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    • 3. 发明授权
    • Universal cold-cathode type ion source with closed-loop electron
drifting and adjustable ionization gap
    • 通用冷阴极型离子源,具有闭环电子漂移和电离间隙可调
    • US6147354A
    • 2000-11-14
    • US109152
    • 1998-07-02
    • Yuri MaishevJames RitterLeonid Velikuv
    • Yuri MaishevJames RitterLeonid Velikuv
    • H01J27/02H01J27/08
    • H01J27/143H01J27/02H01J27/08
    • A universal cold-cathode type ion source with closed-loop electron drifting and with ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects. Treatment procedures include cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows for adjusting beam parameters and configurations and has an adjustable dimensions of the ionization space between the anode and the cathode. In a preferred embodiment, the adjustment is carried out by moving the anode with respect to the cathode. The moveable anode is shifted in the direction of propagation of the ion beam or in the opposite direction, whereby the tubular ion beam is either converged or diverged. As a result, it becomes possible to adjust the surface area being treated and characteristics of the ion beam such as average energy of ions in the beam and composition of the beam, in case of a multiple-component working medium.
    • 具有闭环电子漂移和垂直于电子漂移平面的离子束传播方向的通用冷阴极型离子源旨在均匀地处理静止或可移动的物体。 处理步骤包括清洁,活化,抛光,薄膜涂布或蚀刻。 本发明的离子源允许调整光束参数和构造,并且具有阳极和阴极之间的电离空间的可调节尺寸。 在优选实施例中,通过相对于阴极移动阳极来进行调整。 可移动阳极沿离子束的传播方向或相反方向移动,由此管状离子束会聚或发散。 结果,在多组分工作介质的情况下,可以调节待处理的表面积和离子束的特性,例如光束中的离子的平均能量和束的组成。
    • 6. 发明授权
    • Ion-beam source with virtual anode
    • 具有虚拟阳极的离子束源
    • US06246059B1
    • 2001-06-12
    • US09263058
    • 1999-03-06
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • H01J2702
    • H01J27/022
    • A cold-cathode type ion-beam source with a closed-loop ion-emitting slit and electrons drifting in crosses electric and magnetic fields is characterized by the absence of a metal anode which is replaced by a pair of positively charged bodies, such as concentric rings of a conductive material which are located inside a hollow housing of the ion source and are connected to a source of a positive potential. The ion-emitting slit is located between these rings in an upstream position in the direction of propagation of the ion beam. Replacement of a metallic anode with an anodic plasma, i.e., with a “virtual anode”, which is formed by a Penning-type discharge, descreases contamination of the ion beam by products of erosion of a metallic anode and increases the ion beam current, which results in more effective ionization of the workout gas.
    • 具有闭环离子发射狭缝的冷阴极型离子束源和跨越电场和磁场漂移的电子的特征在于没有金属阳极被一对带正电荷的物体所取代,例如同心 导电材料的环位于离子源的中空壳体内并且连接到正电位的源。 离子发射狭缝位于这些环之间的离子束传播方向的上游位置。 用阳极等离子体(即,通过Penning型放电形成的“虚拟阳极”)来替换金属阳极,通过金属阳极的侵蚀产物降低离子束的污染并增加离子束电流, 这导致锻炼气体的更有效的电离。
    • 7. 发明授权
    • Ion-beam source with channeling sputterable targets and a method for channeled sputtering
    • 具有通道溅射靶的离子束源和用于沟道溅射的方法
    • US06238526B1
    • 2001-05-29
    • US09249681
    • 1999-02-14
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • C23C1400
    • H01J37/3178C23C14/46H01J27/20H01J2237/3146
    • The invention provides a sputtering system which consists of an ion beam and a target of a sputterable material. A distinguishing feature of the system of the invention is that the sputtering target forms a guide channel for an ion beam and sputtered particles, so that a portion of the ions collides with the walls of the target inside a closed volume of the target and forms neutral sputterable particles impinging the object. The other part of the ions goes directly to the object and participates in an ion-assisted overcoating. Thus, the special form of the target improves efficiency of sputtering, prevents scattering and the loss of the sputterable material. The system can be realized in various embodiments. One of the embodiments provides a multiple-cell system in which each cell has an individual ion-emitting slit formed by the end of a cathode rod of one cathode plate and the opening in the second cathode plate. Tubular or plate-like channeling targets are connected to the ion slits without any gaps in the form of a geometrical extensions of the individual ion-emitting slits. Another embodiment allows adjustment in the position of the rods with respect to the targets.
