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    • 4. 发明授权
    • Image forming apparatus and information processing apparatus
    • 图像形成装置和信息处理装置
    • US08724156B2
    • 2014-05-13
    • US13617310
    • 2012-09-14
    • Shinho IkedaYuji MurataMasakazu KawashitaHideki YamasakiTadamasa SakamakiBinhui Liu
    • Shinho IkedaYuji MurataMasakazu KawashitaHideki YamasakiTadamasa SakamakiBinhui Liu
    • G06F3/12
    • G06K15/02G06K15/40G06K15/406
    • An image forming apparatus includes an image forming unit that forms an image and a controller that controls the image forming unit, wherein the controller includes a first execution unit that executes a first program, a first main memory that includes a first non-volatile memory, is connected to the first execution unit, and stores a first start program, a first transmission and reception controller that is connected to the first bus, controls the transmission and reception of data, and includes a volatile memory, a second execution unit that is connected to the first execution unit and executes a second program, a second main memory that includes a second non-volatile memory, is connected to the second execution unit, and stores a second start program, and a second transmission and reception controller that is connected to the second bus, controls the transmission and reception of data, and includes a third non-volatile memory.
    • 图像形成装置包括形成图像的图像形成单元和控制图像形成单元的控制器,其中,所述控制器包括执行第一程序的第一执行单元,包括第一非易失性存储器的第一主存储器, 连接到第一执行单元,并且存储连接到第一总线的第一启动程序,第一发送和接收控制器,控制数据的发送和接收,并且包括易失性存储器,连接的第二执行单元 到第一执行单元并执行第二程序,包括第二非易失性存储器的第二主存储器连接到第二执行单元,并且存储第二启动程序和第二发送和接收控制器,该第二发送和接收控制器被连接到 第二总线控制数据的发送和接收,并且包括第三非易失性存储器。
    • 6. 发明授权
    • Industrial robot
    • 工业机器人
    • US06178842B2
    • 2001-01-30
    • US09197667
    • 1998-11-23
    • Yuji MurataIsao AraiNobutaka FukayamaKiyoshi Kanitani
    • Yuji MurataIsao AraiNobutaka FukayamaKiyoshi Kanitani
    • B25J906
    • B25J9/047B25J18/005Y10T74/20305Y10T74/20317
    • An industrial robot is provided which has a compact and of low height body operable within an operating range not exceed the height of the robot during operation, and yet is able to secure a wide operating range of the near front side of the robot. The robot has a fixed base, a rotary base mounted on the fixed base rotatably around a vertical swing axis, a first arm mounted on the rotary base rotatably around a horizontal first rotational axis, a second arm mounted on the first arm rotatably around a horizontal second rotational axis and a wrist mounted on the distal end of the second arm rotatably around a longitudinal axis thereof. The first arm is made operable to hang down in a position where the axis of the first arm is perpendicular to the installation surface of the robot and outwardly offset from the outer surface of the fixed base, the operating range of the first arm which interfere with the fixed base is made so small and the operating range of the front side of the robot is much enlarged.
    • 提供了一种工业机器人,其具有紧凑且低度高的身体,其操作范围在操作范围内不超过机器人的高度,并且能够确保机器人近前侧的宽工作范围。 所述机器人具有固定基座,旋转基座,其可旋转地围绕垂直摆动轴线安装在所述固定基座上;第一臂部,其围绕水平第一旋转轴线可旋转地安装在所述旋转基座上;第二臂部,其可旋转地围绕水平 第二旋转轴线和安装在第二臂的远端上的手腕围绕其纵向轴线可旋转。 第一臂可操作地悬挂在第一臂的轴线垂直于机器人的安装表面并向外偏离固定基座的外表面的位置,第一臂的操作范围与 固定底座变小,机器人前侧的工作范围大大扩大。
    • 9. 发明授权
    • Method of cleaning and process for producing semiconductor device
    • 用于制造半导体器件的清洁和处理方法
    • US07767585B2
    • 2010-08-03
    • US12066103
    • 2006-09-05
    • Koichiro SagaKenji YamadaTomoyuki AzumaYuji Murata
    • Koichiro SagaKenji YamadaTomoyuki AzumaYuji Murata
    • H01L21/302H01L21/461
    • H01L21/76808H01L21/02063H01L21/76814H01L21/76883Y10S438/906
    • A method of cleaning for removing metal compounds attached to a surface of a substrate, wherein the cleaning is conducted by supplying a supercritical fluid of carbon dioxide comprising at least one of triallylamine and tris(3-aminopropyl)amine to the surface of the substrate and a process for producing a semiconductor device using the method of cleaning are provided. In accordance with the method of cleaning and the method for producing a semiconductor device using the method, etching residues or polishing residues containing metal compounds are efficiently removed selectively from the electroconductive material forming the electroconductive layer. When the electroconductive layer is a wiring, an increase in resistance due to residual metal compounds can be suppressed, and an increase in the leak current due to diffusion of the metal from the metal compounds to the insulating film can be prevented. Therefore, reliability on the wiring is improved, and the yield of the semiconductor device can be increased.
    • 一种用于去除附着在基材表面上的金属化合物的清洗方法,其中通过将包含三烯丙基胺和三(3-氨基丙基)胺中的至少一种的二氧化碳的超临界流体供应到基材的表面进行清洗, 提供了使用清洗方法制造半导体器件的方法。 根据使用该方法的清洗方法和制造半导体器件的方法,从形成导电层的导电材料中选择性地有效地除去含有金属化合物的残留物或抛光残渣。 当导电层是布线时,可以抑制由于残留的金属化合物引起的电阻的增加,并且可以防止由金属从金属化合物扩散到绝缘膜的漏电流的增加。 因此,能够提高布线的可靠性,能够提高半导体装置的收率。
    • 10. 发明授权
    • Alternating potential electrostatic separator of particles with
different physical properties
    • 具有不同物理性质的交替潜在静电分离器
    • US4357234A
    • 1982-11-02
    • US264598
    • 1981-05-18
    • Ion I. InculetYuji Murata
    • Ion I. InculetYuji Murata
    • B03C7/00B03C7/02B03C7/04
    • B03C7/023B03C7/00
    • The separator charges the particles to be separated and passes them through an alternating electric field which has a non-uniform intensity in a direction perpendicular to the forward direction, and which also has field lines curved in the same direction. The particles which move along the curved field lines due to their charge are thus subjected to a centrifugal force which effects their separation. The separator includes a pair of conductive electrodes, the first being substantially horizontal or possibly at an angle from the horizontal and the second mounted facing the first at a predetermined angle to it. The electrodes may be planar or curved. The field is supplied by an ac source operating in the range of 3 to 1000 hz. A mechanical vibrator attached to the first electrode imparts the forward motion to the particles.
    • 分离器对要分离的颗粒进行充电并使其通过在垂直于正向的方向上具有不均匀强度的交变电场,并且还具有沿相同方向弯曲的场线。 因此,由于它们的电荷而沿弯曲的场线移动的颗粒因此受到影响其分离的离心力。 分离器包括一对导电电极,第一个基本上水平或可能与水平面成一定角度,第二个安装面向第一个以预定的角度安装。 电极可以是平面的或弯曲的。 该场由交流源供电,工作频率范围为3至1000赫兹。 附接到第一电极的机械振动器向颗粒施加向前的运动。