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1. 发明授权

US08557500B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08557500B2
公开(公告)日：2013-10-15
申请号：US13406634
申请日：2012-02-28
申请人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
发明人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C309/17 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D303/16 , C07D305/06 , C07D307/33 , C07D307/77 , C07D327/04 , C07D333/46 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

2. 发明授权

US08663899B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08663899B2
公开(公告)日：2014-03-04
申请号：US13551855
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, R2, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，R2，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4和Z1 +在本说明书中定义。

3. 发明授权

US09429841B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09429841B2
公开(公告)日：2016-08-30
申请号：US13552315
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4，m和Z1 +在本说明书中定义。

4. 发明授权

US08367298B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08367298B2
公开(公告)日：2013-02-05
申请号：US12835427
申请日：2010-07-13
申请人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
发明人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/40
CPC分类号： C07C25/18 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A salt having a divalent group represented by the formula (aa): wherein Xa and Xb independently each represent —O— or —S—, Ra, Rb, Rc and Rd independently each represent a hydrogen atom, a C1-C4 alkyl group or a C1-C4 alkoxy group, and m represents 1 or 2.
摘要翻译：具有由式（aa）表示的二价基团的盐：其中Xa和Xb各自独立地表示-O-或-S-，Ra，Rb，Rc和Rd各自独立地表示氢原子，C1-C4烷基或 C1-C4烷氧基，m表示1或2。

5. 发明授权

US08753796B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753796B2
公开(公告)日：2014-06-17
申请号：US13443155
申请日：2012-04-10
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

6. 发明授权

US08753795B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753795B2
公开(公告)日：2014-06-17
申请号：US13428555
申请日：2012-03-23
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C07D411/12 , C07D305/06 , C07D307/93 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

7. 发明授权

US08993210B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08993210B2
公开(公告)日：2015-03-31
申请号：US13027575
申请日：2011-02-15
申请人： Koji Ichikawa , Hiromu Sakamoto
发明人： Koji Ichikawa , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , C07C381/12 , G03F7/039 , C07D303/12
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07D303/12 , C07D303/17 , C07D303/40 , C07D305/06 , C07D317/72 , G03F7/0045 , G03F7/0397 , G03F7/38 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.
摘要翻译：由式（I）表示的盐：其中R 1和R 2各自独立地表示氟原子或C 1 -C 6全氟烷基，X 1表示可具有一个或多个氟原子的C 1 -C 17二价饱和烃基，或更多的-CH 2 - 可以被-O-或-CO-代替，R 3表示具有环醚结构的基团，Z 1 +表示有机阳离子。

8. 发明授权

US08318404B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08318404B2
公开(公告)日：2012-11-27
申请号：US12797466
申请日：2010-06-09
申请人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
发明人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
IPC分类号： G03F7/004 , G03F7/30 , C07C309/06 , C07C309/07
CPC分类号： C07D307/94 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (a1): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents —CO—O—Xa1— or —CH2—O—Xa2— wherein Xa1 and Xa2 independently each represent a C1-C15 alkylene group and one or more —CH2— in the alkylene group can be replaced by —O— or —CO—, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and Z+ represents an organic cation.
摘要翻译：由式（a1）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示-CO-O-Xa1或-CH2-O-Xa2-，其中Xa1和Xa2独立地各自表示C1-C15亚烷基，亚烷基中的一个或多个-CH2-可以被-O-或-CO-代替，Y1表示C3-C36脂环族烃基或C6-C24芳族烃基，脂环族烃基和芳香族烃基可以具有一个以上的取代基，脂环式烃基中的一个以上的-CH 2 - 可以被-O-或-CO-代替，Z +表示有机阳离子。

9. 发明申请

US20110318688A1 SALT, ACID GENERATOR AND RESIST COMPOSITION 有权
标题翻译：盐，酸发生器和耐腐蚀组合物
公开(公告)号：US20110318688A1
公开(公告)日：2011-12-29
申请号：US13170990
申请日：2011-06-28
申请人： Takashi HIRAOKA , Hiromu Sakamoto , Koji Ichikawa
发明人： Takashi HIRAOKA , Hiromu Sakamoto , Koji Ichikawa
IPC分类号： G03F7/004 , C07D453/02 , G03F7/20 , C07D411/02 , C07D233/14 , C07D207/12 , C07D211/44 , C07D327/08
CPC分类号： G03F7/0045 , C07D207/12 , C07D211/46 , C07D233/60 , C07D307/77 , C07D327/08 , G03F7/0046 , G03F7/0397
摘要： The present invention is a salt represented by the formula (I) wherein R1 and R2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents a C1 to C17 divalent saturated hydrocarbon group, a —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—; ring W1 represents a C2 to C36 heterocycle; R3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; R4 in each occurrence independently represent a C1 to C6 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; m represents an integer of 0 to 6; and Z+ represents an organic cation.
摘要翻译：本发明是由式（I）表示的盐，其中R 1和R 2各自独立地表示氟原子或C 1至C 6全氟烷基; L1表示C1〜C17二价饱和烃基，饱和烃基中所含的-CH 2可以被-O-或-CO-代替; 环W1表示C2〜C36杂环; R3表示氢原子或C1〜C12烃基，烃基中所含的-CH2-可以被-O-或-CO-代替; R4各自独立地表示C1〜C6烃基，烃基中所含的-CH 2可以被-O-或-CO-代替; m表示0〜6的整数， Z +表示有机阳离子。

10. 发明申请

US20110065041A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110065041A1
公开(公告)日：2011-03-17
申请号：US12881942
申请日：2010-09-14
申请人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
发明人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046
摘要： The present invention provides a photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含酸产生剂和树脂，其包含衍生自由式（I）表示的单体的结构单元：其中R 1表示氢原子等，R 2表示氢原子或C 1 -C 4烷基基团，A1表示单键等，B1表示由式（1a）表示的基团：其中R3，R4和R5各自独立地表示C1-C16脂族烃基，R4和R5可以彼此键合形成 C 3 -C 18环与R 4和R 5键合的碳原子，具有内酯结构的C 4 -C 20饱和环状基团或具有至少一个羟基的C 5 -C 20饱和环状烃基。

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