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1. 发明申请

US20070031758A1 Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material 审中-公开
标题翻译：用于制备金属电镀成形材料的正型辐射敏感性树脂组合物，转印膜和金属电镀成形材料的制造方法
公开(公告)号：US20070031758A1
公开(公告)日：2007-02-08
申请号：US11497300
申请日：2006-08-02
申请人： Kouji Nishikawa , Kousuke Mori , Masaru Ohta , Shin-ichiro Iwanaga
发明人： Kouji Nishikawa , Kousuke Mori , Masaru Ohta , Shin-ichiro Iwanaga
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , H01L24/11 , H01L2924/01019 , H01L2924/01078 , H01L2924/01079 , H01L2924/10253 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/00
摘要： The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a radiation-sensitive acid generator; and (C) an organic solvent. The positive-type radiation-sensitive resin composition is excellent in sensitivity and resolution, exhibits excellent adhesion to a substrate, leaves no residue at an opening after development, and is capable of preventing occurrence of crack in the resin film after metal plating and push-in of plated metal into the resin film.
摘要翻译：用于生产本发明的金属镀覆成形材料的正型辐射敏感性树脂组合物包含（A）含有具有酸解离官能团的结构单元的聚合物，其在酸存在下分解成产生酸性官能团和交联结构; （B）辐射敏感酸产生剂; 和（C）有机溶剂。正型辐射敏感性树脂组合物的灵敏度和分辨率优异，表现出对基材的优异粘附性，在显影后的开口处不留下残留物，并且能够防止在金属电镀和推压后的树脂膜中发生裂纹，将电镀金属插入树脂膜中。

2. 发明申请

US20070190465A1 Positively radiation-sensitive resin composition 审中-公开
标题翻译：积极的辐射敏感树脂组合物
公开(公告)号：US20070190465A1
公开(公告)日：2007-08-16
申请号：US10593812
申请日：2005-03-24
申请人： Kouji Nishikawa , Shin-ichiro Iwanaga
发明人： Kouji Nishikawa , Shin-ichiro Iwanaga
IPC分类号： H01L21/00 , G03C5/00
CPC分类号： G03F7/405 , C08F220/18 , C08F220/30 , C08F220/58 , C08L33/066 , C08L33/26 , C25D5/022 , G03F7/0392 , G03F7/40 , H01L24/11 , H01L2224/13099 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01015 , H01L2924/01019 , H01L2924/01023 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/12044 , H01L2924/14 , H01L2924/1433 , C08L2666/04 , H01L2924/00
摘要： It is an object of the present invention to provide a production process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a positive radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a positive radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2) and an acid-dissociable functional group (b), (B) a component which generates an acid by irradiation with radiation and (C) and organic solvent, and is achieved by producing a positive radiation-sensitive resin film using the composition.
摘要翻译：本发明的目的是提供一种能够精确地制造诸如凸块或布线的大厚度的镀覆成形制品的生产方法，优选用于该方法并具有优异的阳离子敏感性树脂组合物灵敏度和分辨率，以及使用该组合物的转印膜。上述目的是通过一种正型辐射敏感性树脂组合物实现的，其包含（A）含有由下式（1）和/或下式（2）表示的结构单元和酸解离官能团（b）的聚合物，（B）通过辐射照射产生酸的组分和（C）和有机溶剂，并且通过使用该组合物生产正性辐射敏感树脂膜来实现。

3. 发明授权

US07214471B2 Photosensitive resin film and cured film made therefrom 有权
标题翻译：感光树脂膜和由其制成的固化膜
公开(公告)号：US07214471B2
公开(公告)日：2007-05-08
申请号：US10551447
申请日：2004-03-25
申请人： Shin-ichiro Iwanaga , Tooru Kimura , Kouji Nishikawa
发明人： Shin-ichiro Iwanaga , Tooru Kimura , Kouji Nishikawa
IPC分类号： G03F7/033
CPC分类号： G03F7/031 , C08L33/04 , G03F7/029 , G03F7/033 , Y10S430/111 , Y10S430/121 , Y10S430/124 , C08L2666/02
摘要： The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 μm in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 μm. According to the photosensitive resin film, a high bump having a height of not less than 50 μm can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.
摘要翻译：本发明的未固化状态的感光性树脂膜包含（A）特定的碱溶性共聚物，（B）具有至少一个烯键式不饱和双键的化合物和（C）使用辐射敏感性自由基聚合引发剂的在未固化状态下具有70μm的干膜厚度的涂膜具有不小于10％的365nm辐射透射率和不小于60％的405nm辐射透射率，其含有辐射敏感性自由基聚合引发剂（ C）相对于100重量份组分（A）为20至40重量份，干膜厚度不小于50微米。根据感光性树脂膜，通过以往的技术难以形成这样高的凸起，难以高精度地在芯片基板上形成高度不小于50μm的高凸点。此外，可以抑制元件的连接故障，并且可以提高元件的可靠性。

