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    • 3. 发明申请
    • RF Pulse Edge Shaping
    • 射频脉冲边缘整形
    • US20140118031A1
    • 2014-05-01
    • US13663574
    • 2012-10-30
    • MKS INSTRUMENTS, INC.
    • Amish RUGHOONUNDONLarry J. FISK, IIAaron T. RADOMSKI
    • H03K5/01
    • H03K4/026H03K5/00006
    • A radio frequency (RF) generation module includes a power control module that receives first and second desired amplitudes of an output of the RF generation module in first and second respective states, and that outputs, based on the first and second desired amplitudes, input power setpoints corresponding to a transition from the first state to the second state. A frequency control module receives the input power setpoints and outputs frequency setpoints corresponding to the input power setpoints. A pulse shaping module receives the input power setpoints, the frequency setpoints, and an indication of when to transition from the first state to the second state, and transitions the output of the RF generation module from the first state to the second state based on the input power setpoints, the frequency setpoints, and the indication.
    • 射频(RF)生成模块包括功率控制模块,其在第一和第二相应状态下接收RF产生模块的输出的第一和第二期望幅度,并且基于第一和第二期望幅度输出输入功率 设定值对应于从第一状态到第二状态的转变。 频率控制模块接收输入功率设定点并输出与输入功率设定值对应的频率设定值。 脉冲整形模块接收输入功率设定点,频率设定点以及何时从第一状态转换到第二状态的指示,并且基于该第一状态将RF产生模块的输出从第一状态转换到第二状态 输入功率设定值,频率设定值和指示。
    • 6. 发明申请
    • Virtual RF Sensor
    • 虚拟射频传感器
    • US20140266492A1
    • 2014-09-18
    • US13832901
    • 2013-03-15
    • MKS INSTRUMENTS, INC.
    • Aaron T. RADOMSKIDennis M. BROWNNicholas NELSON
    • H03H7/40
    • H03H7/40
    • A radio frequency (RF) generation system includes an impedance determination module that receives an RF voltage and an RF current. The impedance determination module further determines an RF generator impedance based on the RF voltage and the RF current. The RF generation system also includes a control module that determines a plurality of electrical values based on the RF generator impedance. The matching module further matches an impedance of a load based on the RF generator impedance and the plurality of electrical components. The matching module also determines a 2 port transfer function based on the plurality of electrical values. The RF generation system also includes a virtual sensor module that estimates a load voltage, a load current, and a load impedance based on the RF voltage, the RF generator, the RF generator impedance, and the 2 port transfer function.
    • 射频(RF)生成系统包括接收RF电压和RF电流的阻抗确定模块。 阻抗确定模块还基于RF电压和RF电流来确定RF发生器阻抗。 RF发生系统还包括控制模块,该控制模块基于RF发生器阻抗来确定多个电气值。 匹配模块还基于RF发生器阻抗和多个电气部件来匹配负载的阻抗。 匹配模块还基于多个电气值确定2端口传送功能。 RF发生系统还包括虚拟传感器模块,其基于RF电压,RF发生器,RF发生器阻抗和2端口传递函数来估计负载电压,负载电流和负载阻抗。