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1. 发明授权

US4678919A Electron beam exposure method and apparatus 失效
标题翻译：电子束曝光方法及装置
公开(公告)号：US4678919A
公开(公告)日：1987-07-07
申请号：US883425
申请日：1986-07-14
申请人： Kenji Sugishima , Kenji Nakagawa
发明人： Kenji Sugishima , Kenji Nakagawa
IPC分类号： G03F7/20 , H01J37/304 , H01L21/027 , H01L21/30 , H01J37/24
CPC分类号： H01L21/30 , H01J37/304
摘要： An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variations on the level of the surface of the workpiece due to an elastic deformation thereof during the exposure process. With the use of the correction data, the desired pattern is correctly reproduced as intended when the workpiece is fully supported and the surface thereof recovers its flatness.
摘要翻译：一种用于在工件上产生所需图案的电子束曝光系统。该图案由预定图案数据指定。模式数据用修正数据修改。从曝光过程中由于其弹性变形引起的工件表面的水平变化的信息获得校正数据。通过使用校正数据，当工件被完全支撑并且其表面恢复其平坦度时，期望的图案被正确地再现。

2. 发明申请

US20090240366A1 METHOD AND SYSTEM FOR DETECTION OF TOOL PERFORMANCE DEGRADATION AND MISMATCH 有权
标题翻译：用于检测工具性能降低和误差的方法和系统
公开(公告)号：US20090240366A1
公开(公告)日：2009-09-24
申请号：US12416018
申请日：2009-03-31
申请人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
发明人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
IPC分类号： G06F17/00 , G06F15/18 , G06N3/12 , G06N7/00
CPC分类号： G05B13/0265 , G05B19/4065 , G05B2219/33041 , G05B2219/37252 , G06N5/04 , G06N99/005 , Y02P90/86
摘要： Autonomous biologically based learning tool system(s) and method(s) that the tool system(s) employs for learning and analysis of performance degradation and mismatch are provided. The autonomous biologically based learning tool system includes (a) one or more tool systems that perform a set of specific tasks or processes and generate assets and data related to the assets that characterize the various processes and associated tool performance; (b) an interaction manager that receives and formats the data, and (c) an autonomous learning system based on biological principles of learning. Objectively generated knowledge gleaned from synthetic or production data can be utilized to determine a mathematical relationship among a specific output variable and a set of associated influencing variables. The generated relationship facilitates assessment of performance degradation of a set of tools, and performance mismatch among tools therein.
摘要翻译：提供了自动生物学的学习工具系统和工具系统用于学习和分析性能下降和失配的方法。自主的基于生物学的学习工具系统包括（a）执行一组特定任务或过程的一个或多个工具系统，并且生成与表征各种过程和相关工具性能的资产相关的资产和数据; （b）接收和格式化数据的交互管理器，（c）基于生物学习原理的自主学习系统。可以利用从合成或生产数据中获取的客观生成的知识来确定特定输出变量与一组相关影响变量之间的数学关系。生成的关系有助于评估一组工具的性能下降，以及其中的工具之间的性能不匹配。

3. 发明授权

US07340377B2 Monitoring a single-wafer processing system 有权
标题翻译：监控单晶圆处理系统
公开(公告)号：US07340377B2
公开(公告)日：2008-03-04
申请号：US11456020
申请日：2006-07-06
申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
发明人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
IPC分类号： G06F11/30
CPC分类号： G05B19/41875 , C23C16/52 , G05B23/0254 , G05B2219/37514 , G05B2219/37533 , G05B2219/45031 , Y02P90/22 , Y02P90/26
摘要： A method of monitoring a single-wafer processing system in real-time using low-pressure based modeling techniques that include processing a wafer in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.
摘要翻译：一种使用基于低压的建模技术来实时监测单晶片处理系统的方法，其包括在处理室中处理晶片; 确定针对过程参数的变化率的测量的动态过程响应; 执行实时动态模型以产生预测的动态过程响应; 使用预测的动态过程响应和预期过程响应之间的差来确定动态估计误差; 并将动态估计误差与运算极限进行比较。

