会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Reinforcement design support apparatus and reinforcement design support program
    • 加固设计支援设备及加固设计支援计划
    • US20070159500A1
    • 2007-07-12
    • US11635687
    • 2006-12-08
    • Kenzo NakanoIchiro Takahashi
    • Kenzo NakanoIchiro Takahashi
    • G09G5/00
    • G06F17/50E04C5/00
    • The present invention provides a reinforcement design support apparatus and so on for assisting the selection of a reinforcing metal fixture to be used to reinforce a web opening. The reinforcement design support apparatus comprises an application condition determining unit for determining whether or not a web opening provided in a steel frame beam satisfies an application condition on the basis of steel frame beam data and web opening data read from a design drawing, and when application is impossible, correcting the web opening data and re-determining whether or not the application condition has been satisfied, and a selection unit for selecting a reinforcing metal fixture to be applied to the web opening provided in the steel frame beam when the application condition is determined by the application condition determining means to have been satisfied.
    • 本发明提供了一种用于辅助选择用于加强卷材开口的加强金属夹具的加强设计支撑装置等。 加固设计支撑装置包括:应用条件确定单元,用于基于钢框架梁数据和从设计图读出的卷筒纸打开数据来确定钢框架梁中的卷筒纸开口是否满足应用条件,以及当应用 是不可能的,纠正网页打开数据并重新确定是否已经满足了应用条件;以及选择单元,用于选择当应用条件是在钢框架梁中时设置在钢框架梁上的卷筒纸开口的加强金属夹具 由所述应用条件确定装置确定已被满足。
    • 3. 发明授权
    • Treatment tool for endoscope
    • 内窥镜治疗工具
    • US08157798B2
    • 2012-04-17
    • US11796785
    • 2007-04-30
    • Ichiro Takahashi
    • Ichiro Takahashi
    • A61B18/12
    • A61B17/072A61B10/02A61B18/14A61B18/1445A61B2018/1407A61B2018/141A61B2018/1861
    • A treatment tool for an endoscope includes: a treatment portion that is positioned on a distal end side and of which at least a portion is formed from an electroconductive material; an operating wire that is formed from an electroconductive material and is connected to the treatment portion; a sheath that is formed from an electrically non-conductive material through which the operating wire is inserted; a base that is fixed to a base end side of the sheath; an operating section that is rotatably mounted on the base and is connected to a base end side of the operating wire, and that causes the treatment portion to move forwards and backwards and to rotate via the operating wire; and a plug that is provided on the base and is electrically connected to the operating wire.
    • 一种用于内窥镜的处理工具,包括:处理部,其位于前端侧,至少一部分由导电材料形成; 由导电材料形成并连接到处理部分的操作线; 由导电材料制成的护套,通过该护套插入操作线; 固定在护套的基端侧的基部; 操作部,其可旋转地安装在所述基座上并连接到所述操作线的基端侧,并且使所述处理部向前后移动并经由所述操作线旋转; 以及设置在基座上并且电连接到操作线的插头。
    • 6. 发明授权
    • System and method for managing monitoring equipment
    • 管理监控设备的系统和方法
    • US06675167B2
    • 2004-01-06
    • US09810581
    • 2001-03-19
    • Ichiro TakahashiSeigo KurokawaTatsuhiko AsanoHiromitsu Kaneko
    • Ichiro TakahashiSeigo KurokawaTatsuhiko AsanoHiromitsu Kaneko
    • G06F1730
    • G05B23/0283
    • An equipment management system structured by a monitoring apparatus to monitor equipment of a facility being monitored and retrieve operation data, a database apparatus in which the operation data retrieved by the monitoring apparatus is recorded, and a database client apparatus to send and receive information to and from the database apparatus via a network, display the data recorded in the database apparatus, and enter data. The database apparatus records maintenance reference values for the equipment of the facility being monitored and the monitoring apparatus or database client apparatus outputs a display or printout prompting an execution of maintenance work when the operation data is in excess of or close to the maintenance reference values.
    • 一种由监视装置构成的设备管理系统,用于监视被监视设备的设备并检索操作数据;数据库装置,其中监视装置检索到的操作数据被记录在该数据库装置中;以及数据库客户端装置,用于向 经由网络从数据库装置显示记录在数据库装置中的数据,并输入数据。 数据库装置记录被监视设备的设备的维护参考值,并且当操作数据超过或接近维护参考值时,监视设备或数据库客户端设备输出显示或打印输出,提示维护工作的执行。
    • 7. 发明授权
    • Chemical vapor deposition system with reduced material deposition on chamber wall surfaces
    • 化学气相沉积系统,在室壁表面上减少材料沉积
    • US06254687B1
    • 2001-07-03
    • US09280024
    • 1999-03-26
    • Ichiro Takahashi
    • Ichiro Takahashi
    • C23C1600
    • C23C16/45502C23C16/4584C23C16/4588
    • In a chemical vapor deposition system, susceptors are supported by a pair of turntables which are disposed in a vertical and parallel arrangement. A plurality of wafers to be processed are arranged circumferentially on opposing surfaces of the susceptors, and heater units are arranged behind the turntables. Because the wall surfaces exposed to the material gas are mostly covered by the wafers to be processed, any wasteful deposition of material on the chamber surfaces can be avoided. Thus, the need to clean the surface of the chamber wall is minimized. Such material deposition is not only wasteful but also could become a source of contamination as such deposition tends to peel off.
    • 在化学气相沉积系统中,基座由一对以垂直和平行布置的转盘支撑。 待处理的多个晶片周向布置在基座的相对表面上,并且加热器单元布置在转盘后面。 因为暴露于原料气体的壁表面大部分被要处理的晶片所覆盖,所以可以避免材料在室表面上的浪费沉积。 因此,清洁室壁表面的需要被最小化。 这种材料沉积不仅浪费,而且也可能成为污染源,因为这种沉积倾向于剥离。