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1. 发明申请

US20050084442A1 Chemical reprocessing method, chemical reprocessing apparatus, and method of manufacturing fluorite 审中-公开
标题翻译：化学处理方法，化学处理装置和萤石的制造方法
公开(公告)号：US20050084442A1
公开(公告)日：2005-04-21
申请号：US10922097
申请日：2004-08-20
申请人： Koji Yashima
发明人： Koji Yashima
IPC分类号： C02F1/58 , C01F11/22
CPC分类号： C01F11/22
摘要： To make it possible to recover calcium fluoride with a high purity that can be used in semiconductor manufacturing in a method that recovers calcium fluoride by having hydrofluoric acid in an etchant waste liquid contact calcium carbonate; a chemical reprocessing method, which includes hydrofluoric acid used in a semiconductor manufacturing process, includes producing calcium fluoride by causing a used chemical including hydrofluoric acid to react with calcium carbonate, the calcium fluoride being produced starting from a state where a pH exceeds 7 and the calcium fluoride is recovered from a reaction column when the pH becomes 7 or below.
摘要翻译：通过在蚀刻剂废液中的氢氟酸与碳酸钙接触的方法可以回收可用于半导体制造的高纯度的氟化钙，包括在半导体制造方法中使用的氢氟酸的化学后处理方法包括通过使包含氢氟酸的使用化学物质与碳酸钙反应来生产氟化钙，从pH超过7的状态开始产生氟化钙，当pH变为7以下时，从反应塔回收氟化钙。

2. 发明授权

US5685949A Plasma treatment apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US5685949A
公开(公告)日：1997-11-11
申请号：US590057
申请日：1996-01-16
申请人： Koji Yashima
发明人： Koji Yashima
IPC分类号： H05H1/46 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/316 , H01L21/318 , H01L21/324 , H01L21/00
CPC分类号： H01J37/32082 , H01J37/3255 , H01J2237/2001
摘要： A plasma treatment apparatus for plasma treating an object to be treated or workpiece by exposure to ions, free radicals and activated gas species generated by a plasma discharge includes a suscepter electrode supposing the workpiece and another electrode facing the suscepter electrode, together constituting a pair of plasma generating electrodes across which an AC voltage is applied. The apparatus also includes halogen lamps which are disposed outside of the respective electrodes for radiating heat rays to the object. The plasma generating electrodes are formed of a material which transmits the heat rays from the halogen lamp and resists a temperature of about 200.degree. C. or higher, such as a doped silicon in which impurities are doped into a silicon substrate. Thus, the object may be treated in a short time and at a low temperature by heating and using a plasma.
摘要翻译：一种等离子体处理装置，用于通过暴露于由等离子体放电产生的离子，自由基和活性气体等离子体处理待处理物体或工件，包括：假定工件的另一电极，另一电极面对所述电容器，一起构成一对施加有交流电压的等离子体产生电极。该设备还包括卤素灯，其设置在各个电极的外侧，用于向物体辐射热射线。等离子体产生电极由传递来自卤素灯的热射线并抵抗约200℃或更高温度的材料形成，例如杂质被掺杂到硅衬底中的掺杂硅。因此，可以通过加热和使用等离子体在短时间和低温下处理物体。

3. 发明申请

US20090120020A1 COMPOSITE INTEGRATED MODULE 审中-公开
标题翻译：复合集成模块
公开(公告)号：US20090120020A1
公开(公告)日：2009-05-14
申请号：US12181726
申请日：2008-07-29
申请人： Kenji Akagi , Koji Yashima , Yuji Yasuda , Susumu Futamura
发明人： Kenji Akagi , Koji Yashima , Yuji Yasuda , Susumu Futamura
IPC分类号： E04B1/16
CPC分类号： G21D1/00 , Y02E30/40
摘要： A composite integrated module, comprising a formwork; a plurality of frame members mounted on one surface of the formwork; and at least one embedded plate, to which a support member for supporting a first plant structure member is attached, mounted directly to at least one the frame member, wherein one surface, which does not mounted on the frame member, of the embedded plate faces to a direction in which another surface, which does not mounted on the frame member, of the formwork faces.
摘要翻译：一种复合集成模块，包括模板; 安装在所述模板的一个表面上的多个框架构件; 以及至少一个嵌入板，用于支撑第一植物结构构件的支撑构件附接到所述嵌入板，所述至少一个嵌入板直接安装在所述框架构件的至少一个框架构件上，其中，所述嵌入板面中没有安装在所述框架构件上的一个表面到不装配在框架构件上的另一表面的模板面的方向。

4. 发明申请

US20080124267A1 Chemical reprocessing method, chemical reprocessing apparatus, and method of manufacturing fluorite 审中-公开
标题翻译：化学处理方法，化学处理装置和萤石的制造方法
公开(公告)号：US20080124267A1
公开(公告)日：2008-05-29
申请号：US12007022
申请日：2008-01-04
申请人： Koji Yashima
发明人： Koji Yashima
IPC分类号： C01F11/22
CPC分类号： C01F11/22
摘要： To make it possible to recover calcium fluoride with a high purity that can be used in semiconductor manufacturing in a method that recovers calcium fluoride by having hydrofluoric acid in an etchant waste liquid contact calcium carbonate; a chemical reprocessing method, which includes hydrofluoric acid used in a semiconductor manufacturing process, includes producing calcium fluoride by causing a used chemical including hydrofluoric acid to react with calcium carbonate, the calcium fluoride being produced starting from a state where a pH exceeds 7 and the calcium fluoride is recovered from a reaction column when the pH becomes 7 or below.
摘要翻译：通过在蚀刻剂废液中的氢氟酸与碳酸钙接触的方法可以回收可用于半导体制造的高纯度的氟化钙，包括在半导体制造方法中使用的氢氟酸的化学后处理方法包括通过使包含氢氟酸的使用化学物质与碳酸钙反应来生产氟化钙，从pH超过7的状态开始产生氟化钙，当pH变为7以下时，从反应塔回收氟化钙。

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