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1. 发明授权

US08288077B2 Chemically amplified resist composition and salt employed therein 有权
标题翻译：化学扩增抗蚀剂组合物和其中使用的盐
公开(公告)号：US08288077B2
公开(公告)日：2012-10-16
申请号：US12844557
申请日：2010-07-27
申请人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
发明人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
IPC分类号： G03F7/004 , C07C309/00
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/77 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.
摘要翻译：本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族烃基。

2. 发明申请

US20110076617A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110076617A1
公开(公告)日：2011-03-31
申请号：US12888243
申请日：2010-09-22
申请人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
发明人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
IPC分类号： G03F7/20 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
摘要翻译：本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团。

3. 发明授权

US08530135B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08530135B2
公开(公告)日：2013-09-10
申请号：US12888243
申请日：2010-09-22
申请人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
发明人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
摘要翻译：本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团。

4. 发明申请

US20110020749A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN 有权
标题翻译：化学稳定组合物和盐使用的盐
公开(公告)号：US20110020749A1
公开(公告)日：2011-01-27
申请号：US12844557
申请日：2010-07-27
申请人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
发明人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
IPC分类号： G03F7/004 , C07C69/757 , C07D307/77 , C07C69/78 , C07C69/65 , C07D333/46
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/77 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.
摘要翻译：本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族烃基。

5. 发明授权

US08741541B2 Compound, resin, photoresist composition, and method for producing photoresist pattern 有权
标题翻译：化合物，树脂，光致抗蚀剂组合物，以及光致抗蚀剂图案的制造方法
公开(公告)号：US08741541B2
公开(公告)日：2014-06-03
申请号：US13475594
申请日：2012-05-18
申请人： Koji Ichikawa , Isao Yoshida
发明人： Koji Ichikawa , Isao Yoshida
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C08F122/20 , C07C69/757 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.
摘要翻译：由式（I）表示的化合物：其中，T1表示单键或C6-C14芳香族烃基，L1表示可以被氧原子或羰基取代亚甲基的C1-C17二价饱和烃基，L2和L3各自独立地表示单键或C1-C6二价饱和烃基，其中亚甲基可被氧原子或羰基取代，环W1和环W2各自独立地表示C3-C36烃环，R 1和R 2各自独立地表示氢原子，羟基或C 1 -C 6烷基，R 3和R 4各自独立地表示羟基或C 1 -C 6烷基，R 5表示羟基或甲基，m 表示0或1，t和u各自独立地表示0〜2的整数。

6. 发明授权

US08236842B2 Salt and process for producing acid generator 有权
标题翻译：盐和生产酸发生剂的方法
公开(公告)号：US08236842B2
公开(公告)日：2012-08-07
申请号：US13025637
申请日：2011-02-11
申请人： Isao Yoshida , Koji Ichikawa
发明人： Isao Yoshida , Koji Ichikawa
IPC分类号： A61K31/4174 , C07D233/60
CPC分类号： C07D233/14 , C07C303/22 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C07C309/17
摘要： A salt represented by the formula (I0): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a divalent C1-C17 hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, m represents 1 or 2, and Zm+ represents m-valent organic or inorganic cation.
摘要翻译：由式（I0）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示二价C1-C17烃基，其中一个或多个-CH2-可以被 - O-或-CO-，m表示1或2，Zm +表示m价有机或无机阳离子。

7. 发明授权

US08765351B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08765351B2
公开(公告)日：2014-07-01
申请号：US12946243
申请日：2010-11-15
申请人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
发明人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
IPC分类号： G03F7/00 , C07C309/19
CPC分类号： C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

8. 发明授权

US08741544B2 Salt, photoresist composition and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US08741544B2
公开(公告)日：2014-06-03
申请号：US13589852
申请日：2012-08-20
申请人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
发明人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
IPC分类号： G03F7/00 , C07C317/06 , C07C309/19 , C07C309/07
CPC分类号： C07C381/12 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/00 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
摘要翻译：含有难溶性或不溶性但通过酸作用而溶于碱性水溶液的树脂的光致抗蚀剂组合物和式（I）表示的盐：其中Q1，Q2，L1，W1，W2，R1 在说明书中定义了R2，t1和t2，Z +表示有机阳离子。

9. 发明授权

US08735044B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08735044B2
公开(公告)日：2014-05-27
申请号：US12786738
申请日：2010-05-25
申请人： Koji Ichikawa , Isao Yoshida
发明人： Koji Ichikawa , Isao Yoshida
IPC分类号： G03F7/039 , C07C303/32 , G03F7/004
CPC分类号： G03F7/039 , C07C303/32 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（a）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，X2表示单键等，Y1表示C3-C6脂肪族烃基等。条件是-X2-Y1基团具有一个或多个氟原子，Z +表示有机抗衡阳离子，以及包含由式（a）表示的盐的光致抗蚀剂组合物和包含具有酸性基团的结构单元的树脂，不稳定的基团，并且在碱性水溶液中不溶或难溶，但是通过酸的作用变得可溶于碱性水溶液。

10. 发明授权

US08685617B2 Salt, photoresist composition and process for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US08685617B2
公开(公告)日：2014-04-01
申请号：US13333521
申请日：2011-12-21
申请人： Koji Ichikawa , Isao Yoshida , Yuki Suzuki
发明人： Koji Ichikawa , Isao Yoshida , Yuki Suzuki
IPC分类号： G03F7/004 , G03F7/028 , C07C309/02 , C07C309/04 , C07C309/06
CPC分类号： C07C309/17 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (I): wherein Q1, Q2, L1, L2, ring W, s, t, R1, R2 and Z+ are defined in the specification.
摘要翻译：由式（I）表示的盐：其中Q1，Q2，L1，L2，环W，s，t，R1，R2和Z +在说明书中定义。

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