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    • 4. 发明授权
    • Ring rolling mill and ring rolling method
    • 环轧机和环轧法
    • US08365564B2
    • 2013-02-05
    • US12294533
    • 2007-03-28
    • Shimpei HiroseYuji IshiwariHiroaki KikuchiHideo Takizawa
    • Shimpei HiroseYuji IshiwariHiroaki KikuchiHideo Takizawa
    • B21D15/00B21D1/02B21D3/02B21D19/12B21B1/10
    • B21B17/02B21B5/00B21H1/06
    • This ring rolling mill includes a main roll and a mandrel provided so as to be capable of being brought close to or separated from each other, and rolling a peripheral portion of a ring-shaped body in a radial direction of the ring-shaped body while the ring-shaped body is rotated along its peripheral direction in a state where the peripheral portion of the ring-shaped body is pinched in the radial direction between an outer peripheral surface of the main roll which is rotationally driven, and an outer peripheral surface of the mandrel which is rotatable. This ring rolling mill further includes a mandrel inclining/supporting mechanism which inclines and supports the mandrel with respect to the axis of rotation of the main roll such that the gap between the outer peripheral surface of the mandrel and the outer peripheral surface of the main roll differs on one side and on the other side as seen in a direction along the axis of rotation of the main roll.
    • 该环轧机包括主辊和心轴,其设置成能够彼此靠近或分离,并且在环形体的径向方向上滚动环形体的周边部分,同时 在环状体的周缘部沿径向被夹持在主旋转驱动的主辊的外周面与外周面之间的状态下,环状体沿其圆周方向旋转, 可旋转的心轴。 该环轧机还包括:心轴倾​​斜/支撑机构,其相对于主辊的旋转轴线倾斜并支撑心轴,使得心轴的外周面与主辊的外周面之间的间隙 在沿着主辊的旋转轴线的方向观察时,在一侧和另一侧是不同的。
    • 5. 发明申请
    • RING ROLLING MILL AND RING ROLLING METHOD
    • 环形轧机和环轧方法
    • US20100236311A1
    • 2010-09-23
    • US12294533
    • 2007-03-28
    • Shimpei HiroseYuji IshiwariHiroaki KikuchiHideo Takizawa
    • Shimpei HiroseYuji IshiwariHiroaki KikuchiHideo Takizawa
    • B21D1/02
    • B21B17/02B21B5/00B21H1/06
    • This ring rolling mill includes a main roll and a mandrel provided so as to be capable of being brought close to or separated from each other, and rolling a peripheral portion of a ring-shaped body in a radial direction of the ring-shaped body while the ring-shaped body is rotated along its peripheral direction in a state where the peripheral portion of the ring-shaped body is pinched in the radial direction between an outer peripheral surface of the main roll which is rotationally driven, and an outer peripheral surface of the mandrel which is rotatable. This ring rolling mill further includes a mandrel inclining/supporting mechanism which inclines and supports the mandrel with respect to the axis of rotation of the main roll such that the gap between the outer peripheral surface of the mandrel and the outer peripheral surface of the main roll differs on one side and on the other side as seen in a direction along the axis of rotation of the main roll.
    • 该环轧机包括主辊和心轴,其设置成能够彼此靠近或分离,并且在环形体的径向方向上滚动环形体的周边部分,同时 在环状体的周缘部沿径向被夹持在主旋转驱动的主辊的外周面与外周面之间的状态下,环状体沿其圆周方向旋转, 可旋转的心轴。 该环轧机还包括:心轴倾​​斜/支撑机构,其相对于主辊的旋转轴线倾斜并支撑心轴,使得心轴的外周表面与主辊的外周表面之间的间隙 在沿着主辊的旋转轴线的方向观察时,在一侧和另一侧是不同的。
    • 6. 发明授权
    • Focus control method for an optical apparatus which inspects a photo-mask or the like
    • 用于检查照相掩模等的光学装置的聚焦控制方法
    • US07692128B2
    • 2010-04-06
    • US12002880
    • 2007-12-19
    • Hideo TakizawaKoji Miyazaki
    • Hideo TakizawaKoji Miyazaki
    • G01J1/20G01N21/86
    • G02B7/08G01N2021/95676G03F1/84G03F9/7026
    • A focus control method able to further correctly control a focal point of an optical system or optical apparatus. A reference system of the system as a whole is set by using a reference pattern for focal point control. A focal point of an optical apparatus for inspecting a sample or measuring a physical quantity of the sample and the focal point of an auto-focus mechanism are matched with the reference system. Then, a displaced object of the auto-focus mechanism is set on a sample surface, a displacement amount of the sample surface from a reference point is measured, and the focal point of an object lens of the optical apparatus is controlled by using the displaced point as an operation point of the control of the auto-focus mechanism. When setting the reference system, the focus is judged by utilizing the Becke effect for the reference pattern.
