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1. 发明申请

US20100332201A1 METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROCESSING CHAMBERS 有权
标题翻译：预处理炉预防性维护方法与装置
公开(公告)号：US20100332201A1
公开(公告)日：2010-12-30
申请号：US12826575
申请日：2010-06-29
申请人： Luc Albarede , Eric Pape , Vijayakumar C. Venugopal , Brian D. Choi
发明人： Luc Albarede , Eric Pape , Vijayakumar C. Venugopal , Brian D. Choi
IPC分类号： G06F17/10 , G06G7/62
CPC分类号： H01J37/32935 , H01J37/32477
摘要： A method for assessing health status of a processing chamber is provided. The method includes executing a recipe. The method also includes receiving processing data from a set of sensors during execution of the recipe. The method further includes analyzing the processing data utilizing a set of multi-variate predictive models. The method yet also includes generating a set of component wear data values. The method yet further includes comparing the set of component wear data values against a set of useful life threshold ranges. The method moreover includes generating a warning if the set of component wear data values is outside of the set of useful life threshold ranges.
摘要翻译：提供了一种用于评估处理室的健康状况的方法。该方法包括执行食谱。该方法还包括在执行配方期间从一组传感器接收处理数据。该方法还包括利用一组多变量预测模型分析处理数据。该方法还包括生成一组组件磨损数据值。该方法还包括将组件磨损数据值集合与一组使用寿命阈值范围进行比较。该方法还包括如果组件磨损数据值的集合超出了使用寿命阈值范围的集合，则产生警告。

2. 发明授权

US08473089B2 Methods and apparatus for predictive preventive maintenance of processing chambers 有权
标题翻译：处理室预防性维护的方法和装置
公开(公告)号：US08473089B2
公开(公告)日：2013-06-25
申请号：US12826575
申请日：2010-06-29
申请人： Luc Albarede , Eric Pape , Vijayakumar C Venugopal , Brian D Choi
发明人： Luc Albarede , Eric Pape , Vijayakumar C Venugopal , Brian D Choi
IPC分类号： G06F19/00
CPC分类号： H01J37/32935 , H01J37/32477
摘要： A method for assessing health status of a processing chamber is provided. The method includes executing a recipe. The method also includes receiving processing data from a set of sensors during execution of the recipe. The method further includes analyzing the processing data utilizing a set of multi-variate predictive models. The method yet also includes generating a set of component wear data values. The method yet further includes comparing the set of component wear data values against a set of useful life threshold ranges. The method moreover includes generating a warning if the set of component wear data values is outside of the set of useful life threshold ranges.
摘要翻译：提供了一种用于评估处理室的健康状况的方法。该方法包括执行食谱。该方法还包括在执行配方期间从一组传感器接收处理数据。该方法还包括利用一组多变量预测模型分析处理数据。该方法还包括生成一组组件磨损数据值。该方法还包括将组件磨损数据值集合与一组使用寿命阈值范围进行比较。该方法还包括如果组件磨损数据值的集合超出了使用寿命阈值范围的集合，则产生警告。

3. 发明申请

US20120170039A1 METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA 有权
标题翻译：用于正常化光学发射光谱的方法和装置
公开(公告)号：US20120170039A1
公开(公告)日：2012-07-05
申请号：US13415763
申请日：2012-03-08
申请人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
发明人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
IPC分类号： G01J3/42
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译：提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。处理室包括限制环组件，闪光灯和一组石英窗。处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。处理室还包括多个光纤束。处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

4. 发明申请

US20090002836A1 METHODS AND APPARATUS FOR A HIGHLY COLLIMATED LIGHT COLLECTION ARRANGEMENT 有权
标题翻译：用于高收缩光收集装置的方法和装置
公开(公告)号：US20090002836A1
公开(公告)日：2009-01-01
申请号：US11772008
申请日：2007-06-29
申请人： Vijayakumar C. Venugopal , Eric Pape
发明人： Vijayakumar C. Venugopal , Eric Pape
IPC分类号： G02B27/30
CPC分类号： H05H1/0025 , G02B27/30
摘要： A method for optical interrogation of plasma during plasma processing in a plasma processing chamber is provided. The method includes providing an optical viewport. The method also includes providing a collimator arrangement. The collimator arrangement is configured with a plurality of collimators, wherein a first collimator of the plurality of collimators is separated by a connecting region from a second collimator in the plurality of collimators. The method further includes collecting optical signals, through the collimator arrangement, from the plasma within the plasma processing chamber while a substrate is being processed, resulting in highly collimated optical signals.
摘要翻译：提供了一种在等离子体处理室中的等离子体处理期间对等离子体进行光询问的方法。该方法包括提供光学视口。该方法还包括提供准直器装置。准直器装置配置有多个准直器，其中多个准直器中的第一准直仪由多个准直器中的第二准直器的连接区域分开。该方法还包括在正在处理衬底的同时通过准直器装置从等离子体处理室内的等离子体收集光信号，导致高度准直的光信号。

5. 发明授权

US08144328B2 Methods and apparatus for normalizing optical emission spectra 有权
标题翻译：用于归一化光发射光谱的方法和装置
公开(公告)号：US08144328B2
公开(公告)日：2012-03-27
申请号：US12418492
申请日：2009-04-03
申请人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
发明人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
IPC分类号： G01N21/00
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译：提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。该装置包括闪光灯和一组石英窗。该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

6. 发明申请

US20090251700A1 METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA 有权
标题翻译：用于正常化光学发射光谱的方法和装置
公开(公告)号：US20090251700A1
公开(公告)日：2009-10-08
申请号：US12418492
申请日：2009-04-03
申请人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
发明人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
IPC分类号： G01N21/25
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译：提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。该装置包括闪光灯和一组石英窗。该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

