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1. 发明申请

US20050144981A1 Method of manufacturing glass sheet with thin film and the glass sheet 审中-公开
标题翻译：制造具有薄膜的玻璃板和玻璃板的方法
公开(公告)号：US20050144981A1
公开(公告)日：2005-07-07
申请号：US10503201
申请日：2002-01-31
申请人： Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto , Masato Hyodo , Masahiro Hirata
发明人： Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto , Masato Hyodo , Masahiro Hirata
IPC分类号： C03C17/00 , C03C17/245 , C03C17/34
CPC分类号： C03C17/002 , C03C17/007 , C03C17/245 , C03C17/3411 , C03C17/3417 , C03C2217/475 , C03C2217/77 , C23C16/0272
摘要： The present invention provides a method of manufacturing a glass sheet with a thin film. In the method, a coating-film forming gas including a chlorine-containing compound is supplied onto a glass containing an alkali component to generate chloride fine particles containing the alkali component while forming a thin film to allow the chloride fine particles to be included in the thin film or to adhere to the surface thereof, and thereby the surface of the thin film is provided with concavities and convexities. The present invention also provides another method of manufacturing a glass sheet with a thin film. In the another method, a coating-film forming gas including a silicon-containing inorganic compound and an organic gas is supplied onto glass to generate silicon-containing fine particles while forming a silicon-containing film and thereby the silicon-containing fine particles are allowed to adhere to the surface of the silicon-containing film.
摘要翻译：本发明提供了制造具有薄膜的玻璃板的方法。在该方法中，将含有含氯化合物的涂膜形成气体供给到含有碱成分的玻璃上，生成含有碱成分的氯化物微粒，同时形成薄膜，使氯化物微粒包含在薄膜或附着于其表面，由此薄膜的表面设置有凹凸。本发明还提供制造具有薄膜的玻璃板的另一种方法。在另一种方法中，将包含含硅无机化合物和有机气体的涂膜形成气体供给到玻璃上以产生含硅微粒，同时形成含硅膜，从而允许含硅微粒以粘附到含硅膜的表面上。

2. 发明申请

US20050156167A1 Substrate for photoelectric conversion device 审中-公开
标题翻译：光电转换装置基板
公开(公告)号：US20050156167A1
公开(公告)日：2005-07-21
申请号：US10503027
申请日：2002-01-31
申请人： Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto , Masato Hyodo , Masahiro Hirata
发明人： Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto , Masato Hyodo , Masahiro Hirata
IPC分类号： H01L31/0216 , H01L31/0236 , H01L29/04
CPC分类号： H01L31/02167 , H01L31/0236 , Y02E10/50
摘要： The present invention provides a substrate for photoelectric conversion devices including an undercoating film and a conductive film that are formed sequentially on a glass sheet. Chloride fine particles are present in the undercoating film or at the interface between the undercoating film and the conductive film. Convex portions are formed on the surface of the conductive film above the chloride fine particles.
摘要翻译：本发明提供了一种用于光电转换装置的基板，其包括依次形成在玻璃板上的底涂膜和导电膜。氯化物微粒存在于底涂膜或底涂膜与导电膜之间的界面处。在导电膜的表面上形成凸起部分，其位于氯化物微粒上方。

3. 发明申请

US20050121070A1 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate 有权
标题翻译：用于形成薄膜的方法，具有透明导电膜的基板和使用该基板的光电转换装置
公开(公告)号：US20050121070A1
公开(公告)日：2005-06-09
申请号：US10497367
申请日：2002-12-03
申请人： Akira Fujisawa , Yukio Sueyoshi , Masahiro Hirata , Toru Yamamoto , Koichiro Kiyohara , Kiyotaka Ichiki
发明人： Akira Fujisawa , Yukio Sueyoshi , Masahiro Hirata , Toru Yamamoto , Koichiro Kiyohara , Kiyotaka Ichiki
IPC分类号： C03C17/245 , C03C17/34 , C23C16/02 , C23C16/40 , C23C16/54 , H01L31/18 , H01L31/00
CPC分类号： C23C16/407 , C03C17/245 , C03C17/3417 , C03C17/3452 , C03C2217/211 , C03C2217/241 , C03C2218/15 , C23C16/0272 , C23C16/0281 , C23C16/545 , H01L31/1884 , Y02E10/50
摘要： The present invention provides a thin film-forming method by which, even when a thin film containing a crystalline metal oxide as the main component is formed over a wide area within a short time utilizing a thermal decomposition method, the thickness of the thin film becomes relatively uniform. A thin film-forming method of the present invention includes forming a thin film using a raw material containing a chloride of a metal, and prior to the forming of the thin film, 1) disposing metal-containing particles on the substrate, or 2) forming, at a film deposition rate slower than a film deposition rate for the thin film, a metal-containing thin film on the substrate, and wherein, in the case of the step 2), the thin film containing the metal oxide as the main component is directly formed on the metal-containing thin film.
摘要翻译：本发明提供一种薄膜形成方法，即使使用热分解方法，即使在短时间内在广泛的区域上形成含有结晶金属氧化物作为主要成分的薄膜时，薄膜的厚度变为比较均匀。本发明的薄膜形成方法包括使用含有金属氯化物的原料形成薄膜，并且在形成薄膜之前，1）在基板上设置含金属的颗粒，或2）以比薄膜成膜速度慢的成膜速度，在基板上形成含金属的薄膜，其中，在步骤2）的情况下，以金属氧化物为主体的薄膜组分直接形成在含金属的薄膜上。

