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1. 发明授权

US08592129B2 Resin, resist composition and method for producing resist pattern 有权
标题翻译：树脂，抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08592129B2
公开(公告)日：2013-11-26
申请号：US12872817
申请日：2010-08-31
申请人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
发明人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
IPC分类号： G03F7/004 , C08F26/06
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041
摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
摘要翻译：树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

2. 发明申请

US20110053082A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：树脂，耐蚀组合物和生产耐火图案的方法
公开(公告)号：US20110053082A1
公开(公告)日：2011-03-03
申请号：US12872817
申请日：2010-08-31
申请人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
发明人： Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
IPC分类号： G03F7/004 , G03F7/20 , C08F26/06 , C08F20/28 , C08F28/06 , C08F24/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F220/60 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/20 , G03F7/2041
摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
摘要翻译：树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

3. 发明授权

US08481243B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US08481243B2
公开(公告)日：2013-07-09
申请号：US13345941
申请日：2012-01-09
申请人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
发明人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F20/38 , C07D327/04 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12- (a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中R 1表示任选具有一个或多个卤素原子，氢原子或卤素原子的C 1 -C 6烷基，T 1表示C 4 -C 34磺内酯任选具有一个或多个取代基的环基，Z1表示任选具有一个或多个取代基的C1-C6烷二基或由式（a-1）表示的基团：-A10X10-A11sX11-A12-（a-1）其中 X10和X11各自独立地表示-O-，-NH-，-CO-，-CO-O-，-O-CO-，-CO-NH-或-NH-CO-，A10，A11和A12各自独立地表示任选具有一个或多个取代基的C 1 -C 5二价脂族烃基，s表示0或1，Z 2表示单键或-CO-。

4. 发明授权

US09360754B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US09360754B2
公开(公告)日：2016-06-07
申请号：US13290618
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
IPC分类号： G03F7/004 , C08F28/06 , C08F20/58 , C07D327/04 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

5. 发明授权

US08685618B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08685618B2
公开(公告)日：2014-04-01
申请号：US13552044
申请日：2012-07-18
申请人： Koji Ichikawa , Akira Kamabuchi
发明人： Koji Ichikawa , Akira Kamabuchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator. wherein R1, A1, A13, X12, A14, R3 and ring X1 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：（A1）具有由式（I）表示的结构单元的树脂，（A2）具有由式（II）表示的结构单元并且在碱性水溶液中不溶或难溶，但变得可溶于碱的树脂通过酸的作用而不包括由式（I）表示的结构单元和（B）酸产生剂的水溶液。其中R1，A1，A13，X12，A14，R3和X1定义在本说明书中。

6. 发明授权

US08563217B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563217B2
公开(公告)日：2013-10-22
申请号：US13404054
申请日：2012-02-24
申请人： Koji Ichikawa , Akira Kamabuchi
发明人： Koji Ichikawa , Akira Kamabuchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/38 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111
摘要： A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator, wherein R1, A1, R2, R3, and ring X1 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：（A1）具有由式（I）表示的结构单元的树脂，（A2）具有由式（II）表示的结构单元并且在碱性水溶液中不溶或难溶，但变得可溶于碱的树脂水溶液，（B）酸产生剂，其中R1，A1，R2，R3和X1定义在说明书中。

7. 发明授权

US08859182B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08859182B2
公开(公告)日：2014-10-14
申请号：US13404064
申请日：2012-02-24
申请人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
发明人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
IPC分类号： G03F7/004 , G03F7/027 , C08F26/06 , G03F7/20 , G03F7/039
CPC分类号： G03F7/027 , G03F7/0045 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.
摘要翻译：抗蚀剂组合物含有（A）具有由式（I）表示的结构单元，（B）酸产生剂和（D）由式（II）表示的化合物的树脂，其中R1，X1，R3，R4 ，m和n在说明书中定义。

8. 发明授权

US08753796B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753796B2
公开(公告)日：2014-06-17
申请号：US13443155
申请日：2012-04-10
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

9. 发明授权

US08753795B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753795B2
公开(公告)日：2014-06-17
申请号：US13428555
申请日：2012-03-23
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C07D411/12 , C07D305/06 , C07D307/93 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

10. 发明授权

US08741544B2 Salt, photoresist composition and method for producing photoresist pattern 有权
标题翻译：盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
公开(公告)号：US08741544B2
公开(公告)日：2014-06-03
申请号：US13589852
申请日：2012-08-20
申请人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
发明人： Isao Yoshida , Yuichi Mukai , Koji Ichikawa
IPC分类号： G03F7/00 , C07C317/06 , C07C309/19 , C07C309/07
CPC分类号： C07C381/12 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/00 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
摘要翻译：含有难溶性或不溶性但通过酸作用而溶于碱性水溶液的树脂的光致抗蚀剂组合物和式（I）表示的盐：其中Q1，Q2，L1，W1，W2，R1 在说明书中定义了R2，t1和t2，Z +表示有机阳离子。

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