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1. 发明授权

US07202175B2 Method and apparatus for treating a substrate surface by bubbling 有权
标题翻译：用于通过鼓泡处理基材表面的方法和设备
公开(公告)号：US07202175B2
公开(公告)日：2007-04-10
申请号：US10702442
申请日：2003-11-07
申请人： Kon-Tsu Kin , Chiou-Mei Chen , Jen-Chung Lou , Ching-Yi Hsu , Farhang Shadman
发明人： Kon-Tsu Kin , Chiou-Mei Chen , Jen-Chung Lou , Ching-Yi Hsu , Farhang Shadman
IPC分类号： H01L21/302
CPC分类号： B08B3/04 , B08B2203/005 , C11D3/0052 , G03F7/42 , G03F7/422 , G03F7/427 , H01L21/31133 , H01L21/67057 , H01L21/67086
摘要： The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.
摘要翻译：本发明公开了从基板表面去除物质的技术，例如从晶片剥离光致抗蚀剂，或在基板表面上形成物质。待处理的基板以相等的间隔平行布置，并浸没在液体中，其下部仅在液体表面下方。将诸如臭氧的气体引入液体中，并且在基底之下连续鼓泡。气泡将在两个相邻的基板之间上升，并在它们爆裂之前爬上基板的表面。衬底表面上的液体边界层在气泡上升的过程中被压缩和刷新，增强液体/液体/固体物质在液体边界层之间的传质，从而导致快速反应和快速处理基片的表面。

2. 发明申请

US20050101144A1 Method and apparatus for treating a substrate surface by bubbling 有权
标题翻译：用于通过鼓泡处理基材表面的方法和设备
公开(公告)号：US20050101144A1
公开(公告)日：2005-05-12
申请号：US10702442
申请日：2003-11-07
申请人： Kon-Tsu Kin , Chiou-Mei Chen , Jen-Chung Lou , Ching-Yi Hsu , Farhang Shadman
发明人： Kon-Tsu Kin , Chiou-Mei Chen , Jen-Chung Lou , Ching-Yi Hsu , Farhang Shadman
IPC分类号： B08B3/04 , C11D3/00 , G03F7/42 , H01L21/00 , H01L21/302 , H01L21/311 , H01L21/461
CPC分类号： B08B3/04 , B08B2203/005 , C11D3/0052 , G03F7/42 , G03F7/422 , G03F7/427 , H01L21/31133 , H01L21/67057 , H01L21/67086
摘要： The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.
摘要翻译：本发明公开了从基板表面去除物质的技术，例如从晶片剥离光致抗蚀剂，或在基板表面上形成物质。待处理的基板以相等的间隔平行布置，并浸没在液体中，其下部仅在液体表面下方。将诸如臭氧的气体引入液体中，并且在基底之下连续鼓泡。气泡将在两个相邻的基板之间上升，并在它们爆裂之前爬上基板的表面。衬底表面上的液体边界层在气泡上升的过程中被压缩和刷新，增强液体/液体/固体物质在液体边界层之间的传质，从而导致快速反应和快速处理基片的表面。

3. 发明申请

US20060251564A1 Carbon nanomaterial purification method 审中-公开
标题翻译：碳纳米材料净化方法
公开(公告)号：US20060251564A1
公开(公告)日：2006-11-09
申请号：US11274325
申请日：2005-11-16
申请人： Kon-Tsu Kin , Chiou-Mei Chen , Ching-Yi Hsu
发明人： Kon-Tsu Kin , Chiou-Mei Chen , Ching-Yi Hsu
IPC分类号： C01B31/02
CPC分类号： B82Y10/00 , B82Y30/00 , B82Y40/00 , C01B32/17 , C01B2202/02 , C01B2202/06 , H01L51/0025 , H01L51/0048
摘要： A method for purifying carbon nanomaterial. This method comprises providing a carbon nanomaterial or a device substrate having a carbon nanomaterial. The carbon nanomaterial or the device substrate having a carbon nanomaterial is placed in a chamber. Ozone is introduced into the chamber at room temperature and atmospheric pressure to oxidize and remove impurities from the carbon nanomaterial.
摘要翻译：碳纳米材料的净化方法。该方法包括提供具有碳纳米材料的碳纳米材料或器件衬底。将具有碳纳米材料的碳纳米材料或器件基板放置在室中。在室温和大气压下将臭氧引入室中以氧化和除去碳纳米材料中的杂质。