4. 发明授权

US08093490B2 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate 有权
标题翻译：用于形成薄膜的方法，具有透明导电膜的基板和使用该基板的光电转换装置
公开(公告)号：US08093490B2
公开(公告)日：2012-01-10
申请号：US10497367
申请日：2002-12-03
申请人： Akira Fujisawa , Yukio Sueyoshi , Masahiro Hirata , Toru Yamamoto , Koichiro Kiyohara , Kiyotaka Ichiki
发明人： Akira Fujisawa , Yukio Sueyoshi , Masahiro Hirata , Toru Yamamoto , Koichiro Kiyohara , Kiyotaka Ichiki
IPC分类号： H01L31/00
CPC分类号： C23C16/407 , C03C17/245 , C03C17/3417 , C03C17/3452 , C03C2217/211 , C03C2217/241 , C03C2218/15 , C23C16/0272 , C23C16/0281 , C23C16/545 , H01L31/1884 , Y02E10/50
摘要： The present invention provides a thin film-forming method by which, even when a thin film containing a crystalline metal oxide as the main component is formed over a wide area within a short time utilizing a thermal decomposition method, the thickness of the thin film becomes relatively uniform. A thin film-forming method of the present invention includes forming a thin film using a raw material containing a chloride of a metal, and prior to the forming of the thin film, 1) disposing metal-containing particles on the substrate, or 2) forming, at a film deposition rate slower than a film deposition rate for the thin film, a metal-containing thin film on the substrate, and wherein, in the case of the step 2), the thin film containing the metal oxide as the main component is directly formed on the metal-containing thin film.
摘要翻译：本发明提供一种薄膜形成方法，即使使用热分解方法，即使在短时间内在广泛的区域上形成含有结晶金属氧化物作为主要成分的薄膜时，薄膜的厚度变为比较均匀。本发明的薄膜形成方法包括使用含有金属氯化物的原料形成薄膜，并且在形成薄膜之前，1）在基板上设置含金属的颗粒，或2）以比薄膜成膜速度慢的成膜速度，在基板上形成含金属的薄膜，其中，在步骤2）的情况下，以金属氧化物为主体的薄膜组分直接形成在含金属的薄膜上。