4. 发明申请

US20070239375A1 MONITORING A SYSTEM DURING LOW-PRESSURE PROCESSES 有权
标题翻译：在低压过程中监测系统
公开(公告)号：US20070239375A1
公开(公告)日：2007-10-11
申请号：US11278379
申请日：2006-03-31
申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
发明人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , C23C16/52 , G05B23/0254 , G05B2219/37514 , G05B2219/37533 , G05B2219/45031 , Y02P90/22 , Y02P90/26
摘要： A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.
摘要翻译：一种使用基于低压的建模技术实时监控处理系统的方法，所述技术包括处理处理室中的一个或多个晶片; 确定针对过程参数的变化率的测量的动态过程响应; 执行实时动态模型以产生预测的动态过程响应; 使用预测的动态过程响应和预期过程响应之间的差来确定动态估计误差; 并将动态估计误差与运算极限进行比较。

5. 发明授权

US07025280B2 Adaptive real time control of a reticle/mask system 失效
标题翻译：光罩/掩模系统的自适应实时控制
公开(公告)号：US07025280B2
公开(公告)日：2006-04-11
申请号：US10769623
申请日：2004-01-30
申请人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
发明人： Sanjeev Kaushal , Pradeep Pandey , Kenji Sugishima
IPC分类号： G06F7/66 , G06F17/50 , C23C16/00 , H05B3/02
CPC分类号： G03F1/68 , G03F1/78 , H01L21/67248
摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller. Generally, the method includes creating a dynamic model of the thermal processing system; incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints; creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time.
摘要翻译：提出了一种包括多变量控制器的自适应实时热处理系统。通常，该方法包括创建热处理系统的动态模型; 在动态模型中结合掩模/掩模曲率; 将扩散扩增模型耦合到动态热模型中; 创建一个多变量控制器; 将标称设定值参数化为智能设定点的向量; 创建一个过程敏感性矩阵; 使用有效的优化方法和过程数据创建智能设定点; 并建立在运行期间选择合适的模型和设定值的配方。

6. 发明授权

US5430292A Pattern inspection apparatus and electron beam apparatus 失效
标题翻译：图案检查装置和电子束装置
公开(公告)号：US5430292A
公开(公告)日：1995-07-04
申请号：US134860
申请日：1993-10-12
申请人： Ichiro Honjo , Kenji Sugishima , Masaki Yamabe
发明人： Ichiro Honjo , Kenji Sugishima , Masaki Yamabe
IPC分类号： G03F1/00 , H01J37/244 , H01J37/30 , H01J37/29
CPC分类号： G03F1/86 , H01J37/244 , H01J37/3005 , H01J2237/221 , H01J2237/2441 , H01J2237/24435 , H01J2237/2447 , H01J2237/24495 , H01J2237/24592 , H01J2237/2817
摘要： A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspecting sample, such as masks, wafers or so forth by irradiating electron beams onto the inspection sample and detecting a secondary electron or a backscattered electron reflected from the surface of the inspecting sample or a transmission electron passing through the inspection sample. The pattern inspection apparatus includes an electron beam generating means including at least one electron gun for generating at least one electron beam irradiating on the surface of the inspecting sample, a movable means for supporting the inspecting sample, a detecting means including a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processing means for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detecting means. Also, when a plurality of electron beams are used for simultaneous irradiation of the inspecting sample, the pattern inspection apparatus is provided a mechanism for avoiding interference of a reflected beam of the adjacent electron beam.
摘要翻译：图案检查装置被设计为通过将电子束照射到检查样品上并检测从检查表面反射的二次电子或反向散射电子，来快速且准确地对检查样品进行检查，例如掩模，晶片等。样品或通过检查样品的透射电子。图案检查装置包括：电子束产生装置，包括至少一个电子枪，用于产生照射在检查样品的表面上的至少一个电子束;支撑检查样品的可移动装置;检测装置，包括多个电子检测用于检测包含与检查样品的构造相关的信息的电子的元件和用于同时或并行地形成检测装置的电子检测元件的输出的检测信号处理装置。此外，当使用多个电子束同时照射检查样本时，图案检查装置被提供用于避免相邻电子束的反射光束的干涉的机构。