4. 发明申请

US20070131254A1 Washing apparatus with bubbling reaction and a washing method of using bubbling reaction 审中-公开
标题翻译：具有鼓泡反应的洗涤装置和使用鼓泡反应的洗涤方法
公开(公告)号：US20070131254A1
公开(公告)日：2007-06-14
申请号：US11417032
申请日：2006-05-04
申请人： Kon-Tsu Kin , Chiou-Mei Chen , Ching-Yi Hsu , Yung-Chi Kuo
发明人： Kon-Tsu Kin , Chiou-Mei Chen , Ching-Yi Hsu , Yung-Chi Kuo
IPC分类号： B08B3/00 , B08B3/12
CPC分类号： B08B3/10 , B08B3/08 , B08B3/102 , G03F7/423 , H01L21/67057
摘要： The present invention relates to a washing apparatus with bubbling reaction and a washing method of using bubbling reaction which are based on compression technology of an interface diffusion layer with bubbling, by the aid of using a bubble wall generated by a pneumatic means as a reaction interface in a gas-liquid-solid heterogeneous system and utilizing a pulling force generated by bubbles when climbing up along the surface of a material to be washed, to compress thickness of the liquid-solid interface and optimize mass transfer efficiency in multiphase that can remove organic matter from the material surface.
摘要翻译：本发明涉及一种具有鼓泡反应的洗涤装置和使用鼓泡反应的洗涤方法，该方法基于通过鼓泡的界面扩散层的压缩技术，借助于使用由气动装置产生的气泡壁作为反应界面在气 - 液 - 固体异质系统中，当沿着待洗涤材料的表面上升时，利用由气泡产生的拉力，以压缩液 - 固界面的厚度，并优化能够去除有机物的多相中的传质效率物质表面。

5. 发明授权

US08696183B2 Backlight module 有权
标题翻译：背光模组
公开(公告)号：US08696183B2
公开(公告)日：2014-04-15
申请号：US13523636
申请日：2012-06-14
申请人： Yi-Pai Huang , Ching-Yi Hsu , Chih-Hung Ting , Che-Hsuan Yang
发明人： Yi-Pai Huang , Ching-Yi Hsu , Chih-Hung Ting , Che-Hsuan Yang
IPC分类号： F21V7/22 , G02B6/42
CPC分类号： G02B6/0021 , G02B6/0033
摘要： A backlight module has a light guide plate, a notch structure, a light absorption layer, and at least one light source. The light guide plate has a light-emitting surface and at least one side surface forming an angle with the light-emitting surface. The notch structure is continuously formed on the side surface and concave towards the inside of the light guide plate. The light absorption layer is distributed on an area substantially overlapping the notch structure, and the light source is stored in the notch structure.
摘要翻译：背光模块具有导光板，凹口结构，光吸收层和至少一个光源。导光板具有发光面和与发光面形成一定角度的至少一个侧面。凹口结构在侧表面上连续地形成，并且朝向导光板的内侧凹陷。光吸收层分布在基本上与切口结构重叠的区域上，光源被存储在凹口结构中。

6. 发明授权

US08091572B2 Method for tracking pollution source in process water 有权
公开(公告)号：US08091572B2
公开(公告)日：2012-01-10
申请号：US12615707
申请日：2009-11-10
申请人： Chien-Hung Chen , Ching-Yi Hsu , Chen-Hua Chu , Meng-Shun Huang
发明人： Chien-Hung Chen , Ching-Yi Hsu , Chen-Hua Chu , Meng-Shun Huang
IPC分类号： E03B1/00
CPC分类号： C02F1/006 , C02F1/008 , C02F2101/14 , C02F2209/05 , C02F2209/06 , C02F2209/20 , G01N33/18 , G01N33/1846 , Y10T137/0324 , Y10T137/2509
摘要： A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.

