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1. 发明授权

US4464646A Controlled temperature coefficient thin-film circuit element 失效
标题翻译：受控温度系数薄膜电路元件
公开(公告)号：US4464646A
公开(公告)日：1984-08-07
申请号：US281169
申请日：1981-07-07
申请人： Kurt Burger , Heinz Friedrich , Heiko Gruner , Karl-Otto Linn , Erich Zabler
发明人： Kurt Burger , Heinz Friedrich , Heiko Gruner , Karl-Otto Linn , Erich Zabler
IPC分类号： H01C17/06 , G01K7/18 , H01C7/06 , H01C17/232 , H01L27/01 , H01C1/12
CPC分类号： G01K7/183 , H01C17/232 , H01C7/06
摘要： To form a temperature sensor, for example suitable in an automotive vehicle, to determine ambient temperatures, or to provide a temperature compensated thin-film circuit, for example for incorporation with an oscillator circuit, two stable thin-film layers are applied to a non-conductive substrate, the layers being capable of being etched. The overall temperature coefficient of resistance can be matched to a predetermined value by selective interconnection of at least two thin-film resistance elements formed by the thin films, of which one thin film resistance element for example comprises a nickel layer over a tantalum base, with a predetermined temperature coefficient of resistance, the other resistance element merely being the tantalum layer with essentially zero temperature coefficient of resistance, the overall temperature coefficient of resistance of the combination being determined by adjustment of the relative resistance values after measurement of the temperature coefficient of resistance of the nickel-tantalum layer to determine its actual temperature coefficient so that, in spite of tolerances in the manufacture of the thin films, interchangeable elements of highly accurate overall resistance and temperature coefficient of resistance values can be obtained.
摘要翻译：为了形成例如适合于机动车辆的温度传感器，以确定环境温度，或者提供温度补偿薄膜电路，例如用于与振荡器电路结合，将两个稳定的薄膜层施加到非 - 导电衬底，这些层能够被蚀刻。电阻的整体温度系数可以通过由薄膜形成的至少两个薄膜电阻元件的选择性互连来匹配，其中一个薄膜电阻元件例如包括在钽基底上的镍层，电阻的预定温度系数，另一个电阻元件仅仅是具有基本上为零的电阻温度系数的钽层，组合的电阻的总体温度系数是通过测量电阻温度系数后的相对电阻值的调整来确定的以确定其实际温度系数，使得尽管制造薄膜的公差尽可能地获得高度精确的总电阻和电阻温度系数的可互换元件。

2. 发明授权

US4620365A Method of making a thin-film strain gauge 失效
标题翻译：制造薄膜应变片的方法
公开(公告)号：US4620365A
公开(公告)日：1986-11-04
申请号：US699819
申请日：1985-02-08
申请人： Kurt Burger , Heiko Gruner
发明人： Kurt Burger , Heiko Gruner
IPC分类号： G01L1/22 , H01C17/12
CPC分类号： G01L1/2287 , Y10T29/49099 , Y10T29/49103
摘要： A thin-film strain gauge and a method for producing it are proposed; the strain gauge is advantageously capable of integration into a thin-film circuit. The strain gauge comprises an elastically deformable spring element in combination with at least one elongation-sensitive resistor. The resistor disposition (R1-R4), the low-impedance connections (L11-L42) between the various resistance regions and the associated connection tracks (L5-L8) are applied in a vacuum process, preferably by cathode sputtering. The low-impedance connections (L11-L42) and the connection tracks (L5-L8) are of material which, although different from the material making up the actual resistance region, still has approximately the same temperature coefficient of resistance, so as to preclude errors caused by temperature.

3. 发明授权

US4522067A Thin-film strain gauge 失效
标题翻译：薄膜应变片
公开(公告)号：US4522067A
公开(公告)日：1985-06-11
申请号：US420258
申请日：1982-09-17
申请人： Kurt Burger , Heiko Gruner
发明人： Kurt Burger , Heiko Gruner
IPC分类号： G01L1/22 , G01L9/04 , H01C17/12
CPC分类号： G01L1/2287 , Y10T29/49099 , Y10T29/49103
摘要： A thin-film strain gauge and a method for producing it are proposed; the strain gauge is advantageously capable of integration into a thin-film circuit. The strain gauge comprises an elastically deformable spring element in combination with at least one elongation-sensitive resistor. The resistor disposition (R1-R4), the low-impedance connections (L11-L42) between the various resistance regions and the associated connection tracks (L5-L8) are applied in a vacuum process, preferably by cathode sputtering. The low-impedance connections (L11-L42) and the connection tracks (L5-L8) are of material which, although different from the material making up the actual resistance region, still has approximately the same temperature coefficient of resistance, so as to preclude errors caused by temperature.
摘要翻译： PCT No.PCT / DE81 / 00228 Sec。 371日期1982年9月17日 102（e）日期1982年9月17日PCT提交1981年12月18日PCT公布。公开号WO82 / 03458 日期为1982年10月14日。提出了薄膜应变片及其制造方法。应变计有利地能够集成到薄膜电路中。应变计包括与至少一个伸长敏感电阻器组合的可弹性变形的弹簧元件。电阻器配置（R1-R4），各种电阻区域和相关联的连接磁道（L5-L8）之间的低阻抗连接（L11-L42）优选通过阴极溅射在真空工艺中施加。低阻抗连接（L11-L42）和连接轨迹（L5-L8）是材料，尽管与构成实际电阻区域的材料不同，仍然具有大致相同的电阻温度系数，从而排除温度造成的误差

