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1. 发明授权

US09136206B2 Copper contact plugs with barrier layers 有权
标题翻译：铜接触塞，带有阻隔层
公开(公告)号：US09136206B2
公开(公告)日：2015-09-15
申请号：US13557592
申请日：2012-07-25
申请人： Li-Lin Su , Ching-Hua Hsieh , Huang-Ming Chen , Hsueh Wen Tsau
发明人： Li-Lin Su , Ching-Hua Hsieh , Huang-Ming Chen , Hsueh Wen Tsau
IPC分类号： H01L23/48 , H01L23/52 , H01L23/485 , H01L29/49 , H01L23/522 , H01L23/532 , H01L29/66
CPC分类号： H01L23/535 , H01L21/28035 , H01L21/28088 , H01L21/76805 , H01L21/76843 , H01L21/76847 , H01L21/76879 , H01L21/76895 , H01L23/485 , H01L23/5226 , H01L23/53223 , H01L23/53238 , H01L23/53295 , H01L29/4916 , H01L29/495 , H01L29/4966 , H01L29/66545 , H01L2924/0002 , H01L2924/00
摘要： A device includes a conductive layer including a bottom portion, and a sidewall portion over the bottom portion, wherein the sidewall portion is connected to an end of the bottom portion. An aluminum-containing layer overlaps the bottom portion of the conductive layer, wherein a top surface of the aluminum-containing layer is substantially level with a top edge of the sidewall portion of the conductive layer. An aluminum oxide layer is overlying the aluminum-containing layer. A copper-containing region is over the aluminum oxide layer, and is spaced apart from the aluminum-containing layer by the aluminum oxide layer. The copper-containing region is electrically coupled to the aluminum-containing layer through the top edge of the sidewall portion of the conductive layer.
摘要翻译：一种器件包括一个包括一个底部的导电层和一个位于底部上的侧壁部分，其中侧壁部分连接到底部的一端。含铝层与导电层的底部重叠，其中含铝层的顶表面与导电层的侧壁部分的顶部边缘基本平齐。铝氧化物层覆盖含铝层。含铜区域位于氧化铝层的上方，并且通过氧化铝层与含铝层隔开。含铜区域通过导电层的侧壁部分的顶边缘电耦合到含铝层。

2. 发明申请

US20140027822A1 Copper Contact Plugs with Barrier Layers 有权
标题翻译：铜接触塞与阻挡层
公开(公告)号：US20140027822A1
公开(公告)日：2014-01-30
申请号：US13557592
申请日：2012-07-25
申请人： Li-Lin Su , Ching-Hua Hsieh , Huang-Ming Chen , Hsueh Wen Tsau
发明人： Li-Lin Su , Ching-Hua Hsieh , Huang-Ming Chen , Hsueh Wen Tsau
IPC分类号： H01L23/485 , H01L21/28 , H01L29/78
CPC分类号： H01L23/535 , H01L21/28035 , H01L21/28088 , H01L21/76805 , H01L21/76843 , H01L21/76847 , H01L21/76879 , H01L21/76895 , H01L23/485 , H01L23/5226 , H01L23/53223 , H01L23/53238 , H01L23/53295 , H01L29/4916 , H01L29/495 , H01L29/4966 , H01L29/66545 , H01L2924/0002 , H01L2924/00
摘要： A device includes a conductive layer including a bottom portion, and a sidewall portion over the bottom portion, wherein the sidewall portion is connected to an end of the bottom portion. An aluminum-containing layer overlaps the bottom portion of the conductive layer, wherein a top surface of the aluminum-containing layer is substantially level with a top edge of the sidewall portion of the conductive layer. An aluminum oxide layer is overlying the aluminum-containing layer. A copper-containing region is over the aluminum oxide layer, and is spaced apart from the aluminum-containing layer by the aluminum oxide layer. The copper-containing region is electrically coupled to the aluminum-containing layer through the top edge of the sidewall portion of the conductive layer.
摘要翻译：一种器件包括一个包括一个底部的导电层和一个位于底部上的侧壁部分，其中侧壁部分连接到底部的一端。含铝层与导电层的底部重叠，其中含铝层的顶表面与导电层的侧壁部分的顶部边缘基本平齐。铝氧化物层覆盖含铝层。含铜区域位于氧化铝层的上方，并且通过氧化铝层与含铝层隔开。含铜区域通过导电层的侧壁部分的顶边缘电耦合到含铝层。

