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    • 1. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US06762820B2
    • 2004-07-13
    • US09948796
    • 2001-09-10
    • Kenji UdagawaTomoyuki YoshidaMichinori HashimotoFumio Karibe
    • Kenji UdagawaTomoyuki YoshidaMichinori HashimotoFumio Karibe
    • G03B2752
    • G03F7/708G03B27/42
    • A chemical filter, which removes chemical pollutants from gas and controls temperature fluctuation of the gas before and after passing through the filter to within a predetermined range, is arranged in a portion of a ventilation path extending from a machine chamber housing at least a portion of an air conditioning unit to a main body chamber housing an exposure apparatus main body. Accordingly, the atmosphere around the exposure apparatus main body arranged downstream of the chemical filter is kept chemically clean, and the temperature fluctuation of the gas, of which the temperature is set to a target temperature by the air conditioner, after passing through the chemical filter is limited. That is, occurrence of a problem such as an illumination reduction caused by tarnish of optical members and an increase of the temperature fluctuation amount of the gas supplied into the main body chamber can be effectively limited.
    • 一种化学过滤器,其从气体中除去化学污染物并且将通过过滤器之前和之后的气体的温度波动控制在预定范围内,设置在从容纳至少一部分 空调单元到容纳曝光装置主体的主体室。 因此,布置在化学过滤器下游的曝光装置主体周围的气氛保持化学清洁,并且在通过化学过滤器之后,通过空调将温度设定为目标温度的气体的温度波动 有限 也就是说,可以有效地限制诸如由光学构件的晦暗引起的照明减少和供应到主体室中的气体的温度波动量的增加的问题的发生。