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    • 4. 发明授权
    • Ultrathin solid membrane, process for production thereof, and use
thereof for concentrating a specified gas in a gaseous mixture
    • 超薄固体膜,其生产方法及其用于将特定气体浓缩在气体混合物中的用途
    • US4406673A
    • 1983-09-27
    • US217582
    • 1980-12-18
    • Takeyoshi YamadaShizuka KurisuShizuo AzumaKiyoshi SugieTeizo Yamaji
    • Takeyoshi YamadaShizuka KurisuShizuo AzumaKiyoshi SugieTeizo Yamaji
    • B01D53/22B01D69/12B01D71/26B29D7/01B01D39/16
    • B01D53/22B01D69/122B01D71/26B29D7/01B01D2313/38
    • A process for producing ultrathin solid membranes from a solvent solution of an addition polymer derived from an ethylenically unsaturated hydrocarbon monomer or a conjugated unsaturated hydrocarbon monomer in a solvent composed mainly of a volatile, substantially water-immiscible organic liquid medium capable of dissolving the addition polymer and another organic compound having a distribution coefficient k, which is the ratio of the concentration of the other organic compound in the organic liquid medium to that in water, of from 0.5 to 35. The solvent satisfies the equationc.sub.1 -(a.sub.1 +b.sub.1).gtoreq.25wherein c.sub.1 is the surface tension (dynes/cm) of water, a.sub.1 is the surface tension (dynes/cm) of the solution of the addition polymer in the solvent, and b.sub.1 is the interfacial tension (dynes/cm) between the solvent solution and water.The solvent solution of the addition polymer is allowed to spread spontaneously on the surface of a liquid support consisting substantially of water whereby the solvent in the solvent solution is removed to an amount sufficient to form a solid membrane on the surface of the liquid support. The process may be performed batchwise or continuously. The solid membrane can be used for obtaining a gas having a specified component gas concentrated therein, for example, a gaseous mixture having enriched oxygen gas from a gaseous mixture of two or more gases for example air.
    • 一种由主要由能够溶解加成聚合物的挥发性基本上与水不混溶的有机液体介质组成的溶剂中的衍生自烯键式不饱和烃单体或共轭不饱和烃单体的加成聚合物的溶剂溶液制备超薄固体膜的方法 和作为有机液体介质中的其他有机化合物的浓度与水中的其他有机化合物的比例的分配系数k的另一种有机化合物为0.5〜35。溶剂满足方程式c1-(a1 + b1) 其中c1是水的表面张力(达因/厘米),a1是加成聚合物在溶剂中的溶液的表面张力(达因/厘米),b1是界面张力(达因/厘米) 在溶剂溶液和水之间。 允许加成聚合物的溶剂溶液自发扩散在基本上由水组成的液体载体的表面上,由此除去溶剂溶液中的溶剂至足以在液体载体的表面上形成固体膜的量。 该方法可以间歇或连续进行。 固体膜可用于获得其中浓缩有特定组分气体的气体,例如具有浓缩氧气的气体混合物,其来自两种或多种气体(例如空气)的气体混合物。
    • 8. 发明授权
    • Silicon wafer carrier
    • 硅晶片载体
    • US06355716B1
    • 2002-03-12
    • US09722624
    • 2000-11-28
    • En Lai ZhangSatoshi YamamotoTakayoshi NumataKiyoshi Sugie
    • En Lai ZhangSatoshi YamamotoTakayoshi NumataKiyoshi Sugie
    • C08K310
    • C08L67/02C08L23/26C08L77/12H01L21/673Y10T428/1352C08L2666/02
    • The present invention relates to a silicon wafer carrier consisting of a composition composed of (a) 100 parts by weight of a polyester, (b) 5 to 100 parts by weight of a polyether ester amide, (c) 10 to 2,500 ppm (based on the polyether ester amide) of an alkaline metal and (d) 0 to 40 parts by weight of a modified polyolefin, generating not more than 10 ppm of volatile gas by the heat-treatment at 150° C. for 60 minutes and eluting not more than 10 ppm of the alkaline metal by the immersion treatment in pure water at 80° C. for 120 minutes. The silicon wafer carrier has the generation of volatile gas and the elution of metal suppressed to an extent not to essentially cause the surface contamination of a silicon wafer and is provided with excellent permanent antistaticity and high mechanical properties and heat-resistance.
    • 本发明涉及由(a)100重量份聚酯组成的组合物,(b)5-100重量份聚醚酯酰胺,(c)10-2,500ppm(基于 在聚醚酯酰胺上)和(d)0〜40重量份的改性聚烯烃,通过在150℃下热处理60分钟产生不超过10ppm的挥发性气体,不洗脱 通过在纯水中在80℃浸渍处理120分钟以上超过10ppm的碱金属。 硅晶片载体具有挥发性气体的产生,金属的洗脱抑制在一定程度上不会导致硅晶片的表面污染,并且具有优异的永久抗静电性和高机械性能和耐热性。
    • 9. 发明授权
    • Silicon wafer carrier
    • 硅晶片载体
    • US06268030B1
    • 2001-07-31
    • US09147268
    • 1998-11-17
    • En Lai ZhangSatoshi YamamotoTakayoshi NumataKiyoshi Sugie
    • En Lai ZhangSatoshi YamamotoTakayoshi NumataKiyoshi Sugie
    • B65D8530
    • C08L67/02C08L77/12H01L21/673Y10S206/833Y10T428/1352C08L2666/20C08L2666/02
    • The present invention relates to a silicon wafer carrier consisting of a composition composed of (a) 100 parts by weight of a polyester, (b) 5 to 100 parts by weight of a polyether ester amide, (c) 10 to 2,500 ppm (based on the polyether ester amide) of an alkaline metal and (d) 0 to 40 parts by weight of a modified polyolefin, generating not more than 10 ppm of volatile gas by the heat-treatment at 150° C. for 60 minutes and eluting not more than 10 ppm of the alkaline metal by the immersion treatment in pure water at 80° C. for 120 minutes. The silicon wafer carrier has the generation of volatile gas and the elution of metal suppressed to an extent not to essentially cause the surface contamination of a silicon wafer and is provided with excellent permanent antistaticity and high mechanical properties and heat-resistance.
    • 本发明涉及由(a)100重量份聚酯组成的组合物,(b)5-100重量份聚醚酯酰胺,(c)10-2,500ppm(基于 在聚醚酯酰胺上)和(d)0〜40重量份的改性聚烯烃,通过在150℃下热处理60分钟产生不超过10ppm的挥发性气体,不洗脱 通过在纯水中在80℃浸渍处理120分钟以上超过10ppm的碱金属。 硅晶片载体具有挥发性气体的产生,金属的洗脱抑制在一定程度上不会导致硅晶片的表面污染,并且具有优异的永久抗静电性和高机械性能和耐热性。