4. 发明授权

US07482111B2 Negative radiation-sensitive resin composition 有权
标题翻译：负辐射敏感树脂组合物
公开(公告)号：US07482111B2
公开(公告)日：2009-01-27
申请号：US10593972
申请日：2005-03-24
申请人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
发明人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
IPC分类号： G03F7/40 , H01L21/027 , G03F7/033 , G03F7/037
CPC分类号： G03F7/40 , G03F7/033 , Y10S430/107 , Y10S430/111 , Y10S430/117 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126
摘要： It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.
摘要翻译：本发明的目的是提供一种能够精确地制造诸如凸块或布线的大厚度镀覆成形制品的方法，优选用于该方法并具有优异灵敏度的负型辐射敏感性树脂组合物和分辨率，以及使用该组合物的转印膜。上述目的是通过负辐射敏感性树脂组合物实现的，其包含（A）含有由下式（1）和/或下式（2）表示的结构单元的聚合物，（B）具有至少一个烯键式不饱和双键和（C）辐射敏感自由基聚合引发剂，并使用该组合物形成负辐射敏感树脂膜。

5. 发明申请

US20060210912A1 Photosensitive resin film and cured film made therefrom 有权
标题翻译：感光树脂膜和由其制成的固化膜
公开(公告)号：US20060210912A1
公开(公告)日：2006-09-21
申请号：US10551447
申请日：2004-03-25
申请人： Shin-ichiro Iwanaga , Tooru Kimura , Kouji Nishikawa
发明人： Shin-ichiro Iwanaga , Tooru Kimura , Kouji Nishikawa
IPC分类号： G03C1/76
CPC分类号： G03F7/031 , C08L33/04 , G03F7/029 , G03F7/033 , Y10S430/111 , Y10S430/121 , Y10S430/124 , C08L2666/02
摘要： The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 μm in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 μm. According to the photosensitive resin film, a high bump having a height of not less than 50 μm can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.
摘要翻译：本发明的未固化状态的感光性树脂膜包含（A）特定的碱溶性共聚物，（B）具有至少一个烯键式不饱和双键的化合物和（C）使用辐射敏感性自由基聚合引发剂的在未固化状态下具有70μm的干膜厚度的涂膜具有不小于10％的365nm辐射透射率和不小于60％的405nm辐射透射率，其含有辐射敏感性自由基聚合引发剂（ C）相对于100重量份组分（A）为20至40重量份，干膜厚度不小于50微米。根据感光性树脂膜，通过以往的技术难以形成这样高的凸起，难以高精度地在芯片基板上形成高度不小于50μm的高凸点。此外，可以抑制元件的连接故障，并且可以提高元件的可靠性。

6. 发明申请

US20070190450A1 Negative radiation-sensitive resin composition 有权
标题翻译：负辐射敏感树脂组合物
公开(公告)号：US20070190450A1
公开(公告)日：2007-08-16
申请号：US10593972
申请日：2005-03-24
申请人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
发明人： Kouji Nishikawa , Tooru Kimura , Shin-ichiro Iwanaga
IPC分类号： G03C1/00
CPC分类号： G03F7/40 , G03F7/033 , Y10S430/107 , Y10S430/111 , Y10S430/117 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126
摘要： It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.
摘要翻译：本发明的目的是提供一种能够精确地制造诸如凸块或布线的大厚度镀覆成形制品的方法，优选用于该方法并具有优异灵敏度的负型辐射敏感性树脂组合物和分辨率，以及使用该组合物的转印膜。上述目的是通过负辐射敏感性树脂组合物实现的，其包含（A）含有由下式（1）和/或下式（2）表示的结构单元的聚合物，（B）具有至少一个烯键式不饱和双键和（C）辐射敏感自由基聚合引发剂，并使用该组合物形成负辐射敏感树脂膜。

7. 发明申请

US20070196765A1 RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS 审中-公开
标题翻译：用于生产镀层的辐射敏感性阳性树脂组合物，转印膜和用于生产镀层的方法
公开(公告)号：US20070196765A1
公开(公告)日：2007-08-23
申请号：US11677339
申请日：2007-02-21
申请人： Kousuke MORI , Kouji Nishikawa
发明人： Kousuke MORI , Kouji Nishikawa
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/40
摘要： A radiation-sensitive positive resin composition is excellent in sensitivity, resolution and adhesion to a substrate and is developed to form clear apertures without residues. The composition does not contaminate a plating solution and is capable of forming a resin film (resist) that is resistant to cracks after plating, resistant to indentation by platings, and resistant to lifting. A transfer film has the composition. A process of the invention produces thick platings as bumps or wirings with high precision.The radiation-sensitive positive resin composition for producing platings includes a polymer (A) that has at least one end terminated with —SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof) and includes a structural unit having an acid-dissociative functional group which is dissociated by an acid to yield an acidic functional group; a radiation-sensitive acid generator (B); and an organic solvent (C).
摘要翻译：辐射敏感的阳性树脂组合物的灵敏度，分辨率和对基材的粘附性优异，并被开发以形成没有残留物的透明孔。该组合物不会污染电镀液，能够形成耐电镀后的裂纹的树脂膜（抗蚀剂），耐电镀压痕，耐起重。转印膜具有组成。本发明的方法产生具有高精度的作为凸起或布线的厚电镀。用于制备电镀的辐射敏感性阳性树脂组合物包括具有至少一个末端以-SR（其中R为碳原子数1〜20的直链或支链烷基），环烷基3〜 20个碳原子或其衍生物），并且包括具有酸解离官能团的结构单元，其被酸解离以产生酸性官能团; 辐射敏感酸产生剂（B）; 和有机溶剂（C）。

