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    • 2. 发明申请
    • Black matrix, method for preparing the same, and flat panel display and electromagnetic interference filter using the same
    • 黑色矩阵,其制备方法,以及使用其的平板显示器和电磁干扰滤波器
    • US20060105251A1
    • 2006-05-18
    • US11270545
    • 2005-11-10
    • Euk HwangChang NohJin KimKi SongSung Cho
    • Euk HwangChang NohJin KimKi SongSung Cho
    • G03F1/00
    • G02B5/285G02F1/133512G02F2001/133334
    • A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of forming a titanium oxide layer, forming a metal particle-deposited pattern on the titanium oxide layer, forming a Ni electroless plating layer on the metal particle-deposited pattern, and forming a Ni/Pd alloy layer on the Ni electroless plating layer. Since the black matrix may have a high blackening density via simple selective multilayer plating without using a high-price vacuum sputtering apparatus and undergoing photolithography, unlike conventional chromium-based black matrices, it may be employed in various flat panel displays. In addition, since the black matrix may exhibit superior electrical conductivity, it may be used in electromagnetic interference filters without additional front-surface blackening.
    • 黑矩阵,黑矩阵的制备方法,平板显示器和使用黑矩阵的电磁干扰滤波器。 黑色矩阵可以包括基底,氧化钛层,Ni镀层和Ni / Pd合金层。 该方法可以包括以下步骤:在氧化钛层上形成氧化钛层,形成金属颗粒沉积图案,在金属颗粒沉积图案上形成Ni化学镀层,并在其上形成Ni / Pd合金层 镍化学镀层。 由于黑色矩阵可以通过简单的选择性多层电镀具有高的黑化密度,而不使用高价格的真空溅射装置并进行光刻,与常规的铬基黑色矩阵不同,它可以用于各种平板显示器。 此外,由于黑矩阵可以表现出优异的导电性,所以它可以用于电磁干扰滤光器中,而没有额外的前表面变黑。
    • 4. 发明申请
    • Novel black matrix, method for the preparation thereof, flat display device and electromagnetic interference filter employing the same
    • 新型黑色矩阵,其制备方法,平面显示装置和采用该方法的电磁干扰滤波器
    • US20060019182A1
    • 2006-01-26
    • US11185695
    • 2005-07-21
    • Ho LeeEuk HwangJin KimChang NohKi SongSung Cho
    • Ho LeeEuk HwangJin KimChang NohKi SongSung Cho
    • G02B5/20
    • H01J11/10G02F1/133512G02F2001/133334H01J2211/444
    • A novel black matrix, a method for preparing the same, and a flat display device and an electromagnetic interference filter to which the black matrix is applied. The black matrix is prepared by exposing a photoactive compound to form a latent pattern of nuclei for crystal growth and treating the latent pattern of nuclei for crystal growth with a metal salt solution to give a metal particle-deposited pattern; forming an electroless Ni-plated layer on the metal particle-deposited pattern; and forming an electroless Cu-plated layer on the electroless Ni-plated layer. Exhibiting improved black tone, which is achieved only by a selective multilayer plating process, without using expensive vacuum sputtering apparatus or a photolithographic process, the black matrix can be applied to various flat display devices. In addition, due to improved electric conductivity, the black matrix can be used in an electromagnetic interference filter, without employing an additional front surface blackening process.
