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1. 发明授权

US07608382B2 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 失效
标题翻译：控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法
公开(公告)号：US07608382B2
公开(公告)日：2009-10-27
申请号：US11981617
申请日：2007-10-31
申请人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
发明人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
摘要翻译：提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。还提供了具有所需外用摩尔百分数的示例性单体。

2. 发明申请

US20080124651A1 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 失效
标题翻译：控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法
公开(公告)号：US20080124651A1
公开(公告)日：2008-05-29
申请号：US11981617
申请日：2007-10-31
申请人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
发明人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided
摘要翻译：提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。还提供了具有所需外用摩尔百分数的示例性单体

3. 发明授权

US07341816B2 Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers 有权
标题翻译：控制用于制备这种聚合物的光致抗蚀剂组合物，多环烯烃聚合物和单体的不同溶解速率的方法
公开(公告)号：US07341816B2
公开(公告)日：2008-03-11
申请号：US10783174
申请日：2004-02-20
申请人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
发明人： Larry F. Rhodes , Chun Chang , Leah J. Langsdorf , Howard A. Sidaway , Hiroshi Ito
IPC分类号： G03F7/004
CPC分类号： G03F7/0395 , G03F7/30 , Y10S430/106 , Y10S430/108
摘要： A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
摘要翻译：提供了包含具有至少一个具有所需外摩尔百分数的多环烯烃重复单元的聚合物的光致抗蚀剂组合物，其中重复单元衍生自具有所需外摩尔百分数的多环烯烃单体。具有所需外加摩尔百分比的这种重复单元的这种聚合物提供了差异溶解速率的控制，因此提供增强的成像性能。还提供了具有所需外用摩尔百分数的示例性单体。

4. 发明授权

US08633259B2 Polymer compositions for temporary bonding 有权
标题翻译：用于临时粘合的聚合物组合物
公开(公告)号：US08633259B2
公开(公告)日：2014-01-21
申请号：US13339784
申请日：2011-12-29
申请人： Larry F. Rhodes , Leah J. Langsdorf , Venkat Ram Dukkipati
发明人： Larry F. Rhodes , Leah J. Langsdorf , Venkat Ram Dukkipati
IPC分类号： G03G9/097 , B41M7/00 , A61L2/08 , H05B6/68 , C08G61/04
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译：根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。

5. 发明申请

US20120172479A1 POLYMER COMPOSITIONS FOR TEMPORARY BONDING 有权
标题翻译：用于临时粘结的聚合物组合物
公开(公告)号：US20120172479A1
公开(公告)日：2012-07-05
申请号：US13339784
申请日：2011-12-29
申请人： Larry F. Rhodes , Leah J. Langsdorf , Venkat Ram Dukkipati
发明人： Larry F. Rhodes , Leah J. Langsdorf , Venkat Ram Dukkipati
IPC分类号： C08K5/1535 , C08K5/101 , H01L21/02 , C08K5/07 , C08K5/05 , B32B37/24 , C08K5/3415 , C08K5/20
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译：根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。

6. 发明授权

US07612146B2 Polymeric compositions and uses therefor 有权
标题翻译：聚合物组合物及其用途
公开(公告)号：US07612146B2
公开(公告)日：2009-11-03
申请号：US11220814
申请日：2005-09-07
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
IPC分类号： C08F8/42
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
摘要翻译：本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。

7. 发明授权

US06949609B2 Polymeric compositions and uses therefor 失效
标题翻译：聚合物组合物及其用途
公开(公告)号：US06949609B2
公开(公告)日：2005-09-27
申请号：US10317366
申请日：2002-12-12
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
IPC分类号： C08F32/00 , C08F8/00 , C08F114/18 , C08G61/06 , G03F7/004 , G03F7/039
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition. Also disclosed are catalyst systems for use in producing the photoresist compositions of the present invention which permit molecular weight control of the photoresist products.
摘要翻译：本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。另外，本发明涉及用于后处理这种光致抗蚀剂组合物以便获得以下一种或多种的方法：（1）聚合物组合物的光密度的降低; 和（2）聚合物组合物中残余金属和/或单体的量的减少。还公开了用于制备本发明的光致抗蚀剂组合物的催化剂体系，其允许光致抗蚀剂产品的分子量控制。