4. 发明授权

US4708769A Temperature dependent electric resistor probe and a method of making the same 失效
标题翻译：温度依赖电阻探头及其制作方法
公开(公告)号：US4708769A
公开(公告)日：1987-11-24
申请号：US852808
申请日：1986-02-21
申请人： Kurt Burger , Heinz Friedrich , Thomas Molkner , Peter Schottle
发明人： Kurt Burger , Heinz Friedrich , Thomas Molkner , Peter Schottle
IPC分类号： G01F1/68 , G01F1/692 , G01K7/18 , G01K13/02 , H01C1/012 , H01C7/04 , H01L21/312 , C03C15/00
CPC分类号： G01K7/183 , G01F1/692 , Y10T29/49085
摘要： A method of making a temperature dependent resistor probe for measuring temperature or mass of a flowing medium includes (a) preparation of a support plate of a metallic material; (b) applying a support foil of a temperature resistant plastic material on one side of the support plate; (c) applying a layer of temperature dependent resistive material on the support foil and finishing the resistive layer into a measuring resistor layer; and thereafter, an opening is formed in the support plate in the area below the measuring resistor layer.
摘要翻译： PCT No.PCT / DE85 / 00247 Sec。 371日期1986年2月21日 102（e）日期1986年2月21日PCT提交1985年7月19日PCT公布。出版物WO86 / 01290 日期：1986年2月27日。一种用于测量流动介质的温度或质量的温度依赖性电阻探针的方法包括（a）制备金属材料的支撑板; （b）在支撑板的一侧上涂覆耐热塑性材料的支撑箔; （c）在支撑箔上施加温度依赖性电阻材料层并将电阻层整理成测量电阻层; 此后，在测量电阻层下方的区域中的支撑板上形成开口。

5. 发明授权

US4539059A Method of manufacturing corrosion-resistant measuring probes 失效
标题翻译：制造耐腐蚀测量探针的方法
公开(公告)号：US4539059A
公开(公告)日：1985-09-03
申请号：US513975
申请日：1983-07-14
申请人： Kurt Burger , Heinz Friedrich
发明人： Kurt Burger , Heinz Friedrich
IPC分类号： G01F15/00 , B29C65/16 , B29C65/74 , B29L9/00 , G01F1/68 , G01F1/692 , G01K7/16 , G01K7/18 , B32B31/00 , C09J5/02 , B23K9/00
CPC分类号： G01F1/692 , B29C65/16 , B29C65/7473 , B29C66/1122 , B29C66/40 , B29C66/71 , B29C66/712 , B29C66/7392 , Y10T156/1054 , Y10T156/1089 , Y10T156/1093
摘要： A method of manufacturing a self-supporting measuring probe suitable for application in a highly corrosive environment such as for example in a muffler or suction channel of a motor vehicle, is disclosed. The probe is provided with a protective foil which is applicable on a rigid substrate carrying the measuring layers, by means of a heat sealing process in which heat and pressure are simultaneously applied on the foil. In a preferred embodiment, the edges of the foil are fused to the substrate by a laser beam.
摘要翻译：公开了一种制造适用于高腐蚀性环境（例如机动车辆的消音器或吸入通道）的自支撑测量探头的方法。该探针设置有保护箔，该保护箔可以在承载测量层的刚性衬底上，通过热压过程同时施加在箔上。在优选实施例中，箔的边缘通过激光束熔合到衬底。

6. 再颁专利

USRE32571E Method of manufacturing corrosion-resistant measuring probes 失效
标题翻译：制造耐腐蚀测量探针的方法
公开(公告)号：USRE32571E
公开(公告)日：1988-01-05
申请号：US845709
申请日：1986-03-27
申请人： Kurt Burger , Heinz Friedrich
发明人： Kurt Burger , Heinz Friedrich
IPC分类号： G01F15/00 , B29C65/16 , B29C65/74 , B29L9/00 , G01F1/68 , G01F1/692 , G01K7/16 , G01K7/18
CPC分类号： G01F1/692 , B29C65/16 , B29C65/7473 , B29C66/1122 , B29C66/40 , B29C66/71 , B29C66/712 , B29C66/7392 , Y10T156/1054 , Y10T156/1089 , Y10T156/1093
摘要： A method of manufacturing a self-supporting measuring probe suitable for application in a highly corrosive environment such as for example in a muffler or suction channel of a motor vehicle, is disclosed. The probe is provided with a protective foil which is applicable on a rigid substrate carrying the measuring layers, by means of a heat sealing process in which heat and pressure are simultaneously applied on the foil. In a preferred embodiment, the edges of the foil are fused to the substrate by a laser beam.