8. 发明授权

US08252511B2 Method for modifying first film and composition for forming acid transfer resin film used therefor 有权
标题翻译：用于形成用于形成酸转移树脂膜的第一膜和组合物的方法
公开(公告)号：US08252511B2
公开(公告)日：2012-08-28
申请号：US12962672
申请日：2010-12-08
申请人： Kouji Nishikawa
发明人： Kouji Nishikawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/40
CPC分类号： G03F7/095 , G03F7/0045 , G03F7/0392 , G03F7/11 , G03F7/38
摘要： A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid generated by the second film is transferred to the first film. The second film is removed.
摘要翻译：第一膜修饰方法包括在包含酸解离基团的第一膜上形成第二膜。第二膜是包含光致酸发生剂的酸转移树脂膜。通过掩模使第二膜曝光，使得第二膜产生酸。由第二膜产生的酸转移到第一膜。第二部电影被删除。

9. 发明申请

US20090197193A1 TONER 有权
标题翻译：托尼
公开(公告)号：US20090197193A1
公开(公告)日：2009-08-06
申请号：US12420336
申请日：2009-04-08
申请人： Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
发明人： Yoshihiro Ogawa , Yusuke Hasegawa , Kouji Nishikawa , Miho Okazaki , Takashige Kasuya
IPC分类号： G03G9/08
CPC分类号： G03G9/08782 , G03G9/0812
摘要： To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized by i) being an oxidized hydrocarbon wax, ii) having a hydroxyl value of from 5 mgKOH/g or more to 150 mgKOH/g or less, and iii) having, in molecular weight distribution measured by gel permeation chromatography of tetrahydrofuran-soluble matter, a main peak within the range of molecular weight of from 200 or more to 600 or less, and a component with a molecular weight of 700 or more in a content of 3% by mass or less.
摘要翻译：为了提供具有优异的低温定影性能，高温抗粘着性和显影性能的调色剂，并且不会使调色剂熔融粘附到感光构件上，也不会导致清洁刮片的翻转。调色剂至少含有粘合剂树脂，着色剂和蜡，并且蜡的特征在于i）是氧化烃蜡，ii）羟值为5mgKOH / g以上至150mgKOH / g以下，和iii）在分子量为200以上且600以下的主峰和分子量为700以下的成分中，具有通过四氢呋喃可溶物质的凝胶渗透色谱法测定的分子量分布，更多的是3质量％以下的含量。

10. 发明申请

US20050271613A1 Beta-1, 3-1, 6-D-glucan and its use 审中-公开
标题翻译： β-1，3-1,6-D-葡聚糖及其用途
公开(公告)号：US20050271613A1
公开(公告)日：2005-12-08
申请号：US11090052
申请日：2005-03-28
申请人： Toshio Suzuki , Seiji Nakamura , Satoshi Nakayama , Kouji Nishikawa
发明人： Toshio Suzuki , Seiji Nakamura , Satoshi Nakayama , Kouji Nishikawa
IPC分类号： A61K31/715 , A61K7/06 , A61K7/11
CPC分类号： C08B37/0024 , A23L29/271 , A23L33/21 , A61K8/73 , A61K31/716 , A61Q19/00 , C08B37/0003 , C08L5/00 , C12P19/04 , C12R1/645 , Y02A50/463
摘要： An aqueous β-1,3-1,6-D-glucan solution, wherein 1HNMR spectra on its solution containing in 1N aqueous sodium hydroxide heavy solution have two signals of 4.7 ppm and 4.5 ppm and the viscosity (BM type rotary-viscometer, 12 rpm) of its solution at 30° C., pH5.0, and its concentration 0.5% (w/v) is 50 cP ([mPa.s]) or less.
摘要翻译：其中在含有1N氢氧化钠水溶液的溶液中的1 HNMR光谱的β-1,3-1,6-D-葡聚糖水溶液具有4.7ppm和4.5ppm的两个信号，并且其溶液在30℃，pH5.0，其浓度为0.5％（w / v）下的粘度（BM型旋转粘度计，12rpm）为50cP（[mPa.s]）以下。

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