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1. 发明授权

US08420294B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08420294B2
公开(公告)日：2013-04-16
申请号：US13304478
申请日：2011-11-25
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/004 , G03F7/30 , C07C309/65 , C07C309/71 , C07D321/10 , C07D321/12
CPC分类号： C07D317/72 , C07D233/54 , C07D317/22 , C07D317/24 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a salt represented by the formula (I): wherein R1 and R2 independently each represent a C1-C6 alkyl group or R1 and R2 are bonded each other to form a C5-C20 aliphatic ring together with the carbon atom to which they are bonded, R3 and R4 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which may be substituted with one or more fluorine atoms, and Z1+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中R 1和R 2各自独立地表示C 1 -C 6烷基，或者R 1和R 2彼此键合以与碳原子一起形成C 5 -C 20脂族环， R 3和R 4各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO- 并且其可以被一个或多个氟原子取代，Z 1 +表示有机抗衡离子。

2. 发明授权

US08921029B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08921029B2
公开(公告)日：2014-12-30
申请号：US13551807
申请日：2012-07-18
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07D333/46 , C07D335/02 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07D333/46 , C07D335/02 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，R2，RII1，RII2，LII1，YII1，RII3，RII4，RII5，RII6，RII7，n，s和RII8 在规范中定义。

3. 发明授权

US08663900B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08663900B2
公开(公告)日：2014-03-04
申请号：US13551906
申请日：2012-07-18
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，RII1，RII2，LII1，YII1，RII3，RII4，RII5，RII6，RII7，n s和RII8在本说明书中定义。

4. 发明授权

US08617790B2 Photoresist composition and method for producing photoresist pattern 有权
标题翻译：光致抗蚀剂组合物及其制造方法
公开(公告)号：US08617790B2
公开(公告)日：2013-12-31
申请号：US13448591
申请日：2012-04-17
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： C07C303/22 , C07C303/32 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y02P20/55 , C07C309/17
摘要： A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L1 is not a single bond when n is 0, R1 represents a hydroxy group or a hydroxy group protected by a protecting group, and Z+ represents an organic cation.
摘要翻译：一种光致抗蚀剂组合物，其包含（A）具有含酸不稳定基团的结构单元和含内酯环结构单元的树脂和（B）由式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，n表示0或1，L1表示单键或C1-C10烷二基，其中亚甲基可被氧原子或羰基取代，条件是L1不为当n为0时，单键，R1表示羟基或被保护基保护的羟基，Z +表示有机阳离子。

5. 发明授权

US09260407B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US09260407B2
公开(公告)日：2016-02-16
申请号：US13295943
申请日：2011-11-14
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , C07D327/02 , C07D327/04 , C07D327/06 , C07D333/46 , C07D335/02 , C07D337/04 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , G03F7/039 , G03F7/38 , G03F7/20
CPC分类号： C07D327/02 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07D327/04 , C07D327/06 , C07D333/46 , C07D335/02 , C07D337/04 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： The present invention provides a salt represented by the formula (I): wherein R1, R2, L1, Y, R3, R4, R5, R6, R7, n, s, and R8 represent variables outlined in the specification.
摘要翻译：本发明提供由式（I）表示的盐：其中R1，R2，L1，Y，R3，R4，R5，R6，R7，n，s和R8表示说明书中概述的变量。

6. 发明授权

US09051247B2 Salt, photoresist composition, and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US09051247B2
公开(公告)日：2015-06-09
申请号：US13443175
申请日：2012-04-10
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D327/08 , C07C309/17 , C07D333/46 , C07C381/12 , C07C25/18 , C08F220/28 , C08F220/38 , G03F7/039 , G03F7/20
CPC分类号： C07C309/12 , C07C25/18 , C07C303/32 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D327/08 , C07D333/46 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y02P20/55
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.
摘要翻译：由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，n表示0或1，L1表示单键或C1-C10烷二基，其中亚甲基可以被氧原子或羰基取代，条件是当n为0时，L1不是单键，环W表示可以被氧原子替代亚甲基的C 3 -C 36脂族环，硫原子，羰基或磺酰基，其中氢原子可以被羟基，C 1 -C 12烷基或C 1 -C 12烷氧基取代，R 1表示羟基或被保护基保护的羟基， Z +表示有机阳离子。

7. 发明授权

US08852846B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08852846B2
公开(公告)日：2014-10-07
申请号：US13439478
申请日：2012-04-04
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D279/12 , C07D303/32 , G03F7/039 , G03F7/20
CPC分类号： C07D279/12 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D303/32 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/123
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5): and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C20二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，W表示由式（W1），（W2），（W3），（W4）或（W5）表示的基团：Z +表示有机抗衡离子。

8. 发明授权

US08846294B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08846294B2
公开(公告)日：2014-09-30
申请号：US13434251
申请日：2012-03-29
申请人： Koji Ichikawa , Yukako Anryu , Satoshi Yamaguchi
发明人： Koji Ichikawa , Yukako Anryu , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/111
摘要： The present invention provides a photoresist composition comprising the following components (A), (B) and (X): (A) a resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, (B) an acid generator, (X) at least one compound selected from the group consisting of a compound represented by the formula (I-a): wherein Z1 represent a C1-C20 divalent saturated aliphatic hydrocarbon group in which one or more —CH2— may be replaced by —O— or —CO—, and a compound represented by the formula (I-b): wherein R1 represents a C1-C20 monovalent saturated aliphatic hydrocarbon group in which one or more hydrogen atoms may be substituted with a hydroxyl group and one or more —CH2— may be replaced by —O— or —CO—, and n represents 0 or 1.
摘要翻译：本发明提供了包含以下组分（A），（B）和（X））的光致抗蚀剂组合物：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸，（B）酸产生剂，（X）至少一种选自由式（Ia）表示的化合物的化合物：其中Z1表示C1-C20二价饱和脂族烃基，其中一个或多个 -CH 2 - 可以被-O-或-CO-代替，和由式（Ib）表示的化合物：其中R1表示其中一个或多个氢原子可被一个或多个氢原子取代的C1-C20一价饱和脂族烃基羟基和一个或多个-CH 2 - 可以被-O-或-CO-代替，并且n表示0或1。

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