7. 发明授权

US4352724A Method of manufacturing a semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US4352724A
公开(公告)日：1982-10-05
申请号：US208391
申请日：1980-11-19
申请人： Kenji Sugishima , Tadakazu Takada
发明人： Kenji Sugishima , Tadakazu Takada
IPC分类号： H01L21/306 , H01L21/033 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/768 , C23C15/00 , C23F1/00
CPC分类号： H01L21/76804 , H01L21/033 , H01L21/0332 , H01L21/0334 , H01L21/0335 , H01L21/3065 , H01L21/31111 , H01L21/31116 , H01L21/32134 , H01L21/32136 , H01L21/32137 , H01L21/76838
摘要： A method of manufacturing a semiconductor device having a multi-layer structure comprises the steps of patterning in accordance with a predetermined pattern a thin film of photoresist formed on a film to be etched which has been formed on a semiconductor substrate, etching the film to be etched partly by an isotropic etching using said patterned film as a mask, completing the etching by an anisotropic etching in the direction of its depth, resulting in tapered or inclined sides on the etched film. The isotropic and anisotropic etchings may be carried out in the same apparatus by changing the reactive gases used in these etchings and/or the conditions of each etching, such as the amount of gas, the gas pressure and the applied radio frequency power.
摘要翻译：一种制造具有多层结构的半导体器件的方法包括以下步骤：根据预定图案将形成在待蚀刻的膜上的光致抗蚀剂薄膜形成在半导体衬底上，将该膜蚀刻成通过使用所述图案化膜作为掩模的各向同性蚀刻部分地蚀刻，通过在其深度方向上的各向异性蚀刻完成蚀刻，导致蚀刻膜上的锥形或倾斜侧。各向同性和各向异性蚀刻可以通过改变在这些蚀刻中使用的反应气体和/或每个蚀刻的条件，例如气体量，气体压力和施加的射频功率，在相同的装置中进行。

8. 发明授权

US08396582B2 Method and apparatus for self-learning and self-improving a semiconductor manufacturing tool 有权
标题翻译：用于自学习和自我改进的半导体制造工具的方法和装置
公开(公告)号：US08396582B2
公开(公告)日：2013-03-12
申请号：US12697121
申请日：2010-01-29
申请人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
发明人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
IPC分类号： G06F15/18 , G06N3/08 , G06N3/12
CPC分类号： G06N99/005 , G05B13/0265 , G06N5/04
摘要： System(s) and method(s) for optimizing performance of a manufacturing tool are provided. Optimization relies on recipe drifting and generation of knowledge that capture relationships among product output metrics and input material measurement(s) and recipe parameters. Optimized recipe parameters are extracted from a basis of learned functions that predict output metrics for a current state of the manufacturing tool and measurements of input material(s). Drifting and learning are related and lead to dynamic optimization of tool performance, which enables optimized output from the manufacturing tool as the operation conditions of the tool changes. Features of recipe drifting and associated learning can be autonomously or externally configured through suitable user interfaces, which also can be drifted to optimize end-user interaction.
摘要翻译：提供了用于优化制造工具性能的系统和方法。优化依赖于食谱漂移和产生知识，捕获产品输出指标和输入材料测量和配方参数之间的关系。从学习功能的基础提取优化的配方参数，该函数预测制造工具的当前状态的输出度量和输入材料的测量。漂移和学习相关，导致刀具性能的动态优化，从而随着刀具的操作条件的变化，可以优化制造工具的输出。配方漂移和相关学习的特征可以通过适当的用户界面进行自主或外部配置，也可以通过漂移来优化最终用户交互。

