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    • 1. 发明申请
    • Exposure method, color filter manufacturing method, and exposure device
    • 曝光方法,滤色片制造方法和曝光装置
    • US20120008120A1
    • 2012-01-12
    • US13138340
    • 2010-02-04
    • Kohei MatsuiYasuhiro ShibataRyosuke Yasui
    • Kohei MatsuiYasuhiro ShibataRyosuke Yasui
    • G03B27/42G02B26/00
    • G03F7/0007G02B5/201G03F1/50G03F7/2022
    • An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.
    • 提供一种曝光方法,其中当使用具有多个掩模图案的光掩模进行曝光时,对应于各种不同滤色器的各种掩模图案在基板上的不同区域中曝光,而不将光掩模移动到 曝光装置 相对于光源固定具有用于曝光构成第一滤色器的彩色像素的一部分的第一掩模图案和用于曝光构成第二滤色器的彩色像素的一部分的第二掩模图案的光掩模。 来自光源的光束在转印衬底的同时选择性地导向第一掩模图案,以连续地暴露第一区域中的抗蚀剂,并且来自光源的光束被选择性地导向第二掩模图案同时传送衬底 以在第二区域中连续地曝光抗蚀剂。
    • 2. 发明授权
    • Exposure method, color filter manufacturing method, and exposure device
    • 曝光方法,滤色片制造方法和曝光装置
    • US08697319B2
    • 2014-04-15
    • US13138340
    • 2010-02-04
    • Kohei MatsuiYasuhiro ShibataRyosuke Yasui
    • Kohei MatsuiYasuhiro ShibataRyosuke Yasui
    • G02B5/20G03F7/20
    • G03F7/0007G02B5/201G03F1/50G03F7/2022
    • An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.
    • 提供一种曝光方法,其中当使用具有多个掩模图案的光掩模进行曝光时,对应于各种不同滤色器的各种掩模图案在基板上的不同区域中曝光,而不将光掩模移动到 曝光装置 相对于光源固定具有用于曝光构成第一滤色器的彩色像素的一部分的第一掩模图案和用于曝光构成第二滤色器的彩色像素的一部分的第二掩模图案的光掩模。 来自光源的光束在转印衬底的同时选择性地导向第一掩模图案,以连续地暴露第一区域中的抗蚀剂,并且来自光源的光束被选择性地导向第二掩模图案同时传送衬底 以在第二区域中连续地曝光抗蚀剂。