    • 一种能够进一步正确地控制光学系统或光学装置的焦点的聚焦控制方法。 通过使用用于焦点控制的参考图案来设置整个系统的参考系统。 用于检查样品或测量样品的物理量的光学装置和自动对焦机构的焦点的焦点与参考系统匹配。 然后,将自动对焦机构的位移物体设置在样本表面上,测量从参考点的样本表面的位移量,并且通过使用位移来控制光学设备的物镜的焦点 指出自动对焦机制的控制操作点。 当设置参考系时,通过利用Becke效应作为参考图案来判断焦点。
    • 7. 发明授权
    • Phase shift amount measurement apparatus and transmittance measurement apparatus
    • 相移量测量装置和透射率测量装置
    • US07643157B2
    • 2010-01-05
    • US12005882
    • 2007-12-28
    • Hideo TakizawaKoji MiyazakiHaruhiko Kusunose
    • Hideo TakizawaKoji MiyazakiHaruhiko Kusunose
    • G01B9/02
    • G03F1/84G01J9/0215G01J2009/0234G01N21/45G03F1/32
    • A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.
    • 一种相移量测量装置,其能够进一步正确地测量移相器的相移量,其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像,所述干涉图像由二维成像装置 从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置,针对每个光接收元件计算相移量,光接收元件的光接收面积非常小, 因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量,并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量 元素。
    • 8. 发明申请
    • Focus control method
    • 聚焦控制方法
    • US20080142681A1
    • 2008-06-19
    • US12002880
    • 2007-12-19
    • Hideo TakizawaKoji Miyazaki
    • Hideo TakizawaKoji Miyazaki
    • G02B7/04
    • G02B7/08G01N2021/95676G03F1/84G03F9/7026
    • A focus control method able to further correctly control a focal point of an optical system or optical apparatus. A reference system of the system as a whole is set by using a reference pattern for focal point control. A focal point of an optical apparatus for inspecting a sample or measuring a physical quantity of the sample and the focal point of an auto-focus mechanism are matched with the reference system. Then, a displaced object of the auto-focus mechanism is set on a sample surface, a displacement amount of the sample surface from a reference point is measured, and the focal point of an object lens of the optical apparatus is controlled by using the displaced point as an operation point of the control of the auto-focus mechanism. When setting the reference system, the focus is judged by utilizing the Becke effect for the reference pattern.
    • 一种能够进一步正确地控制光学系统或光学装置的焦点的聚焦控制方法。 通过使用用于焦点控制的参考图案来设置整个系统的参考系统。 用于检查样品或测量样品的物理量的光学装置和自动对焦机构的焦点的焦点与参考系统匹配。 然后,将自动对焦机构的位移物体设置在样本表面上,测量从参考点的样本表面的位移量,并且通过使用位移来控制光学设备的物镜的焦点 指出自动对焦机制的控制操作点。 当设置参考系时,通过利用Becke效应作为参考图案来判断焦点。
    • 10. 发明申请
    • Phase shift amount measurement apparatus and transmittance measurement apparatus
    • 相移量测量装置和透射率测量装置
    • US20080174786A1
    • 2008-07-24
    • US12005882
    • 2007-12-28
    • Hideo TakizawaKoji MiyazakiHaruhiko Kusunose
    • Hideo TakizawaKoji MiyazakiHaruhiko Kusunose
    • G01B9/02
    • G03F1/84G01J9/0215G01J2009/0234G01N21/45G03F1/32
    • A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.
    • 一种相移量测量装置,其能够进一步正确地测量移相器的相移量,其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像,所述干涉图像由二维成像装置 从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置,针对每个光接收元件计算相移量,光接收元件的光接收面积非常小, 因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量,并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量 元素。