3. 发明授权

US09252019B2 Semiconductor device and method for forming the same 有权
标题翻译：半导体装置及其形成方法
公开(公告)号：US09252019B2
公开(公告)日：2016-02-02
申请号：US13222502
申请日：2011-08-31
申请人： Wen-Chi Tsai , Chia-Han Lai , Yung-Chung Chen , Mei-Yun Wang , Chii-Ming Wu , Fang-Cheng Chen , Huang-Ming Chen , Ming-Ta Lei
发明人： Wen-Chi Tsai , Chia-Han Lai , Yung-Chung Chen , Mei-Yun Wang , Chii-Ming Wu , Fang-Cheng Chen , Huang-Ming Chen , Ming-Ta Lei
IPC分类号： H01L21/768 , H01L21/285 , H01L29/417 , H01L21/02 , H01L29/66
CPC分类号： H01L29/78 , H01L21/02063 , H01L21/28512 , H01L21/28518 , H01L21/76802 , H01L21/76805 , H01L21/76814 , H01L21/76825 , H01L21/76831 , H01L21/76844 , H01L21/76855 , H01L23/485 , H01L23/535 , H01L29/41775 , H01L29/45 , H01L29/6659 , H01L2924/0002 , H01L2924/00
摘要： A system and method for forming and using a liner is provided. An embodiment comprises forming an opening in an inter-layer dielectric over a substrate and forming the liner along the sidewalls of the opening. A portion of the liner is removed from a bottom of the opening, and a cleaning process may be performed through the liner. By using the liner, damage to the sidewalls of the opening from the cleaning process may be reduced or eliminated. Additionally, the liner may be used to help implantation of ions within the substrate.
摘要翻译：提供了一种用于形成和使用衬套的系统和方法。一个实施例包括在衬底之上的层间电介质中形成开口，并沿着开口的侧壁形成衬垫。衬套的一部分从开口的底部移除，并且可以通过衬套执行清洁过程。通过使用衬垫，可以减少或消除从清洁过程对开口侧壁的损坏。另外，衬垫可用于帮助衬底内的离子注入。

4. 发明申请

US20130265289A1 CHOLESTERIC LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR DRIVING THE SAME 审中-公开
标题翻译：液晶液晶显示装置及其驱动方法
公开(公告)号：US20130265289A1
公开(公告)日：2013-10-10
申请号：US13613521
申请日：2012-09-13
申请人： Yu-Hsien CHEN , Huang-Ming Chen , Sheng-Fa Liu , Mei-Tsao Chiang , Bao-Sian Ciou
发明人： Yu-Hsien CHEN , Huang-Ming Chen , Sheng-Fa Liu , Mei-Tsao Chiang , Bao-Sian Ciou
IPC分类号： G02F1/1337 , G06F3/038
CPC分类号： G02F1/13718 , G02F1/1337 , G02F2001/133776
摘要： A cholesteric liquid crystal display device includes a first substrate, a second substrate, a cholesteric liquid crystal layer and a plurality of nano particles. The first substrate includes a first alignment layer. The second substrate includes a second alignment layer. The cholesteric liquid crystal layer is disposed between the first and second alignment layers. The nano particles are disposed on a surface of one of the first and second alignment layers, and located between the one of the first and second alignment layers and the cholesteric liquid crystal layer.
摘要翻译：胆甾型液晶显示装置包括第一基板，第二基板，胆甾型液晶层和多个纳米颗粒。第一基板包括第一对准层。第二基板包括第二对准层。胆甾型液晶层设置在第一和第二取向层之间。纳米颗粒设置在第一和第二取向层中的一个的表面上，并且位于第一和第二取向层中的一个和胆甾醇型液晶层之间。

5. 发明申请

US20140015104A1 Methods for Introducing Carbon to a Semiconductor Structure and Structures Formed Thereby 有权
标题翻译：将碳引入到由此形成的半导体结构和结构的方法
公开(公告)号：US20140015104A1
公开(公告)日：2014-01-16
申请号：US13548783
申请日：2012-07-13
申请人： Yu-Chen Su , Huang-Ming Chen , Chun-Feng Nieh , Pei-Chao Su
发明人： Yu-Chen Su , Huang-Ming Chen , Chun-Feng Nieh , Pei-Chao Su
IPC分类号： H01L21/38 , H01L29/772
CPC分类号： H01L29/0638 , H01L21/225 , H01L21/26586 , H01L21/31155 , H01L21/76825 , H01L21/76826 , H01L21/76828 , H01L21/76834 , H01L21/76897 , H01L27/092 , H01L29/165 , H01L29/517 , H01L29/66545 , H01L29/66606 , H01L29/66636 , H01L29/7833 , H01L29/7834
摘要： An embodiment is a method comprising diffusing carbon through a surface of a substrate, implanting carbon through the surface of the substrate, and annealing the substrate after the diffusing the carbon and implanting the carbon through the surface of the substrate. The substrate comprises a first gate, a gate spacer, an etch stop layer, and an inter-layer dielectric. The first gate is over a semiconductor substrate. The gate spacer is along a sidewall of the first gate. The etch stop layer is on a surface of the gate spacer and over a surface of the semiconductor substrate. The inter-layer dielectric is over the etch stop layer. The surface of the substrate comprises a surface of the inter-layer dielectric.
摘要翻译：一个实施方案是一种方法，其包括通过基底的表面扩散碳，通过基底的表面注入碳，以及在扩散碳并将碳注入到基底的表面之后退火基底。衬底包括第一栅极，栅极间隔物，蚀刻停止层和层间电介质。第一个栅极在半导体衬底之上。栅极间隔物沿着第一栅极的侧壁。蚀刻停止层位于栅极间隔物的表面上并在半导体衬底的表面上方。层间电介质在蚀刻停止层之上。衬底的表面包括层间电介质的表面。