7. 发明授权

US07942111B2 Method and device for vacuum-coating a substrate 有权
标题翻译：用于真空涂覆基材的方法和装置
公开(公告)号：US07942111B2
公开(公告)日：2011-05-17
申请号：US11008413
申请日：2004-12-09
申请人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
发明人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
IPC分类号： C23C14/00 , C23C16/00
CPC分类号： C23C28/044 , C23C8/36 , C23C14/06 , C23C14/22 , C23C16/30 , C23C16/50 , C23C28/42 , Y10T428/24975 , Y10T428/265 , Y10T428/30
摘要： A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.
摘要翻译：提出了使用等离子体CVD法对基板进行真空镀膜的方法。为了控制真空镀膜中的离子轰击，将独立于涂布等离子体生产的基板电压施加到基板上。衬底电压在涂层期间被修改。衬底电压是以0.1kHz至10MHz的频率以双极方式脉冲的直流电压。提出了一种耐磨和减摩的多层结构，交替硬质材料单层和碳或硅单层。

8. 发明申请

US20050098119A1 Method and device for vacuum-coating a substrate 有权
标题翻译：用于真空涂覆基材的方法和装置
公开(公告)号：US20050098119A1
公开(公告)日：2005-05-12
申请号：US11008413
申请日：2004-12-09
申请人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
发明人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
IPC分类号： B23B27/14 , C23C8/36 , C23C14/06 , C23C14/22 , C23C16/27 , C23C16/30 , C23C16/50 , C23C16/503 , C23C28/04 , H01J37/32 , C23C16/00
CPC分类号： C23C28/044 , C23C8/36 , C23C14/06 , C23C14/22 , C23C16/30 , C23C16/50 , C23C28/42 , Y10T428/24975 , Y10T428/265 , Y10T428/30
摘要： A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.
摘要翻译：提出了使用等离子体CVD法对基板进行真空镀膜的方法。为了控制真空镀膜中的离子轰击，将独立于涂布等离子体生产的基板电压施加到基板上。衬底电压在涂层期间被修改。衬底电压是以0.1kHz至10MHz的频率以双极方式脉冲的直流电压。提出了一种耐磨和减摩的多层结构，交替硬质材料单层和碳或硅单层。

9. 发明授权

US06869676B2 Method and device for vacuum-coating a substrate 有权
公开(公告)号：US06869676B2
公开(公告)日：2005-03-22
申请号：US10026259
申请日：2001-12-21
申请人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
发明人： Kurt Burger , Thomas Weber , Johannes Voigt , Susanne Lucas
IPC分类号： B23B27/14 , C23C8/36 , C23C14/06 , C23C14/22 , C23C16/27 , C23C16/30 , C23C16/50 , C23C16/503 , C23C28/04 , H01J37/32
CPC分类号： C23C28/044 , C23C8/36 , C23C14/06 , C23C14/22 , C23C16/30 , C23C16/50 , C23C28/42 , Y10T428/24975 , Y10T428/265 , Y10T428/30
摘要： A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

10. 发明授权

US06220203B1 Device for vacuum coating bulk material 失效
标题翻译：用于真空涂装散装材料的装置
公开(公告)号：US06220203B1
公开(公告)日：2001-04-24
申请号：US09142647
申请日：1999-06-24
申请人： Kurt Burger , Johannes Voigt , Wolfgang Reuter
发明人： Kurt Burger , Johannes Voigt , Wolfgang Reuter
IPC分类号： C23C1600
CPC分类号： C23C14/223 , C23C14/022 , C23C14/22 , H01J37/32192 , H01J37/32752 , H01J37/3405
摘要： A device for vacuum coating bulk material includes a rotating holder for accommodating the bulk material, a plasma coating source arranged within the rotating holder, as well as a device, arranged within the rotating holder, for cleaning the bulk material using plasma. During the coating process, the rotational speed of the rotating holder is less than the speed necessary for producing a centrifugal force for fixing the bulk material against the inner wall of the rotating holder. The plasma coating source and the plasma cleaning device are arranged in such a way that their spheres of action overlap.
摘要翻译：用于真空涂覆散装材料的装置包括用于容纳散装材料的旋转保持器，布置在旋转保持器内的等离子体涂覆源以及布置在旋转保持器内的用于使用等离子体清洁散装材料的装置。在涂布过程中，旋转保持器的旋转速度小于产生用于将散装材料固定在旋转保持器的内壁上的离心力所需的速度。等离子体涂覆源和等离子体清洁装置以其作用球重叠的方式排列。

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