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    • 10. 发明授权
    • Sputter ion pump
    • 溅射离子泵
    • US07819633B2
    • 2010-10-26
    • US11478421
    • 2006-06-28
    • Li QianJie TangLiang LiuJing QiPi-Jin ChenZhao-Fu HuShou-Shan Fan
    • Li QianJie TangLiang LiuJing QiPi-Jin ChenZhao-Fu HuShou-Shan Fan
    • F04B37/02
    • F04B37/02F04B37/14H01J41/20
    • A sputter ion pump includes one vacuum chamber, two parallel anode poles and one cold cathode electron emitter. The vacuum chamber includes at least one aperture located in an outer wall thereof. The two parallel anode poles are positioned in the vacuum chamber and arranged in a symmetrical configuration about a center axis of the vacuum chamber. The cold cathode electron emission device is located on or proximate the outer wall of the vacuum chamber and faces a corresponding aperture. The cold cathode electron emission device is thus configured for injecting electrons through the corresponding aperture and into the vacuum chamber. The sputter ion pump produces a saddle-shaped electrostatic field and is free of a magnetic field. The sputter ion pump has a simplified structure and a low power consumption.
    • 溅射离子泵包括一个真空室,两个平行的阳极和一个冷阴极电子发射器。 真空室包括位于其外壁中的至少一个孔。 两个平行的阳极极位于真空室中,并以关于真空室的中心轴线的对称构型布置。 冷阴极电子发射装置位于真空室的外壁上或靠近真空室的外壁并面对相应的孔。 因此,冷阴极电子发射器件被配置用于通过相应的孔注入电子并进入真空室。 溅射离子泵产生鞍形静电场并且没有磁场。 溅射离子泵具有简化的结构和低功耗。