6. 发明授权

US08426795B2 Image display apparatus with adaptive optics for adjusting an image size formed by a projecting light 有权
标题翻译：具有用于调整由投影光形成的图像尺寸的自适应光学装置的图像显示装置
公开(公告)号：US08426795B2
公开(公告)日：2013-04-23
申请号：US12654008
申请日：2009-12-08
申请人： Po-Jen Chung , Tien-Pao Chen , Huang-Ming Chen , Chu-Ming Cheng
发明人： Po-Jen Chung , Tien-Pao Chen , Huang-Ming Chen , Chu-Ming Cheng
IPC分类号： H01L27/00
CPC分类号： G03B21/28 , G03B21/62
摘要： An image display apparatus includes a screen, a reflection mirror, an adaptive optics, and a projection unit. The reflection mirror has a reflective surface facing a light incident surface of the screen, and is separated from the light incident surface by a space. The boundary of the space is defined by the edges of the reflective surface and the light incident surface. The adaptive optics is disposed on the boundary of the space. The projection unit is disposed outside the space. The adaptive optics has a light exit side facing the reflective surface of the reflection mirror, and a light incident side facing the projection unit. A projecting light is generated from the projection unit, passes through the adaptive optics for adjusting the image size formed by the projecting light, and then is projected to the reflective surface of the reflection mirror for being reflected to the light incident surface.
摘要翻译：图像显示装置包括屏幕，反射镜，自适应光学器件和投影单元。反射镜具有面对屏幕的光入射面的反射面，并与光入射面分离一空间。空间的边界由反射表面和光入射表面的边缘限定。自适应光学器件设置在空间的边界上。投影单元设置在空间的外部。自适应光学器件具有面向反射镜的反射表面的光出射侧和面向投影单元的光入射侧。从投影单元产生投射光，通过自适应光学器件调整由投影光形成的图像尺寸，然后投影到反射镜的反射表面，以反射到光入射表面。

7. 发明申请

US20110090464A1 PROJECTION APPARATUS 审中-公开
标题翻译：投影设备
公开(公告)号：US20110090464A1
公开(公告)日：2011-04-21
申请号：US12820385
申请日：2010-06-22
申请人： Ruei-Bin Jhang , Cheng-Shun Liao , Chu-Ming Cheng , Huang-Ming Chen , Chih-Hsien Tsai , S-Wei Chen
发明人： Ruei-Bin Jhang , Cheng-Shun Liao , Chu-Ming Cheng , Huang-Ming Chen , Chih-Hsien Tsai , S-Wei Chen
IPC分类号： G03B21/28 , G03B21/14
CPC分类号： G03B21/28
摘要： A projection apparatus includes at least one light source, a field lens, a light valve, and a projection lens. The light source provides an illumination beam. The field lens is disposed in a transmission path of the illumination beam including an effective beam passing through the field lens and a ghost beam reflected by the field lens. The effective beam forms a light spot on the light valve capable of converting the effective beam into an image beam. The projection lens is disposed in a transmission path of the image beam and a ghost beam path of the ghost beam. A center of the light spot does not overlap a center of the light valve. An offset direction from the light valve to an optical axis of the projection lens is the same as a direction from the center of the light valve to the center of the light spot.
摘要翻译：投影装置包括至少一个光源，场透镜，光阀和投影透镜。光源提供照明光束。场透镜设置在包括通过场透镜的有效光束和由场透镜反射的重影光束的照明光束的传输路径中。有效光束在光阀上形成能够将有效光束转换为图像光束的光斑。投影透镜设置在图像束的传输路径和重影光束的重影光路中。光点的中心不与光阀中心重叠。从光阀到投影透镜的光轴的偏移方向与从光阀的中心到光点的中心的方向相同。