8. 发明申请

US20120283404A1 Polynorbornene Pervaporation Membrane Films, Preparation and Use Thereof 有权
标题翻译：聚降冰片烯全蒸发膜薄膜的制备与应用
公开(公告)号：US20120283404A1
公开(公告)日：2012-11-08
申请号：US13532864
申请日：2012-06-26
申请人： Brian Knapp , Edmund Elce , Brian Bedwell , Leah J. Langsdorf , Ryan Wilks
发明人： Brian Knapp , Edmund Elce , Brian Bedwell , Leah J. Langsdorf , Ryan Wilks
IPC分类号： C08F232/08
CPC分类号： B01D61/362 , B01D69/02 , B01D71/44 , C12P7/16 , Y02E50/10
摘要： Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.
摘要翻译：根据本发明的实施方案提供了可用于形成渗透蒸发膜的形成聚降冰片烯，膜本身和制备这种膜的方法。

9. 发明申请

US20090188863A1 POLYNORBORNENE PERVAPORATION MEMBRANE FILMS, PREPARATION AND USE THEREOF 有权
标题翻译：多烯烃渗透膜，其制备和使用
公开(公告)号：US20090188863A1
公开(公告)日：2009-07-30
申请号：US12360820
申请日：2009-01-27
申请人： Brain Knapp , Edmund Elce , Brian Bedwell , Leah J. Langsdorf , Ryan Wilks
发明人： Brain Knapp , Edmund Elce , Brian Bedwell , Leah J. Langsdorf , Ryan Wilks
IPC分类号： B01D61/36 , B01D71/06
CPC分类号： B01D61/362 , B01D69/02 , B01D71/44 , C12P7/16 , Y02E50/10
摘要： Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.
摘要翻译：根据本发明的实施方案提供了可用于形成渗透蒸发膜的形成聚降冰片烯，膜本身和制备这种膜的方法。

10. 发明授权

US06299715B1 Urethane adhesive-laminated carpeting 失效
标题翻译：聚氨酯粘合层压地毯
公开(公告)号：US06299715B1
公开(公告)日：2001-10-09
申请号：US09115024
申请日：1998-07-14
申请人： Leah J. Langsdorf , Jeffrey L. Robbins , Ulrich B. Holeschovsky , Harry Stefanou , Barry V. Evangelist , Robert D. Duffy , Gary L. Allen
发明人： Leah J. Langsdorf , Jeffrey L. Robbins , Ulrich B. Holeschovsky , Harry Stefanou , Barry V. Evangelist , Robert D. Duffy , Gary L. Allen
IPC分类号： B32B2740
CPC分类号： B32B37/1284 , B32B2471/00 , D06N7/0071 , D06N2203/042 , D06N2203/061 , D06N2203/068 , D06N2205/045 , D06N2205/20 , D06N2207/123 , Y10T428/23993
摘要： Laminated carpeting consisting of a secondary backing adhered to a greige good of yarn tufted into a primary backing are prepared from polyurethane adhesives by single puddle processes which allow for lowered use of polyurethane while producing carpets exhibiting excellent delamination strength. Preferably, a reactive polyurethane system is employed as a primary adhesive, and the secondary backing is skip-coated with a minor amount of a non-advancing skip coat.
摘要翻译：由聚氨酯粘合剂由聚氨酯粘合剂通过单一的水泥工艺制备粘附到毛簇绒的主衬里上的辅助衬垫的层压地毯，这允许聚氨酯的使用降低，同时生产表现出优异的分层强度的地毯。优选地，使用反应性聚氨酯体系作为主要粘合剂，并且次要背衬被略微涂覆有少量的不前进的跳过涂层。

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