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1. 发明申请

US20120254813A1 Integration of Lithography Apparatus and Mask Optimization Process with Multiple Patterning Process 有权
标题翻译：光刻设备与掩模优化过程的多重图案化处理
公开(公告)号：US20120254813A1
公开(公告)日：2012-10-04
申请号：US13439692
申请日：2012-04-04
申请人： Luoqi Chen , Jun Ye , Hong Chen
发明人： Luoqi Chen , Jun Ye , Hong Chen
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G03F7/70433 , G03F7/70466 , G03F7/705 , G03F7/70508 , G03F7/707
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。公开了一种通过光刻处理将待成像的图案图案分割成多个子图案的方法，其中该方法包括分割步骤，其被配置为意识到在以下过程中的至少一个之间的共优化的要求：用于光刻工艺的光刻设备的子图案和光学设置。包括基于衍射特征分析的智能图案选择的设备特征优化技术可以被集成到多个图案化工艺流程中。

2. 发明申请

US20120216156A1 Method of Pattern Selection for Source and Mask Optimization 有权
标题翻译：源和掩码优化的模式选择方法
公开(公告)号：US20120216156A1
公开(公告)日：2012-08-23
申请号：US13505286
申请日：2010-10-26
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.
摘要翻译：本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上处理。从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

3. 发明申请

US20140012672A1 CONTENT-BASED BIDDING IN ONLINE ADVERTISING 审中-公开
标题翻译：基于内容的在线广告投标
公开(公告)号：US20140012672A1
公开(公告)日：2014-01-09
申请号：US13543708
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0241
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression. The request includes a first content and a second content. The method also includes determining information related to (i) a context of the first content, (ii) a context of the second content, and (iii) a correlation between the context of the first content and the context of the second content, and providing the determined information to a bidding service, thereby enabling one or more advertisers to place one or more bids on the ad impression based on the provided information. Each of the one or more bids includes a bid price. The method further includes receiving the one or more bids for the ad impression, selecting one of the one or more received bids based at least in part on the bid prices, and providing an ad impression associated with the selected bid.
摘要翻译：提供有针对性的在线广告的方法包括接收对广告印象的请求。该请求包括第一内容和第二内容。该方法还包括确定与（i）第一内容的上下文相关的信息，（ii）第二内容的上下文，以及（iii）第一内容的上下文与第二内容的上下文之间的相关性，以及将确定的信息提供给投标服务，从而使得一个或多个广告商能够基于所提供的信息对广告印象进行一个或多个出价。每个一个或多个出价都包含一个出价。所述方法还包括接收针对所述广告展示的所述一个或多个出价，至少部分地基于所述出价来选择所述一个或多个所接收的出价中的一个，以及提供与所选择的出价相关联的广告展示。

4. 发明授权

US08739082B2 Method of pattern selection for source and mask optimization 有权
标题翻译：源和掩码优化的图案选择方法
公开(公告)号：US08739082B2
公开(公告)日：2014-05-27
申请号：US13505286
申请日：2010-10-26
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.
摘要翻译：本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上处理。从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

5. 发明申请

US20140012671A1 CONTENT-BASED TARGETED ONLINE ADVERTISEMENT 审中-公开
标题翻译：基于内容的目标在线广告
公开(公告)号：US20140012671A1
公开(公告)日：2014-01-09
申请号：US13543705
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0251
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression to be provided to a user in a network environment. The request includes a first content and a second content. The method also includes, using a processor, determining a context of the first content and a context of the second content, determining a correlation between the context of the first content and the context of the second content, and identifying a plurality of ads as candidates for consideration. The method further includes, using the processor, ranking the plurality of identified ads, selecting an ad among the plurality of identified ads based at least in part on a result of the ranking, and providing the selected ad as the ad impression to be displayed to the user in response to receiving the request.
摘要翻译：提供目标在线广告的方法包括在网络环境中接收要向用户提供的广告印象的请求。该请求包括第一内容和第二内容。该方法还包括使用处理器确定第一内容的上下文和第二内容的上下文，确定第一内容的上下文与第二内容的上下文之间的相关性，以及将多个广告标识为候选审议。所述方法还包括：使用所述处理器对所述多个识别的广告进行排名，至少部分地基于所述排名的结果来选择所述多个识别的广告中的广告，并且将所选择的广告提供为要显示的广告展示用户响应于接收到请求。

6. 发明授权

US08819601B2 Integration of lithography apparatus and mask optimization process with multiple patterning process 有权
标题翻译：光刻设备和掩模优化工艺与多个图案化工艺的集成
公开(公告)号：US08819601B2
公开(公告)日：2014-08-26
申请号：US13439692
申请日：2012-04-04
申请人： Luoqi Chen , Jun Ye , Hong Chen
发明人： Luoqi Chen , Jun Ye , Hong Chen
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G03F7/70433 , G03F7/70466 , G03F7/705 , G03F7/70508 , G03F7/707
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。公开了一种通过光刻处理将待成像的图案图案分割成多个子图案的方法，其中该方法包括分割步骤，其被配置为意识到在以下过程中的至少一个之间的共优化的要求：用于光刻工艺的光刻设备的子图案和光学设置。包括基于衍射特征分析的智能图案选择的设备特征优化技术可以被集成到多个图案化工艺流程中。

7. 发明授权

US08589829B2 Three-dimensional mask model for photolithography simulation 有权
公开(公告)号：US08589829B2
公开(公告)日：2013-11-19
申请号：US13736929
申请日：2013-01-08
申请人： Peng Liu , Yu Cao , Luoqi Chen , Jun Ye
发明人： Peng Liu , Yu Cao , Luoqi Chen , Jun Ye
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/705 , G06F17/5009
摘要： A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

8. 发明授权

US07117478B2 System and method for lithography simulation 有权
公开(公告)号：US07117478B2
公开(公告)日：2006-10-03
申请号：US11037988
申请日：2005-01-18
申请人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
发明人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
IPC分类号： G06F17/50 , G03F1/00 , G21K5/00 , G06F19/00
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

9. 发明申请

US20050122500A1 System and method for lithography simulation 有权
公开(公告)号：US20050122500A1
公开(公告)日：2005-06-09
申请号：US11037988
申请日：2005-01-18
申请人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
发明人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
IPC分类号： G03B27/54 , G03F20060101 , G03F7/20 , G06F17/50 , G06K9/00 , G06T7/00
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

10. 发明申请

US20050097500A1 System and method for lithography simulation 有权
公开(公告)号：US20050097500A1
公开(公告)日：2005-05-05
申请号：US10981914
申请日：2004-11-04
申请人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
发明人： Jun Ye , Yen-Wen Lu , Yu Cao , Luoqi Chen , Xun Chen
IPC分类号： G03B27/54 , G03F20060101 , G03F7/20 , G06F17/50 , G06K9/00 , G06T7/00
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

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