会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • FABRICATION OF SELF-ASSEMBLED NANOWIRE-TYPE INTERCONNECTS ON A SEMICONDUCTOR DEVICE
    • 半导体器件上自组装纳米型互连的制作
    • US20100052116A1
    • 2010-03-04
    • US12439734
    • 2007-08-31
    • Kevin CooperSrdjan Kordic
    • Kevin CooperSrdjan Kordic
    • H01L29/06H01L21/768
    • H01L21/76895H01L21/2885H01L2221/1094
    • The present invention relates to a semiconductor device with nanowire-type interconnect elements and a method for fabricating the same. The device comprises a metal structure with at least one self-assembled metal dendrite and forming an interconnect element (424) between a first and a second metal structure. The fabrication comprises providing an ambient environment adjacent to an interconnect surface region of a substrate that is suitable for allowing growth of at least one metal dendrite between the first and second metal structures, and initiating and sustaining self-assembly of a metal structure comprising at least one metal dendrite in the interconnect surface region between the first and second metal structures by irradiating the pn junction with photons of an energy suitable for creating free charge carriers in the first and second doped substrate regions and thus creating an electric potential difference between the first and second metal structures, which is suitable for electrolysis of metal from at least one of the first and second metal structures.
    • 本发明涉及具有纳米线型互连元件的半导体器件及其制造方法。 该装置包括具有至少一个自组装金属枝晶的金属结构,并在第一和第二金属结构之间形成互连元件(424)。 该制造包括提供邻近衬底的互连表面区域的周围环境,其适于允许在第一和第二金属结构之间生长至少一个金属枝晶,以及起始和维持金属结构的自组装,所述金属结构至少包括 在第一和第二金属结构之间的互连表面区域中的一个金属枝晶通过用适于在第一和第二掺杂衬底区域中产生自由电荷载体的能量的光子照射pn结,从而在第一和第二掺杂衬底区域之间产生电位差, 第二金属结构,其适于从第一和第二金属结构中的至少一个电解金属。
    • 2. 发明授权
    • Fabrication of self-assembled nanowire-type interconnects on a semiconductor device
    • 在半导体器件上制造自组装纳米线型互连
    • US08097535B2
    • 2012-01-17
    • US12439734
    • 2007-08-31
    • Kevin CooperSrdjan Kordic
    • Kevin CooperSrdjan Kordic
    • H01L21/00
    • H01L21/76895H01L21/2885H01L2221/1094
    • The present invention relates to a semiconductor device with nanowire-type interconnect elements and a method for fabricating the same. The device comprises a metal structure with at least one self-assembled metal dendrite and forming an interconnect element (424) between a first and a second metal structure. The fabrication comprises providing an ambient environment adjacent to an interconnect surface region of a substrate that is suitable for allowing growth of at least one metal dendrite between the first and second metal structures, and initiating and sustaining self-assembly of a metal structure comprising at least one metal dendrite in the interconnect surface region between the first and second metal structures by irradiating the pn junction with photons of an energy suitable for creating free charge carriers in the first and second doped substrate regions and thus creating an electric potential difference between the first and second metal structures, which is suitable for electrolysis of metal from at least one of the first and second metal structures.
    • 本发明涉及具有纳米线型互连元件的半导体器件及其制造方法。 该装置包括具有至少一个自组装金属枝晶的金属结构,并在第一和第二金属结构之间形成互连元件(424)。 该制造包括提供邻近衬底的互连表面区域的周围环境,其适于允许在第一和第二金属结构之间生长至少一个金属枝晶,以及起始和维持金属结构的自组装,所述金属结构至少包括 在第一和第二金属结构之间的互连表面区域中的一个金属枝晶通过用适于在第一和第二掺杂衬底区域中产生自由电荷载体的能量的光子照射pn结,从而在第一和第二掺杂衬底区域之间产生电位差, 第二金属结构,其适于从第一和第二金属结构中的至少一个电解金属。
    • 6. 发明授权
    • Method of distancing a bubble and bubble displacement apparatus
    • 隔离气泡和气泡位移装置的方法
    • US07837762B2
    • 2010-11-23
    • US11914669
    • 2005-05-17
    • Kevin CooperScott Warrick
    • Kevin CooperScott Warrick
    • B01D19/00
    • G03F7/70341G03F7/70858
    • In the field of immersion lithography, it is known to provide a liquid between an optical exposure system and a wafer carrying layers of photosensitive material to be irradiated with a pattern by the optical exposure system. However, bubbles are known to form or exist in the liquid, sometimes close to a surface of the wafer resulting in scattering of light emitted from the optical exposure system. The scattering causes the pattern recorded in the layers of photosensitive material to be corrupted, resulting in defective wafers. Therefore, the present invention provides a bubble displacement apparatus comprising a drive signal generator for driving a force generator arranged to generate a force in response to a drive signal generated by the drive signal generator. The force generated urges the bubble away from the surface.
    • 在浸没式光刻领域中,已知在光学曝光系统和承载光敏材料层的晶片之间提供液体,以通过光学曝光系统照射图案。 然而,已知气泡在液体中形成或存在,有时靠近晶片的表面导致从光学曝光系统发射的光的散射。 散射使得记录在感光材料层中的图案被破坏,导致缺陷晶片。 因此,本发明提供一种气泡移动装置,其包括用于驱动力发生器的驱动信号发生器,其被布置成响应于由驱动信号发生器产生的驱动信号而产生力。 产生的力促使气泡离开表面。