5. 发明授权

US06355353B1 Glass substrate having transparent conductive film 有权
标题翻译：具有透明导电膜的玻璃基板
公开(公告)号：US06355353B1
公开(公告)日：2002-03-12
申请号：US09521410
申请日：2000-03-08
申请人： Masato Hyodo , Koichiro Kiyohara , Kiyotaka Ichiki
发明人： Masato Hyodo , Koichiro Kiyohara , Kiyotaka Ichiki
IPC分类号： B32B1500
CPC分类号： C03C17/3417
摘要： A glass substrate having a transparent conductive film of SnO2 is disclosed, in which the transparent conductive film is prevented from developing hair cracks even when it has a thickness of 5,000 Å or larger. The glass substrate comprises an alkali-containing base glass plate 10 having a smooth surface and, formed thereon in this order, an undercoat 12 for imparting roughness which has a thickness of 150 Å or larger and is made of a crystalline metal oxide, a continuous alkali barrier film 14 made of SiO2 and having such a small thickness as to reflect the surface roughness of the undercoat, and a transparent conductive film 16 made of SnO2 doped with one or more appropriate impurities and having a thickness of 5,000 Å or larger. The transparent conductive film has an adhesion strength of 37 mN or higher as measured in accordance with “Adhesion Test for Thin Film Deposited on Glass Substrate ” as provided for in JIS R3255-1997.
摘要翻译：公开了一种具有SnO 2透明导电膜的玻璃基板，其中，即使具有5000以上的厚度，也可以防止透明导电膜发生毛发裂纹。玻璃基板包括具有光滑表面的含碱基玻璃板10，并且在其上依次形成用于赋予厚度为或大于150埃的粗糙度的底涂层12，其由结晶金属氧化物制成，连续的由SiO 2制成并具有如此小的厚度以反映底涂层的表面粗糙度的碱性阻挡膜14，以及由掺杂有一种或多种合适杂质并且具有5000或更大的厚度的SnO 2制成的透明导电膜16。该透明导电膜的粘合强度为按照JIS R3255-1997中规定的“玻璃基板上的薄膜的粘合试验”所测得的37mN以上。

6. 发明申请

US20050029613A1 Transparent conductive film and its manufacturing method, and photoelectric transducer comprising it 有权
标题翻译：透明导电膜及其制造方法，以及包含它的光电传感器
公开(公告)号：US20050029613A1
公开(公告)日：2005-02-10
申请号：US10432505
申请日：2001-11-20
申请人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
发明人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
IPC分类号： B32B7/02 , C03C17/34 , C23C16/40 , H01B5/14 , H01B13/00 , H01L31/0224 , H01L31/0236 , H01L31/0392 , H01L31/04 , H01L31/18 , H01L21/00 , H01L31/0232
CPC分类号： H01L31/022466 , C03C17/3464 , C03C17/3482 , C03C2217/77 , C23C16/407 , H01L31/022483 , H01L31/02363 , H01L31/02366 , H01L31/03921 , H01L31/1884 , Y02E10/50 , Y10T428/24364
摘要： A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of χ2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of χ2 type having a degree of freedom of 10-35χ2, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.
摘要翻译：透明导电膜，其中当水平轴的单位为纳米时，存在于表面上的突起的高度数分布由具有3.5至15的自由度的chi 2类型的分布函数表示，高/ 宽度比数分布由具有10-35cm 2的自由度的chi2类型的分布函数表示，高度为50-350nm的突起占70％以上，突起具有高度/宽度比为0.25-1.02，占90％以上。

7. 发明申请

US20050276987A1 Method forming transparent conductive film, transparent conductive film, glass substrate including the same and photoelectric conversion device using that glass substrate 审中-公开
标题翻译：形成透明导电膜的方法，透明导电膜，包括其的玻璃基板和使用该玻璃基板的光电转换装置
公开(公告)号：US20050276987A1
公开(公告)日：2005-12-15
申请号：US11197139
申请日：2005-08-04
申请人： Akira Fujisawa , Koichiro Kiyohara , Masahiro Hirata , Kiyotaka Ichiki , Toru Sawada
发明人： Akira Fujisawa , Koichiro Kiyohara , Masahiro Hirata , Kiyotaka Ichiki , Toru Sawada
IPC分类号： C03C17/00 , C03C17/245 , C03C17/34 , C23C16/40 , C23C16/54 , H01L31/18 , B32B17/06
CPC分类号： C23C16/407 , C03C17/002 , C03C17/2453 , C03C17/3417 , C03C2217/211 , C03C2217/213 , C03C2218/152 , C23C16/545 , H01L31/1884 , Y02E10/50
摘要： The present invention presents a method for forming a transparent conductive film whose principal component is tin oxide by so-called CVD on a glass ribbon, preventing the generation of giant crystal grains in the tin oxide, while ensuring that the concentration of carbon is low, or in other words, the absorption coefficient at 400 to 550 nm wavelength is low. In accordance with the invention, the method for forming a transparent conductive film whose principal component is tin oxide by CVD on a glass ribbon includes forming the transparent conductive film at a film deposition speed of 3000 to 7000 nm/min using a raw material gas including 0.5 to 2.0 mol % of an organic tin compound.
摘要翻译：本发明提供了一种通过所谓的CVD在玻璃带上形成主要成分为氧化锡的透明导电膜的方法，防止了氧化锡中的巨晶粒的产生，同时确保碳的浓度低，或换句话说，波长400〜550nm的吸收系数低。根据本发明，通过在玻璃带上通过CVD形成主要成分为氧化锡的透明导电膜的方法包括：以3000-7000nm / min的成膜速度形成透明导电膜，该原料气体包括 0.5〜2.0摩尔％的有机锡化合物。

