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1. 发明申请

US20180046071A1 PELLICLE MANUFACTURING METHOD AND METHOD FOR MANUFACTURING PHOTOMASK WITH PELLICLE 审中-公开
公开(公告)号：US20180046071A1
公开(公告)日：2018-02-15
申请号：US15794420
申请日：2017-10-26
申请人： MITSUI CHEMICALS, INC. , TAZMO CO., LTD.
发明人： Kazuo KOHMURA , Daiki TANEICHI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Yasuyuki SATO , Toshiaki HIROTA
IPC分类号： G03F1/24 , G03F1/54 , C09J7/02 , G03F1/80 , G03F1/64 , G03F1/60
CPC分类号： G03F1/24 , B23K26/0006 , B23K26/53 , B23K2101/40 , B23K2103/52 , B23K2103/56 , C09J7/38 , G03F1/54 , G03F1/60 , G03F1/62 , G03F1/64 , G03F1/76 , G03F1/80 , G03F1/82
摘要： A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.

2. 发明申请

US20210011372A1 SUPPORTING FRAME FOR PELLICLE, PELLICLE, METHOD FOR MANUFACTURING SAME, EXPOSURE MASTER USING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
公开(公告)号：US20210011372A1
公开(公告)日：2021-01-14
申请号：US17033076
申请日：2020-09-25
申请人： MITSUI CHEMICALS, INC.
发明人： Akira ISHIKAWA , Atsushi OKUBO , Yosuke ONO , Kazuo KOHMURA
IPC分类号： G03F1/64 , G03F7/20
摘要： Provided is a supporting frame in which a vent hole detachably arranging a filter and to which a pellicle film for extreme ultraviolet lithography can be attached. A support frame according to an embodiment of the present invention is a support frame for arranging a pellicle film, the support frame has a through hole being made from a hole extending along a first direction, the first direction being almost parallel to a surface direction of the pellicle film, and a hole extending along a second direction, the second direction not being parallel to the first direction; and the support frame includes a filter, the filter arranged at an inside of the through hole or at an end of the through hole, and the filter is arranged apart from the pellicle film.

3. 发明申请

US20210080824A1 PELLICLE SUPPORT FRAME, PELLICLE, METHOD FOR MANUFACTURING PELLICLE SUPPORT FRAME, AND EXPOSURE ORIGINAL PLATE AND EXPOSURE DEVICE EMPLOYING PELLICLE 有权
公开(公告)号：US20210080824A1
公开(公告)日：2021-03-18
申请号：US16953748
申请日：2020-11-20
申请人： MITSUI CHEMICALS, INC.
发明人： Akira ISHIKAWA , Atsushi OKUBO , Yosuke ONO , Kazuo KOHMURA
IPC分类号： G03F1/64 , G03F7/20
摘要： A support frame for pellicle is provided including a first support frame part, a second support frame part, and a filter, wherein the filter has a flat plate-shaped frame shape and is sandwiched by the first support frame part and the second support frame part, the first support frame part includes a first body part having a flat plate-shaped frame shape and a first engaging portion protruded from the first body part to a thickness direction of the support frame for pellicle, and the second support frame part includes a second body part having a flat plate-shaped frame shape and a second engaging portion of the second body part engaging with the first engaging portion being arranged in a concave part provided in the thickness direction of the support frame for pellicle.

4. 发明申请

US20170285461A1 PELLICLE FILM, PELLICLE FRAME, PELLICLE, AND METHOD FOR PRODUCING SAME 审中-公开
公开(公告)号：US20170285461A1
公开(公告)日：2017-10-05
申请号：US15629085
申请日：2017-06-21
申请人： MITSUI CHEMICALS, INC.
发明人： Atsushi OKUBO , Tsuneaki BIYAJIMA , Yosuke ONO , Kazuo KOHMURA , Yasuhisa FUJII , Nobuko MATSUMOTO
IPC分类号： G03F1/64 , G03F1/66 , G03F7/20
CPC分类号： G03F1/64 , G03F1/62 , G03F1/66 , G03F7/2004 , G03F7/70983
摘要： A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed.

5. 发明申请

US20170184956A1 PELLICLE, PRODUCTION METHOD THEREOF, EXPOSURE METHOD 审中-公开
公开(公告)号：US20170184956A1
公开(公告)日：2017-06-29
申请号：US15454555
申请日：2017-03-09
申请人： MITSUI CHEMICALS, INC.
发明人： Kazuo KOHMURA , Daiki TANEICHI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Atsushi OKUBO , Yasuyuki SATO , Toshiaki HIROTA
IPC分类号： G03F1/64 , G03F7/20
CPC分类号： G03F1/64 , G03F1/62 , G03F1/68 , G03F7/2008 , H01L21/027
摘要： Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.

