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    • 3. 发明授权
    • Double plate-up process for fabrication of composite magnetoresistive shared poles
    • 用于制造复合磁阻共享极的双层平板工艺
    • US06524491B1
    • 2003-02-25
    • US09298935
    • 1999-04-26
    • Chun LiuCherng-Chyi HanKochan JuPo-Kang WangJei-Wei Chang
    • Chun LiuCherng-Chyi HanKochan JuPo-Kang WangJei-Wei Chang
    • G11B5127
    • G11B5/3967G11B5/3163Y10T29/49021Y10T29/49032
    • A method of manufacturing a magnetic recording head includes the following steps. Form a low magnetic moment, first magnetic shield layer over a substrate. Form a read gap layer with a magnetoresistive head over the first shield layer. Form a seed layer over the read gap layer covered with a frame mask with a width “F”. Form a PLM second shield layer over the seed layer and planarize the shield layer. Form a non-magnetic copper or dielectric spacer layer over the PLM second shield layer. Form a first HMM, lower pole layer over the non-magnetic spacer layer. Cover the first HMM, lower pole layer with a write gap layer. Form an write head mask composed of two parallel rows of resist with an outer width “W” over the seed layer. Between the two rows of resist of the write head mask is a trench having a width “N”. Then form an HMM, upper pole layer over the write gap layer aside from the write head mask. Outside of the write head mask remove the upper pole layer and shape the lower pole layer by an IBE process.
    • 制造磁记录头的方法包括以下步骤。 在基板上形成低磁矩,第一磁屏蔽层。 在第一屏蔽层上形成具有磁阻头的读取间隙层。 在覆盖有宽度为“F”的框架掩模的读取间隙层上形成种子层。 在种子层上形成PLM第二屏蔽层,并平整屏蔽层。 在PLM第二屏蔽层上形成非磁性铜或电介质间隔层。 在非磁性间隔层上形成第一个HMM,下极层。 覆盖第一个HMM,具有写间隙层的下极层。 在种子层上形成具有外部宽度“W”的两个平行的抗蚀剂行的写入头罩。 写头掩模的两行抗蚀剂之间是宽度为“N”的沟槽。 然后在写入头部掩模之外的写间隙层上形成HMM,上极层。 在写头掩模之外,通过IBE工艺去除上极层并形成下极层。
    • 4. 发明授权
    • Single stripe magnetoresistive (MR) head
    • 单条磁阻(MR)头
    • US06373667B1
    • 2002-04-16
    • US09637208
    • 2000-08-14
    • Cherng-Chyi HanMao-Min ChenCheng Tzong HorngPo-Kang WangChyu Jiuh TorngKochan JuYimin Guo
    • Cherng-Chyi HanMao-Min ChenCheng Tzong HorngPo-Kang WangChyu Jiuh TorngKochan JuYimin Guo
    • G11B5127
    • B82Y25/00G01R33/093G11B5/3903G11B5/3932Y10T29/49048
    • A method for fabricating a soft adjacent layer (SAL) magnetoresistive (MR) sensor element and several soft adjacent layer (SAL) magnetoresistive (MR) sensor elements which may be fabricated employing the method. There is first provided a substrate. There is formed over the substrate a dielectric layer, where the dielectric layer has a first surface of the dielectric layer and a second surface of the dielectric layer opposite the first surface of the dielectric layer. There is also formed over the substrate a magnetoresistive (MR) layer contacting the first surface of the dielectric layer. There is also formed over the substrate a soft adjacent layer (SAL), where the soft adjacent layer (SAL) has a first surface of the soft adjacent layer (SAL) and a second surface of the soft adjacent layer (SAL). The first surface of the soft adjacent layer (SAL) contacts the second surface of the dielectric layer. Finally, there is also formed over the substrate a transverse magnetic biasing layer, where the transverse magnetic biasing layer contacts the second surface of the soft adjacent layer (SAL), and where at least one of the dielectric layer, the magnetoresistive (MR) layer, the soft adjacent layer (SAL) and the transverse magnetic biasing layer is a patterned layer formed employing an etch mask which serves as a lift-off stencil for forming a patterned second dielectric layer adjoining an edge of the patterned layer. The invention also contemplates a soft adjacent layer (SAL) magnetoresistive (MR) sensor element formed with the magnetoresistive (MR) layer interposed between the substrate and the soft adjacent layer (SAL). Similarly, the invention also contemplates a soft adjacent layer (SAL) magnetoresistive (MR) sensor element employing a transverse magnetic biasing layer formed of a hard bias permanent magnet material.
