会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • Method for measuring three-dimension shape
    • 测量三维形状的方法
    • US20090216486A1
    • 2009-08-27
    • US12453321
    • 2009-05-07
    • Min Young KimHee Tae KimByung Min YooSe Hyun HanSeung Jun Lee
    • Min Young KimHee Tae KimByung Min YooSe Hyun HanSeung Jun Lee
    • G06F15/00G01B11/24
    • G01B11/28G01B11/2531G06T7/521
    • A method of measuring a 3D shape, which can measure a 3D shape of target objects on a board by searching a database for bare board information when a measuring object is not set to a normal inspection mode or by performing bare board teaching when the board is supplied from a supplier having not the bare board information is provided. The method of measuring a 3D shape includes operation S100 of measuring a brightness of a first illumination source 41a, operation S200 of measuring a phase-to-height conversion factor, operation S300 of determining whether the measurement is performed in a normal inspection mode, operation S400 of measuring a 3D shape of a board 62 according to the normal inspection mode, operation S500 of determining whether bare board information about the board 62 is included, operation S600 of performing bare board teaching when the bare board information is excluded, operation S700 of measuring the 3D shape of target objects on the board 62 when the bare board information is included or bare board teaching information is generated, and operation S800 of analyzing whether the board 62 is normal or abnormal by using 3D shape information. Therefore, the 3D shape of target objects on the board may be more readily measured.
    • 一种测量3D形状的方法,其可以通过在测量对象未设置为正常检查模式时通过在数据库中查找裸板信息来测量板上的目标对象的3D形状,或者当板是板时,执行裸板教学 提供从没有裸板信息的供应商提供的。 测量3D形状的方法包括测量第一照明源41a的亮度的操作S100,测量相位到高度转换因子的操作S200,确定是否在正常检查模式下执行测量的操作S300,操作 S400,根据普通检查模式测量板62的3D形状,确定是否包括关于板62的裸板信息的操作S500;当裸板信息被排除时执行裸板教学的操作S600,操作S700 当生成裸板信息或者产生裸板教学信息时,测量板62上的目标对象的3D形状,以及通过使用3D形状信息来分析板62是正常还是异常的操作S800。 因此,可以更容易地测量板上目标物体的3D形状。
    • 6. 发明申请
    • SIGNAL RESTORING APPARATUS AND METHOD THEREOF
    • 信号恢复装置及其方法
    • US20120045987A1
    • 2012-02-23
    • US12986005
    • 2011-01-06
    • Kyoung-Cheol LeeDongkuk KoYoun-Sang YooHo Sub LeeYeon Hye YiSeung Jun Lee
    • Kyoung-Cheol LeeDongkuk KoYoun-Sang YooHo Sub LeeYeon Hye YiSeung Jun Lee
    • H04B7/185
    • H04B1/525H04B7/18513
    • Provided are a signal restoring apparatus that can restore a reception signal of a counterpart terminal and increase frequency band efficiency by estimating its own transmission signal from a reception signal transmitted from a counterpart terminal through a satellite communication device and removing the estimated transmission signal, and a method thereof. The signal restoring apparatus according to the exemplary embodiment of the present invention includes: a transmitter transmitting a transmission signal to a satellite communication device; a band spread signal generator transmitting a band spread signal to the satellite communication device; a signal estimator estimating the transmission signal included in a reception signal transmitted from a counterpart terminal through the satellite communication device on the basis of the transmission signal and the band spread signal; and a signal remover removing the estimated transmission signal from the reception signal.
    • 提供一种信号恢复装置,其可以通过从通过卫星通信装置从对方终端发送的接收信号估计其自己的发送信号并且去除估计的发送信号,来恢复对方终端的接收信号并提高频带效率, 方法。 根据本发明的示例性实施例的信号恢复装置包括:向卫星通信设备发送传输信号的发射机; 频带扩展信号发生器向所述卫星通信装置发送频带扩展信号; 信号估计器,其基于所述发送信号和所述频带扩展信号,估计从对方终端经由所述卫星通信装置发送的接收信号中包含的发送信号; 以及信号去除器,从接收信号中去除估计的发送信号。
    • 10. 发明申请
    • METHOD OF FORMING AMORPHOUS CARBON FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    • 形成非晶碳膜的方法和使用其制造半导体器件的方法
    • US20080293248A1
    • 2008-11-27
    • US11839394
    • 2007-08-15
    • Keun Oh ParkByoung Dae AnSeung Jun Lee
    • Keun Oh ParkByoung Dae AnSeung Jun Lee
    • H01L21/311H05H1/24
    • H01L21/02115C23C16/26G03F7/11H01L21/02527H01L21/02592H01L21/0262H01L21/0276H01L21/0332H01L21/3146
    • The present invention relates to a method of forming an amorphous carbon film and a method of manufacturing a semiconductor device using the method. An amorphous carbon film is formed on a substrate by vaporizing a liquid hydrocarbon compound, which has chain structure and one double bond, and supplying the compound to a chamber, and ionizing the compound. The amorphous carbon film is used as a hard mask film.It is possible to easily control characteristics of the amorphous carbon film, such as a deposition rate, an etching selectivity, a refractive index (n), a light absorption coefficient (k) and stress, so as to satisfy user's requirements. In particular, it is possible to lower the refractive index (n) and the light absorption coefficient (k). As a result, it is possible to perform a photolithography process without an antireflection film that prevents the diffuse reflection of a lower material layer.Further, a small amount of reaction by-product is generated during a deposition process, and it is possible to easily remove reaction by-products that are attached on the inner wall of a chamber. For this reason, it is possible to increase a cycle of a process for cleaning a chamber, and to increase parts changing cycles of a chamber. As a result, it is possible to save time and cost.
    • 本发明涉及形成非晶碳膜的方法和使用该方法制造半导体器件的方法。 通过汽化具有链结构和一个双键的液体烃化合物并将化合物供应到室中并使化合物离子化,在基板上形成无定形碳膜。 无定形碳膜用作硬掩模膜。 可以容易地控制非晶碳膜的特性,例如沉积速率,蚀刻选择性,折射率(n),光吸收系数(k)和应力,以满足用户的要求。 特别地,可以降低折射率(n)和光吸收系数(k)。 结果,可以执行不具有防止下层材料层的漫反射的防反射膜的光刻工艺。 此外,在沉积工艺期间产生少量的反应副产物,并且可以容易地除去附着在室内壁上的反应副产物。 为此,可以增加用于清洁室的处理的循环,并且增加室的部件变化周期。 因此,可以节省时间和成本。