    • 本发明提供一种由离子束和可溅射材料的靶组成的溅射系统。 本发明的系统的一个突出特征在于,溅射靶形成用于离子束和溅射颗粒的引导通道,使得一部分离子在靶的封闭体积内与靶的壁碰撞并形成中性 撞击物体的可溅射颗粒。 离子的另一部分直接进入物体并参与离子辅助涂层。 因此,目标的特殊形式提高溅射效率,防止溅射和损失可溅射材料。 该系统可以在各种实施例中实现。 其中一个实施例提供了一种多单元系统,其中每个单元具有由一个阴极板的阴极杆的端部和第二个阴极板中的开口形成的单独的离子发射狭缝。 管状或板状沟道靶连接到离子狭缝,而没有各个离子发射狭缝的几何延伸形式的任何间隙。 另一个实施例允许调节棒相对于靶的位置。
    • 8. 发明授权
    • Multiple-cell source of uniform plasma
    • 均匀等离子体的多电池源
    • US06250250B1
    • 2001-06-26
    • US09272646
    • 1999-03-18
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • Yuri MaishevJames RitterLeonid VelikovAlexander Shkolnik
    • C23C1600
    • H01J37/32009H01J37/32568
    • A multiple-cell plasma source consists of a pair of perforated plate-like cathodes and a perforated plate-like anode between the both cathode plates. Perforations in all three plates are coaxial and form a plurality of cells in which a Penning discharge plasma is generated due to the passage of axial components of the magnetic field through the individual cells. Since in all cells the plasma flow components are generated and work independently, there are no limitations for an increase in the surface area of the upper cathode plate, which has plasma emitting holes, so that the plasma source can treat objects of a large surface area. The plasma source of the invention has various means for controlling and adjusting the plasma pattern, distribution, parameters, and shape.
    • 多单元等离子体源由一对多孔板状阴极和两个阴极板之间的多孔板状阳极组成。 所有三个板中的穿孔是同轴的并且形成多个单元,其中由于磁场的轴向分量通过单个单元而产生Penning放电等离子体。 由于在所有的电池中都产生等离子体流动成分并独立工作,所以对于具有等离子体发射孔的上部阴极板的表面积的增加没有限制,使得等离子体源可以处理大面积的物体 。 本发明的等离子体源具有用于控制和调整等离子体图案,分布,参数和形状的各种装置。
    • 10. 发明授权
    • Cold-cathode ion source with propagation of ions in the electron drift
plane
    • 在电子漂移平面中具有离子传播的冷阴极离子源
    • US6130507A
    • 2000-10-10
    • US161581
    • 1998-09-28
    • Yuri MaishevJames RitterYuri TerentievLeonid Velikov
    • Yuri MaishevJames RitterYuri TerentievLeonid Velikov
    • H01J27/08H01J27/14H01J27/02
    • H01J27/143
    • The ion source of the invention emits ion beams radially inwardly or radially outwardly from the entire periphery of the closed-loop ion-emitting slit. In one embodiment, a tubular or oval-shaped hollow body, which also functions as a cathode, contains a similarly-shaped concentric anode spaced from the inner walls of the cathode at a distance required to form an ion-generating and accelerating space. The cathode has a continuous ion-emitting slit which is aligned with the position of the anode and is concentric thereto. A magnetic-field generation means is located inside the ring-shaped anode. When the ion source is energized by inducing an magnetic field, connecting the anode to a positive pole of the electric power supply unit, the cathode to a negative pole of the power supply unit, and supplying a working medium into the hollow housing, the electrons begin to drift in the annular space between the anode and cathode in the same direction in which the ions are emitted from the annular slit. By rearranging positions of magnet, anode, and cathode, it is possible to provide emission of ions in the inward or outward direction for treating outer or inner surfaces of tubular objects.
    • 本发明的离子源从闭环离子发射狭缝的整个周边径向向内或径向向外发射离子束。 在一个实施例中,也用作阴极的管状或椭圆形中空体包含与形成离子产生和加速空间所需的距离处于阴极内壁间隔开的类似形状的同心阳极。 阴极具有连续的离子发射狭缝,其与阳极的位置对准并与其同心。 磁场产生装置位于环形阳极内部。 当通过诱发磁场激励离子源时,将阳极连接到电源单元的正极,将阴极连接到电源单元的负极,并将工作介质供应到中空壳体中,电子 开始在阳极和阴极之间的环形空间中沿着从环形狭缝发射离子的相同方向漂移。 通过重新排列磁体,阳极和阴极的位置,可以在向内或向外的方向上提供离子的发射,用于处理管状物体的外表面或内表面。