    • 一种用于制造软相邻层(SAL)磁阻(MR)传感器元件和若干软相邻层(SAL)磁阻(MR))传感器元件的方法,其可以使用该方法制造。 首先提供基板。 在衬底上形成介电层,其中电介质层具有电介质层的第一表面和电介质层与电介质层的第一表面相对的第二表面。 还在衬底上形成与电介质层的第一表面接触的磁阻(MR)层。 还在衬底上形成软相邻层(SAL),其中软相邻层(SAL)具有软相邻层(SAL)的第一表面和软相邻层(SAL)的第二表面。 软相邻层(SAL)的第一表面接触电介质层的第二表面。 最后,还在衬底上形成横向磁偏置层,横向磁偏置层接触软相邻层(SAL)的第二表面,并且其中介电层,磁阻(MR)层中的至少一个 ,软相邻层(SAL)和横向磁偏置层是使用蚀刻掩模形成的图案层,其用作用于形成与图案化层的边缘相邻的图案化的第二介电层的剥离模板。 本发明还考虑了由介于基板和软相邻层(SAL)之间的磁阻(MR)层形成的软相邻层(SAL)磁阻(MR)传感器元件。 类似地,本发明还考虑使用由硬偏磁永磁材料形成的横向磁偏置层的软相邻层(SAL)磁阻(MR)传感器元件。
    • 7. 发明授权
    • Stitched write head design having a sunken shared pole
    • 拼接写头设计有一个凹陷的共享极点
    • US06469875B1
    • 2002-10-22
    • US09525672
    • 2000-03-15
    • Mao-Min ChenPo-Kang WangCherng-Chyi Han
    • Mao-Min ChenPo-Kang WangCherng-Chyi Han
    • G11B539
    • B82Y25/00B82Y10/00G11B5/3163G11B5/3903G11B5/3967G11B2005/3996Y10T29/49048
    • A structure and a method for a stitched write head having a sunken share pole. The method includes forming a bottom coil dielectric layer over the first half shared pole. Coils are formed over the bottom coil dielectric layer. Next, second half shared poles (P1) are formed over the first half shared pole (S2). We form a top coil dielectric layer over the structure. In a key step, we chemical-mechanical polish the top coil dielectric layer. A write gap layer (WG) is formed over the front second half shared pole and the top coil dielectric layer over the coils. An upper pole (P3) and hard mask are formed over the write gap layer. We etch the write gap layer and the second half shared pole (P1) using the upper pole as an etch mask to remove a portion of the second half shared pole (P1) adjacent to the write gap layer thereby forming a partially trimmed pole.
    • 一种具有凹陷的共享极的缝合写头的结构和方法。 该方法包括在第一半共享极上形成底部线圈电介质层。 线圈形成在底部线圈电介质层上。 接下来,在第一半共享极(S2)上形成第二半共享极(P1)。 我们在结构上形成顶层线圈介电层。 在关键步骤中,我们化学机械抛光顶层线圈介电层。 写入间隙层(WG)形成在线圈上的前第二半共享极和顶部线圈电介质层上。 在写间隙层上形成上极(P3)和硬掩模。 我们使用上极蚀刻写间隙层和第二半共享极(P1)作为蚀刻掩模,以去除与写间隙层相邻的第二半共享极(P1)的一部分,从而形成部分修整的极。
    • 8. 发明授权
    • Ion implantation method for fabricating magnetoresistive (MR) sensor element
    • 用于制造磁阻(MR)传感器元件的离子注入方法
    • US06383574B1
    • 2002-05-07
    • US09360118
    • 1999-07-23
    • Cherng-Chyi HanRong-Fu XiaoMao-Min ChenPo-Kang Wang
    • Cherng-Chyi HanRong-Fu XiaoMao-Min ChenPo-Kang Wang
    • B05D500
    • H01L43/12B82Y10/00B82Y25/00B82Y40/00C23C14/48G11B5/3163H01F41/302
    • A method for forming a magnetoresistive (MR) layer first employs a substrate over which is formed a magnetoresistive (MR) layer formed of a magnetoresistive (MR) material. There is then ion implanted selectively, while employing an ion implant method, the magnetoresistive (MR) layer to form: (1) an ion implanted portion of the magnetoresistive (MR) layer formed of an ion implanted magnetoresistive (MR) material; and (2) an adjoining non ion implanted portion of the magnetoresistive (MR) layer formed of the magnetoresistive (MR) material, where the ion implanted magnetoresistive (MR) material is a non magnetoresistive (MR) material. The method may be employed for forming within magnetoresistive (MR) sensor elements magnetoresistive (MR) layers with enhanced dimensional uniformity, and in particular enhanced overlay dimensional uniformity.
    • 形成磁阻(MR)层的方法首先采用形成由磁阻(MR)材料形成的磁阻(MR)层的衬底。 然后选择性地离子注入,同时采用离子注入法,磁阻(MR)层形成:(1)由离子注入的磁阻(MR)材料形成的磁阻(MR)层的离子注入部分; 和(2)由磁阻(MR)材料形成的磁阻(MR)层的邻接非离子注入部分,其中离子注入磁阻(MR)材料是非磁阻(MR)材料。 该方法可以用于在具有增强的尺寸均匀性的磁阻(MR)传感器元件磁阻(MR)层内形成,特别是增强的覆盖尺寸均匀性。