    • 一种新颖的黑色矩阵,其制备方法以及应用黑矩阵的平面显示装置和电磁干扰滤波器。 通过使光活性化合物曝光以形成晶体生长的核的潜在图案并用金属盐溶液处理晶核生长的细胞核的潜在图案以得到金属颗粒沉积图案来制备黑色矩阵; 在金属颗粒沉积图案上形成化学镀Ni层; 并在无电Ni镀层上形成化学镀Cu层。 通过选择性多层电镀工艺实现的改进的黑色调,不使用昂贵的真空溅镀装置或光刻工艺,可以将黑色矩阵应用于各种平面显示装置。 此外,由于电导率的提高,黑矩阵可以用于电磁干扰滤波器,而不需要额外的前表面变黑处理。
    • 5. 发明申请
    • Method of fabricating near field optical probe
    • 制造近场光学探针的方法
    • US20050230345A1
    • 2005-10-20
    • US11020180
    • 2004-12-27
    • Eun KimSung LeeKi SongKang Park
    • Eun KimSung LeeKi SongKang Park
    • G01Q60/22B44C1/22G01Q70/18G11B7/135G11B9/14
    • G01Q60/22G11B7/1387
    • Provided is a method of fabricating a near-field optical probe adapted to a near-field scanning optical microscopy and a near-field information storage device, in which a cantilever and an optical tip are provided in one body and the optical tip is arranged to face the upper portion of the substrate. High-concentrated boron ions are implanted into an uppermost silicon layer of a silicon on insulator (SOI) substrate, and a silicon layer into which boron ions are implanted while the silicon inside the tip is etched to form the hole to act as an etch stop layer, thereby easily removing the silicon inside the tip even with the cantilever exposed, and simplifying the process due to the simultaneous fabrication of the cantilever and the tip.
    • 本发明提供一种制造适用于近场扫描光学显微镜和近场信息存储装置的近场光学探针的方法,其中悬臂和光学尖端设置在一体内,并且光学尖端布置成 面对基板的上部。 将高浓度硼离子注入到绝缘体上硅(SOI)衬底的最上层的硅层中,并且注入硼离子的硅层,同时蚀刻尖端内部的硅以形成蚀刻停止孔 从而即使悬臂暴露也容易去除尖端内的硅,并且由于悬臂和尖端的同时制造而简化了工艺。
    • 9. 发明申请
    • Doubled-sided and multi-layered PCBN and PCD abrasive articles
    • 双面和多层PCBN和PCD磨料制品
    • US20050210755A1
    • 2005-09-29
    • US11077995
    • 2005-03-10
    • Hyun ChoKyung HanKi Song
    • Hyun ChoKyung HanKi Song
    • B22F7/00B22F7/06B23B27/14B24D3/02
    • B22F7/08B21C3/025B22F7/008B22F7/06B22F7/062B22F2005/001B22F2005/002B22F2998/00B23B27/141B23B27/148B23B2226/125B23B2226/315B23B2240/08B23B2270/54B23P15/28B24D3/06B24D18/00C04B35/5831C22C26/00C22C2026/006Y10T428/24355Y10T428/30B22F3/14B22F5/003
    • A doubled-sided PCBN and/or PCD compact can be produced using high pressure high temperature processes allowing for increased effective thickness of abrasive tools, decreased delamination, and increased useful service life. A polycrystalline compact can include a substrate having a first surface and a second surface which are non-contiguous. Additionally, a first polycrystalline layer can be attached to the first surface of the substrate and a second polycrystalline layer attached to the second surface of the substrate. The first and second polycrystalline layers can be attached to the substrate via an intermediate layer containing superabrasive particles. Such double-sided PCBN and PCD compacts allow for increased effective thickness of a tool without suffering from non-homogenous results typical of standard PCD and PCBN compacts, regardless of superabrasive particle size. Each polycrystalline layer can include superabrasive particles of varying particle sizes such that the final tool is tailored for specific abrading characteristics. Such doubled-sided PCBN and PCD compacts can be incorporated into a wide variety of abrasive tools for use in cutting, milling, grinding, polishing, drilling and other similar abrasive applications.
    • 可以使用高压高温工艺生产双面PCBN和/或PCD压块,从而可以增加研磨工具的有效厚度,减少分层,增加使用寿命。 多晶压块可以包括具有不连续的第一表面和第二表面的衬底。 此外,第一多晶层可以附接到基板的第一表面,以及附着到基板的第二表面的第二多晶层。 第一和第二多晶层可以通过包含超级磨料颗粒的中间层附着到基底上。 这种双面PCBN和PCD压块允许增加工具的有效厚度,而不会受到标准PCD和PCBN压块的典型的非均匀结果的影响,而不考虑超级磨料颗粒尺寸。 每个多晶层可以包括不同粒度的超磨料颗粒,使得最终的工具是针对具体研磨特性而定制的。 这种双面PCBN和PCD压块可以并入用于切割,铣削,研磨,抛光,钻孔和其他类似磨料应用的各种研磨工具中。