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    • 5. 发明授权
    • Method for producing fine structure
    • 生产精细结构的方法
    • US08221963B2
    • 2012-07-17
    • US12342147
    • 2008-12-23
    • Jun AmakoDaisuke Sawaki
    • Jun AmakoDaisuke Sawaki
    • G03F7/20G02B5/18
    • G03F7/001G02B5/1857G03F7/70408
    • A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate. In the method, the liquid arranged at step (b) has a refractive index larger than 1 and equal to or smaller than a refractive index of the photosensitive film.
    • 精细结构的制造方法包括:(a)形成感光膜以覆盖形成在基板的至少一个表面中的多个第一凸部; (b)布置液体以覆盖基板的至少一个表面上的感光膜; (c)布置透明平行板,使得平行板经由液体与基板相对; (d)通过激光束产生干涉场,以通过平行板和液体将干涉场照射到感光膜上; (e)去除液体和平行板以显影感光膜以形成感光膜图案; 以及(f)使用所述感光膜图案的掩模蚀刻所述基板,以形成比所述基板的所述至少一个表面上的所述第一凸部小的多个细小凸部。 在该方法中,在步骤(b)中布置的液体的折射率大于1且等于或小于感光膜的折射率。