8. 发明申请

US20110090463A1 PROJECTION APPARATUS 审中-公开
标题翻译：投影设备
公开(公告)号：US20110090463A1
公开(公告)日：2011-04-21
申请号：US12820372
申请日：2010-06-22
申请人： Ruei-Bin Jhang , Cheng-Shun Liao , Chu-Ming Cheng , Huang-Ming Chen , Chih-Hsien Tsai , S-Wei Chen
发明人： Ruei-Bin Jhang , Cheng-Shun Liao , Chu-Ming Cheng , Huang-Ming Chen , Chih-Hsien Tsai , S-Wei Chen
IPC分类号： G03B21/28 , G03B21/14
CPC分类号： G03B21/28
摘要： A projection apparatus includes at least one light source, a field lens, a light valve, and a projection lens. The light source provides an illumination beam. The field lens is disposed in a transmission path of the illumination beam including an effective beam passing through the field lens and a ghost beam reflected by the field lens. The light valve converts the effective beam into an image beam. The projection lens includes a lens group, an aperture stop, and a light-shielding element. The lens group and the aperture stop are disposed in a transmission path of the image beam passing through the field lens and a ghost beam path of the ghost beam reflected by the field lens. The light-shielding element is disposed in at least a portion of the ghost beam path between the lens of the lens group furthest away from the aperture stop and the aperture stop.
摘要翻译：投影装置包括至少一个光源，场透镜，光阀和投影透镜。光源提供照明光束。场透镜设置在包括通过场透镜的有效光束和由场透镜反射的重影光束的照明光束的传输路径中。光阀将有效光束转换为图像光束。投影透镜包括透镜组，孔径光阑和遮光元件。透镜组和孔径光阑设置在通过场透镜的图像束的透射路径中，以及由场透镜反射的重影光束的重影光路。遮光元件设置在远离孔径光阑的透镜组的透镜与孔径光阑之间的重影光束路径的至少一部分中。

9. 发明申请

US20100149498A1 Image display apparatus 有权
标题翻译：图像显示装置
公开(公告)号：US20100149498A1
公开(公告)日：2010-06-17
申请号：US12654008
申请日：2009-12-08
申请人： Po-Jen Chung , Tien-Pao Chen , Huang-Ming Chen , Chu-Ming Cheng
发明人： Po-Jen Chung , Tien-Pao Chen , Huang-Ming Chen , Chu-Ming Cheng
IPC分类号： G03B21/28 , G03B21/62
CPC分类号： G03B21/28 , G03B21/62
摘要： An image display apparatus includes a screen, a reflection mirror, an adaptive optics, and a projection unit. The reflection mirror has a reflective surface facing a light incident surface of the screen, and is separated from the light incident surface by a space. The boundary of the space is defined by the edges of the reflective surface and the light incident surface. The adaptive optics is disposed on the boundary of the space. The projection unit is disposed outside the space. The adaptive optics has a light exit side facing the reflective surface of the reflection mirror, and a light incident side facing the projection unit. A projecting light is generated from the projection unit, passes through the adaptive optics for adjusting the image size formed by the projecting light, and then is projected to the reflective surface of the reflection mirror for being reflected to the light incident surface.
摘要翻译：图像显示装置包括屏幕，反射镜，自适应光学器件和投影单元。反射镜具有面对屏幕的光入射面的反射面，并与光入射面分离一空间。空间的边界由反射表面和光入射表面的边缘限定。自适应光学器件设置在空间的边界上。投影单元设置在空间的外部。自适应光学器件具有面向反射镜的反射表面的光出射侧和面向投影单元的光入射侧。从投影单元产生投射光，通过自适应光学器件调整由投影光形成的图像尺寸，然后投影到反射镜的反射表面，以反射到光入射表面。

10. 发明授权

US07713380B2 Method and apparatus for backside polymer reduction in dry-etch process 有权
标题翻译：用于干蚀刻工艺中背面聚合物还原的方法和装置
公开(公告)号：US07713380B2
公开(公告)日：2010-05-11
申请号：US10765808
申请日：2004-01-27
申请人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
发明人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
IPC分类号： C23F1/00 , B23B31/28 , H01L21/683
CPC分类号： H01L21/68735 , H01J37/3244 , H01J37/32642 , H01L21/02046 , H01L21/31116 , H01L21/67069 , Y10S156/914 , Y10S156/915 , Y10T279/23
摘要： A method for preventing the formation of contaminating polymeric films on the backsides of semiconductor substrates includes providing an oxygen-impregnated focus ring and/or an oxygen-impregnated chuck that releases oxygen during etching operations. The method further provides delivering oxygen gas to the substrate by mixing oxygen in the cooling gas mixture, maintaining the focus ring at a temperature no greater than the substrate temperature during etching and cleaning the substrate using a two step plasma cleaning sequence that includes suspending the substrate above the chuck.
摘要翻译：防止在半导体衬底的背面形成污染性聚合物膜的方法包括提供在蚀刻操作期间释放氧气的氧浸渍聚焦环和/或氧浸渍卡盘。该方法还通过在冷却气体混合物中混合氧将氧气输送到衬底，在蚀刻和清洁衬底期间将聚焦环保持在不高于衬底温度的温度，使用包括悬浮衬底的两步骤等离子体清洗序列在卡盘上方

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