor that is substantially free of particulate and molecular contaminants. The apparatus includes an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of flowing liquid on the surfaces from which the liquid can vaporize to form vapor. The liquid flows from one surface to another, vaporizing the liquid.
摘要翻译：本公开描述了一种用于在基底上产生用于冷凝的IPA蒸气以提供基本上不含颗粒和分子污染物的蒸气的装置和方法。该装置包括用于进入液体的入口和多个加热的倾斜表面，以在表面上产生薄的流动液体，液体可从该表面蒸发以形成蒸气。液体从一个表面流到另一个表面，使液体蒸发。

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