7. 发明授权

US08358416B2 Methods and apparatus for normalizing optical emission spectra 有权
标题翻译：用于归一化光发射光谱的方法和装置
公开(公告)号：US08358416B2
公开(公告)日：2013-01-22
申请号：US13415763
申请日：2012-03-08
申请人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
发明人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
IPC分类号： G01N21/00
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译：提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。处理室包括限制环组件，闪光灯和一组石英窗。处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。处理室还包括多个光纤束。处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

8. 发明申请

US20090290145A1 ELECTRICAL AND OPTICAL SYSTEM AND METHODS FOR MONITORING EROSION OF ELECTROSTATIC CHUCK EDGE BEAD MATERIALS 有权
标题翻译：用于监测静电花边边缘材料腐蚀的电气和光学系统及方法
公开(公告)号：US20090290145A1
公开(公告)日：2009-11-26
申请号：US12126625
申请日：2008-05-23
申请人： Bradley J. Howard , Eric Pape , Siwen Li
发明人： Bradley J. Howard , Eric Pape , Siwen Li
IPC分类号： G01N21/63
CPC分类号： H01J37/32642 , H01J37/32935 , H01J37/32972 , H01J37/3299
摘要： A disclosed device comprises an edge bonding seal configured to be mounted to an edge bead of the electrostatic chuck. The edge bonding seal includes a monitoring layer comprised of a first material configured to either emit a species capable of being optically monitored or having an electrical resistance value capable of being monitored, or both. The edge bonding seal further includes an edge bonding layer configured to be interspersed at least between the monitoring layer and the plasma environment. The edge bonding layer is comprised of a second material susceptible to erosion due to reaction with the plasma environment and configured to expose the monitoring layer to the plasma environment upon sufficient exposure to the plasma environment.
摘要翻译：所公开的装置包括构造成安装到静电卡盘的边缘珠缘上的边缘接合密封件。边缘接合密封件包括由第一材料构成的监测层，该第一材料被配置为发射能够被光学监测的物质或具有能够被监测的电阻值，或两者。边缘接合密封件还包括边缘粘合层，其被配置为至少散布在监测层和等离子体环境之间。边缘粘合层由与等离子体环境的反应易受侵蚀的第二材料组成，并且被配置为在充分暴露于等离子体环境时将监测层暴露于等离子体环境。

9. 发明申请

US20110007303A1 OPTICAL SYSTEM AND METHODS FOR MONITORING EROSION OF ELECTROSTATIC CHUCK EDGE BEAD MATERIALS 有权
标题翻译：用于监测静电花边边缘材料腐蚀的光学系统和方法
公开(公告)号：US20110007303A1
公开(公告)日：2011-01-13
申请号：US12887829
申请日：2010-09-22
申请人： Bradley J. Howard , Eric Pape , Siwen Li
发明人： Bradley J. Howard , Eric Pape , Siwen Li
IPC分类号： G01N21/00
CPC分类号： H01J37/32642 , H01J37/32935 , H01J37/32972 , H01J37/3299
摘要： A disclosed device comprises an edge bonding seal configured to be mounted to an edge bead of the electrostatic chuck. The edge bonding seal includes a monitoring layer comprised of a first material configured to emit a species capable of being optically monitored. The edge bonding seal further includes an edge bonding layer configured to be interspersed at least between the monitoring layer and the plasma environment. The edge bonding layer is comprised of a second material susceptible to erosion due to reaction with the plasma environment and configured to expose the monitoring layer to the plasma environment upon sufficient exposure to the plasma environment.
摘要翻译：所公开的装置包括构造成安装到静电卡盘的边缘珠缘上的边缘接合密封件。边缘接合密封件包括由构造成发射能够进行光学监测的物质的第一材料构成的监测层。边缘接合密封件还包括边缘粘合层，其被配置为至少散布在监测层和等离子体环境之间。边缘粘合层由与等离子体环境的反应易受侵蚀的第二材料组成，并且被配置为在充分暴露于等离子体环境时将监测层暴露于等离子体环境。

10. 发明授权

US07952694B2 Optical system and methods for monitoring erosion of electrostatic chuck edge bead materials 有权
标题翻译：用于监测静电卡盘边缘珠材料侵蚀的光学系统和方法
公开(公告)号：US07952694B2
公开(公告)日：2011-05-31
申请号：US12887829
申请日：2010-09-22
申请人： Bradley J. Howard , Eric Pape , Siwen Li
发明人： Bradley J. Howard , Eric Pape , Siwen Li
IPC分类号： G01J3/30 , G01N27/04
CPC分类号： H01J37/32642 , H01J37/32935 , H01J37/32972 , H01J37/3299
摘要： A disclosed device comprises an edge bonding seal configured to be mounted to an edge bead of the electrostatic chuck. The edge bonding seal includes a monitoring layer comprised of a first material configured to emit a species capable of being optically monitored. The edge bonding seal further includes an edge bonding layer configured to be interspersed at least between the monitoring layer and the plasma environment. The edge bonding layer is comprised of a second material susceptible to erosion due to reaction with the plasma environment and configured to expose the monitoring layer to the plasma environment upon sufficient exposure to the plasma environment.
摘要翻译：所公开的装置包括构造成安装到静电卡盘的边缘珠缘上的边缘接合密封件。边缘接合密封件包括由构造成发射能够进行光学监测的物质的第一材料构成的监测层。边缘接合密封件还包括边缘粘合层，其被配置为至少散布在监测层和等离子体环境之间。边缘粘合层由与等离子体环境的反应易受侵蚀的第二材料组成，并且被配置为在充分暴露于等离子体环境时将监测层暴露于等离子体环境。

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