7. 发明申请

US20120034635A1 METHOD FOR AMPLIFYING ADENOSINE TRIPHOSPHATE AND METHOD AND REAGENT FOR DETECTING THE CONCENTRATION OF MICROORGANISMS 审中-公开
标题翻译：用于放大二磷酸腺苷的方法和用于检测微生物浓度的方法和试剂
公开(公告)号：US20120034635A1
公开(公告)日：2012-02-09
申请号：US12954824
申请日：2010-11-26
申请人： Ching-Yi Hsu , Meng-Shun Huang , Hwan-You Chang , Hui-Ju Lee , Ming-Rong Ho
发明人： Ching-Yi Hsu , Meng-Shun Huang , Hwan-You Chang , Hui-Ju Lee , Ming-Rong Ho
IPC分类号： C12Q1/66 , C12P19/32
CPC分类号： C12P19/32 , C12Q1/04 , C12Q1/66 , C12Y113/12007 , C12Y207/02001 , C12Y207/04003 , C12Y207/07004
摘要： A method for amplifying adenosine triphosphate is provided, including mixing adenosine triphosphate sulfurylase, adenosine 5′ phosphosulfate, adenylate kinase, uridine triphosphate, acetate kinase, acetyl phosphate, luciferin and luciferase in the presence of ATP to form a mixture, and reacting the mixture to amplify ATP. A method and reagent for detecting a concentration of microorganisms are also provided.
摘要翻译：提供了一种扩增三磷酸腺苷的方法，包括在ATP存在下混合三磷酸腺苷硫酸化酶，腺苷5'磷酸硫酸，腺苷酸激酶，尿苷三磷酸，乙酸激酶，乙酰磷酸，荧光素和萤光素酶，形成混合物，放大ATP 还提供了用于检测微生物浓度的方法和试剂。

8. 发明授权

US08196596B2 Method for tracking pollution source in process water 有权
标题翻译：跟踪工艺用水中污染源的方法
公开(公告)号：US08196596B2
公开(公告)日：2012-06-12
申请号：US13315112
申请日：2011-12-08
申请人： Chien-Hung Chen , Ching-Yi Hsu , Chen-Hua Chu , Meng-Chun Huang
发明人： Chien-Hung Chen , Ching-Yi Hsu , Chen-Hua Chu , Meng-Chun Huang
IPC分类号： E03B1/00
CPC分类号： C02F1/006 , C02F1/008 , C02F2101/14 , C02F2209/05 , C02F2209/06 , C02F2209/20 , G01N33/18 , G01N33/1846 , Y10T137/0324 , Y10T137/2509
摘要： A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.
摘要翻译：提出了一种追踪过程水污染源的方法。首先，分别获得从不同冲洗槽排出的排水的变化曲线，并检测排放到缓冲罐的排水的水质浓度，从而输出水质变化曲线。然后，对各排水量变化曲线和水质变化曲线在同一时间间隔内进行分析比较，从而将排水的每个流量的分析结果输出在超过规定水质标准的范围内。以这种方式，可以根据分析结果实时地跟踪超过预定水质标准的排水，从而快速改进排水的过程。

9. 发明申请

US20100066654A1 THREE-DIMENSIONAL DISPLAY DEVICE 审中-公开
标题翻译：三维显示设备
公开(公告)号：US20100066654A1
公开(公告)日：2010-03-18
申请号：US12270835
申请日：2008-11-13
申请人： Yi-Pai Huang , Ching-Yi Hsu , Yu-Chen Chang , Chih-Ping Su , Chia-Lin Liu
发明人： Yi-Pai Huang , Ching-Yi Hsu , Yu-Chen Chang , Chih-Ping Su , Chia-Lin Liu
IPC分类号： G09G3/32
CPC分类号： H04N13/395 , G02F1/1347
摘要： A three-dimensional display device including a collimated backlight module, a first display panel, a second display panel, and a lens array is provided. The collimated backlight module has a light-emitting surface and provides a light with a divergent angle smaller than 10° from the light-emitting surface. The first display panel having a plurality of first pixels is disposed on the collimated backlight module. The second display panel has a plurality of second pixels corresponding to the first pixels. The first display panel is disposed between the second display panel and the collimated backlight module. A depth distance is formed between the first display panel and the second display panel. The lens array is disposed adjacent to the second display panel and has a plurality of lenses corresponding to the second pixels. Therefore, the three-dimensional display device is capable of providing a wide visual angle and desirable depth characteristics.
摘要翻译：提供了包括准直背光模块，第一显示面板，第二显示面板和透镜阵列的三维显示装置。准直背光模块具有发光表面，并且提供与发光表面小于10°的发散角的光。具有多个第一像素的第一显示面板设置在准直背光模块上。第二显示面板具有对应于第一像素的多个第二像素。第一显示面板设置在第二显示面板和准直背光模块之间。在第一显示面板和第二显示面板之间形成深度距离。透镜阵列邻近第二显示面板设置并具有与第二像素对应的多个透镜。因此，三维显示装置能够提供宽视角和期望的深度特性。

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