6. 发明申请

US20180239242A1 PELLICLE FRAME, PELLICLE CONTAINING SAME, METHOD FOR PRODUCING PELLICLE FRAME, AND METHOD FOR PRODUCING PELLICLE 审中-公开
公开(公告)号：US20180239242A1
公开(公告)日：2018-08-23
申请号：US15753211
申请日：2016-08-15
申请人： MITSUI CHEMICALS, INC.
发明人： Kazuo KOHMURA , Takashi KOZEKI , Daiki TANEICHI , Shintaro MAEKAWA , Yosuke ONO , Tsuneaki BIYAJIMA
IPC分类号： G03F1/64 , B32B15/08
CPC分类号： G03F1/64 , B32B15/08 , B32B2311/24 , B32B2379/08 , C25D11/22
摘要： The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.

7. 发明申请

US20170184957A1 PELLICLE, PELLICLE PRODUCTION METHOD AND EXPOSURE METHOD USING PELLICLE 审中-公开
公开(公告)号：US20170184957A1
公开(公告)日：2017-06-29
申请号：US15454631
申请日：2017-03-09
申请人： MITSUI CHEMICALS, INC.
发明人： Kazuo KOHMURA , Daiki TANEICHI , Takashi KOZEKI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Atsushi OKUBO , Yasuyuki SATO , Toshiaki HIROTA
IPC分类号： G03F1/64 , G03F7/20
摘要： Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.

8. 发明申请

US20160147141A1 PELLICLE AND EUV EXPOSURE DEVICE COMPRISING SAME 有权
标题翻译：包含相同的PELLICLE和EUV曝光装置
公开(公告)号：US20160147141A1
公开(公告)日：2016-05-26
申请号：US14893314
申请日：2014-05-20
申请人： MITSUI CHEMICALS, INC.
发明人： Yosuke ONO , Kazuo KOHMURA
IPC分类号： G03F1/62 , G03F7/20
CPC分类号： G03F1/62 , G03F1/24 , G03F7/2004 , G03F7/7015
摘要： The present invention addresses the problem of providing a pellicle which has high EUV transmittance and high strength, while being not susceptible to damage by heat. In order to solve the above-mentioned problem, the present invention provides a pellicle which comprises a pellicle film that has a refractive index (n) of light having a wavelength of 550 nm of 1.9-5.0 and a pellicle frame to which the pellicle film is bonded. The pellicle film has a composition that contains 30-100% by mole of carbon and 0-30% by mole of hydrogen. The intensity ratio of the 2D-band to the G-band, namely (intensity in 2D-band)/(intensity in G-band) is 1 or less, or alternatively, the intensity in the 2D-band and the intensity in the G-band are 0 in the Raman spectrum of the pellicle film.
摘要翻译：本发明解决了提供具有高EUV透射率和高强度的防护薄膜的问题，同时不易受到热损害。为了解决上述问题，本发明提供一种防护薄膜组件，其包含具有波长为550nm的光的折射率（n）为1.9-5.0的防护薄膜，防护薄膜组件，防护薄膜被绑定。防护薄膜具有含有30〜100摩尔％的碳和0〜30摩尔％的氢的组成。 2D带与G带的强度比，即（2D带中的强度）/（G带中的强度）为1以下，或者2D带中的强度和防护薄膜的拉曼光谱中的G带为0。

9. 发明申请

US20230036846A1 PELLICLE FILM, PELLICLE, ORIGINAL PLATE FOR EXPOSURE, EXPOSURE DEVICE, METHOD OF PRODUCING PELLICLE, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE 有权
公开(公告)号：US20230036846A1
公开(公告)日：2023-02-02
申请号：US17792735
申请日：2021-02-16
申请人： MITSUI CHEMICALS, INC.
发明人： Atsushi OKUBO , Kazuo KOHMURA , Hisako ISHIKAWA , Yosuke ONO , Yasuhisa FUJII , Wataru YOSHIKAWA , Nobuko MATSUMOTO , Tomoe DEGUCHI
IPC分类号： G03F1/64 , H01L21/02 , G03F7/20 , C01B32/16
摘要： Provided are a pellicle film, a pellicle, an original plate for exposure, an exposure device, a method of producing a semiconductor device, and a method of producing a pellicle, the pellicle film containing carbon nanotubes having a silicon carbide layer in which at least a part of carbon is substituted with silicon at least on a surface layer side.

10. 发明申请

US20200064729A1 PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20200064729A1
公开(公告)日：2020-02-27
申请号：US16535183
申请日：2018-02-09
申请人： Mitsui Chemicals, Inc.
发明人： Kazuo KOHMURA , Yosuke ONO , Atsushi OKUBO , Daiki TANEICHI , Hisako ISHIKAWA , Tsuneaki BIYAJIMA
IPC分类号： G03F1/64 , H01L21/027 , G03F7/20
摘要： A pellicle for EUV exposure that has a high transmittance to EUV light, causes little outgassing, and is not much contaminated, and a method for manufacturing the same are provided. A pellicle (100) includes a pellicle film (101); a support frame (103); and a first adhesive layer (109) provided at an end of the support frame, the end being opposite to an end on which the pellicle film is extended. The pellicle further includes an inorganic layer (111) on a side surface of the first adhesive layer, the side surface extending in a direction crossing a surface of the pellicle film, and the pellicle film being extended on the side surface. The inorganic layer has a mass absorption coefficient (μm) in the range of 5×103 cm2/g to 2×105 cm2/g.

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