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    • 4. 发明授权
    • Nonvolatile programmable logic switches and semiconductor integrated circuit
    • 非易失性可编程逻辑开关和半导体集成电路
    • US08476690B2
    • 2013-07-02
    • US13223331
    • 2011-09-01
    • Daisuke HagishimaAtsuhiro Kinoshita
    • Daisuke HagishimaAtsuhiro Kinoshita
    • G11C16/04H01L29/788
    • H01L29/788G11C16/0416G11C16/0466H01L27/11521H01L27/11526H01L27/11534H01L27/11807
    • A nonvolatile programmable logic switch according to an embodiment includes: a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type; a memory cell transistor including a first insulating film formed on the first semiconductor region, a charge storage film formed on the first insulating film, a second insulating film formed on the charge storage film, and a control gate formed on the second insulating film; a pass transistor including a third insulating film formed on the second semiconductor region, and a gate electrode formed on the third insulating film and electrically connected to the first drain region; a first electrode applying a substrate bias to the first semiconductor region, the first electrode being formed in the first semiconductor region; and a second electrode applying a substrate bias to the second semiconductor region, the second electrode being formed in the second semiconductor region.
    • 根据实施例的非易失性可编程逻辑开关包括:第一导电类型的第一半导体区域和第二导电类型的第二半导体区域; 存储单元晶体管,包括形成在第一半导体区域上的第一绝缘膜,形成在第一绝缘膜上的电荷存储膜,形成在电荷存储膜上的第二绝缘膜,以及形成在第二绝缘膜上的控制栅; 包括形成在第二半导体区域上的第三绝缘膜的通过晶体管和形成在第三绝缘膜上并电连接到第一漏极区的栅电极; 将第一电极施加到所述第一半导体区域的衬底偏压,所述第一电极形成在所述第一半导体区域中; 以及向所述第二半导体区域施加衬底偏压的第二电极,所述第二电极形成在所述第二半导体区域中。
    • 6. 发明申请
    • NONVOLATILE PROGRAMMABLE LOGIC SWITCHES AND SEMICONDUCTOR INTEGRATED CIRCUIT
    • 非易失性可编程逻辑开关和半导体集成电路
    • US20120061731A1
    • 2012-03-15
    • US13223331
    • 2011-09-01
    • Daisuke HagishimaAtsuhiro Kinoshita
    • Daisuke HagishimaAtsuhiro Kinoshita
    • H01L27/092
    • H01L29/788G11C16/0416G11C16/0466H01L27/11521H01L27/11526H01L27/11534H01L27/11807
    • A nonvolatile programmable logic switch according to an embodiment includes: a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type; a memory cell transistor including a first insulating film formed on the first semiconductor region, a charge storage film formed on the first insulating film, a second insulating film formed on the charge storage film, and a control gate formed on the second insulating film; a pass transistor including a third insulating film formed on the second semiconductor region, and a gate electrode formed on the third insulating film and electrically connected to the first drain region; a first electrode applying a substrate bias to the first semiconductor region, the first electrode being formed in the first semiconductor region; and a second electrode applying a substrate bias to the second semiconductor region, the second electrode being formed in the second semiconductor region.
    • 根据实施例的非易失性可编程逻辑开关包括:第一导电类型的第一半导体区域和第二导电类型的第二半导体区域; 存储单元晶体管,包括形成在第一半导体区域上的第一绝缘膜,形成在第一绝缘膜上的电荷存储膜,形成在电荷存储膜上的第二绝缘膜,以及形成在第二绝缘膜上的控制栅; 包括形成在第二半导体区域上的第三绝缘膜的通过晶体管和形成在第三绝缘膜上并电连接到第一漏极区的栅电极; 将第一电极施加到所述第一半导体区域的衬底偏压,所述第一电极形成在所述第一半导体区域中; 以及向所述第二半导体区域施加衬底偏压的第二电极,所述第二电极形成在所述第二半导体区域中。