9. 发明申请

US20110131162A1 AUTONOMOUS BIOLOGICALLY BASED LEARNING TOOL 有权
标题翻译：自主生物学的学习工具
公开(公告)号：US20110131162A1
公开(公告)日：2011-06-02
申请号：US12044958
申请日：2008-03-08
申请人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
发明人： Sanjeev Kaushal , Sukesh Janubhai Patel , Kenji Sugishima
IPC分类号： G06N3/12 , G06N5/04
CPC分类号： G06N5/04 , G05B13/0265 , G06N5/02 , G06N99/005
摘要： An autonomous biologically based learning tool system and a method that the tool system employs for learning and analysis are provided. The autonomous biologically based learning tool system includes (a) one or more tool systems that perform a set of specific tasks or processes and generate assets and data related to the assets that characterize the various processes and associated tool performance; (b) an interaction manager that receives and formats the data, and (c) an autonomous learning system based on biological principles of learning. The autonomous learning system comprises a memory platform and a processing platform that communicate through a network. The network receives data from the tool system and from an external actor through the interaction manager. Both the memory platform and the processing platform include functional components and memories that can be defined recursively. Similarly, the one or more tools can be deployed recursively, in a bottom-up manner in which an individual autonomous tools is assembled in conjunction with other (disparate or alike) autonomous tools to form an autonomous group tool, which in turn can be assembled with other group tools to form a conglomerated autonomous tool system. Knowledge generated and accumulated in the autonomous learning system(s) associated with individual, group and conglomerated tools can be cast into semantic networks that can be employed for learning and driving tool goals based on context.
摘要翻译：提供了一种自主的基于生物学的学习工具系统和工具系统用于学习和分析的方法。自主的基于生物学的学习工具系统包括（a）执行一组特定任务或过程的一个或多个工具系统，并生成与表征各种过程和相关工具性能的资产相关的资产和数据; （b）接收和格式化数据的交互管理器，（c）基于生物学习原理的自主学习系统。自主学习系统包括通过网络进行通信的存储器平台和处理平台。该网络通过交互管理器从工具系统和外部演员接收数据。存储器平台和处理平台都包括可以递归定义的功能组件和存储器。类似地，可以以自下而上的方式递归地部署一个或多个工具，其中单独的自主工具与其他（不同或相似）的自主工具结合组合以形成自主的组工具，其又可以被组装与其他团体工具组成一个集团自主的工具系统。在与个人，团体和集体工具相关的自主学习系统中生成和积累的知识可以被投入到可以用于基于上下文学习和驱动工具目标的语义网络中。

10. 发明申请

US20090153842A1 OPTICAL MEASUREMENT SYSTEM WITH SYSTEMATIC ERROR CORRECTION 有权
标题翻译：具有系统误差校正的光学测量系统
公开(公告)号：US20090153842A1
公开(公告)日：2009-06-18
申请号：US11956751
申请日：2007-12-14
申请人： Sanjeev Kaushal , Sairam Sankaranarayanan , Kenji Sugishima
发明人： Sanjeev Kaushal , Sairam Sankaranarayanan , Kenji Sugishima
IPC分类号： G01N21/00
CPC分类号： G01N21/95607
摘要： An optical measurement system and wafer processing tool for correcting systematic errors in which a first diffraction spectrum is measured from a standard substrate including a layer having a known refractive index and a known extinction coefficient by exposing the standard substrate to a spectrum of electromagnetic energy. A tool-perfect diffraction spectrum is calculated for the standard substrate. A hardware systematic error is calculated by comparing the measured diffraction spectrum to the calculated tool-perfect diffraction spectrum. A second diffraction spectrum from a workpiece is measured by exposing the workpiece to the spectrum of electromagnetic energy, and the measured second diffraction spectrum is corrected based on the calculated hardware systematic error to obtain a corrected diffraction spectrum.
摘要翻译：一种用于校正系统误差的光学测量系统和晶片处理工具，其中通过将标准衬底暴露于电磁能谱，从包括具有已知折射率和已知消光系数的层的标准衬底测量第一衍射光谱。计算标准底物的工具完美衍射光谱。通过将测量的衍射光谱与计算的工具完美衍射光谱进行比较来计算硬件系统误差。通过将工件暴露于电磁能的频谱来测量来自工件的第二衍射光谱，并且基于所计算的硬件系统误差来校正所测量的第二衍射光谱，以获得校正的衍射光谱。

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