8. 发明申请

US20060046026A1 Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it 审中-公开
标题翻译：透明导电膜及其制造方法，以及包含它的光电转换装置
公开(公告)号：US20060046026A1
公开(公告)日：2006-03-02
申请号：US11246756
申请日：2005-10-07
申请人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
发明人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
IPC分类号： B05D3/02 , D06N7/00 , B32B17/06
CPC分类号： H01L31/022466 , C03C17/3464 , C03C17/3482 , C03C2217/77 , C23C16/407 , H01L31/022483 , H01L31/02363 , H01L31/02366 , H01L31/03921 , H01L31/1884 , Y02E10/50 , Y10T428/24364
摘要： A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of X2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of X2 type having a degree of freedom of 10-35X2, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.
摘要翻译：透明导电膜，其中存在于表面上的突起的高度数分布由具有3.5至15的自由度的X 2类型的分布函数表示，当水平轴的单位为纳米，高/宽比数分布由具有10-35×2的自由度的X 2类型的分布函数表示，凸起的高度为 50-350nm占70％以上，高/宽比为0.25-1.02的突起占90％以上。

9. 发明授权

US07332226B2 Transparent conductive film and its manufacturing method, and photoelectric conversion device comprising it 有权
标题翻译：透明导电膜及其制造方法，以及包含它的光电转换装置
公开(公告)号：US07332226B2
公开(公告)日：2008-02-19
申请号：US10432505
申请日：2001-11-20
申请人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
发明人： Akira Fujisawa , Masatoshi Nara , Takahiro Asai , Yukio Sueyoshi , Kiyotaka Ichiki , Koichiro Kiyohara , Masahiro Hirata , Hiroki Ando
IPC分类号： B32B17/06
CPC分类号： H01L31/022466 , C03C17/3464 , C03C17/3482 , C03C2217/77 , C23C16/407 , H01L31/022483 , H01L31/02363 , H01L31/02366 , H01L31/03921 , H01L31/1884 , Y02E10/50 , Y10T428/24364
摘要： A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of χ2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of χ2 type having a degree of freedom of 10-35χ2, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.
摘要翻译：透明导电膜，其中存在于表面上的突起的高度数分布由水平轴的单位为自由度为3.5至15的奇偶校验类型的分布函数表示，纳米，高/宽比数分布由具有10-35℃2的自由度的chi <2>类型的分布函数表示，所述突起的高度 50-350nm占70％以上，高/宽比为0.25-1.02的突起占90％以上。

10. 发明授权

US07320827B2 Glass substrate and method of manufacturing the same 有权
标题翻译：玻璃基板及其制造方法
公开(公告)号：US07320827B2
公开(公告)日：2008-01-22
申请号：US10951038
申请日：2004-09-24
申请人： Akira Fujisawa , Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto
发明人： Akira Fujisawa , Koichiro Kiyohara , Kiyotaka Ichiki , Toru Yamamoto
IPC分类号： B32B17/06
CPC分类号： C23C16/401 , C03C17/007 , C03C17/3411 , C03C17/3417 , C03C2217/42 , C03C2217/77 , C03C2218/152 , C23C16/407
摘要： The present invention provides a glass substrate including a glass sheet, a thin film containing silica as its main component, and a group of metal oxide particles separated from one another, the metal oxide particles and the thin film being stacked on the glass sheet in that order from the glass sheet side, wherein the average height of the metal oxide particles is 10 to 100 nm. The present invention also provides a method of manufacturing the glass substrate, the method including forming a group of metal oxide particles by a thermal decomposition method including an inorganic metal chloride as a raw material.
摘要翻译：本发明提供一种玻璃基板，包括玻璃板，以二氧化硅为主要成分的薄膜和彼此分离的一组金属氧化物颗粒，金属氧化物颗粒和薄膜层叠在玻璃板上，玻璃板侧的顺序为金属氧化物粒子的平均高度为10〜100nm。本发明还提供一种玻璃基板的制造方法，该方法包括以包含无机金属氯化物为原料的热分解法形成一组金属氧化物粒子。

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