会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR
    • 电子设备及其制造方法
    • US20070249088A1
    • 2007-10-25
    • US11768399
    • 2007-06-26
    • Kiwako OHMORINobuo TANABEAkinobu ONO
    • Kiwako OHMORINobuo TANABEAkinobu ONO
    • H01L51/40
    • H01L51/0015G03F7/039G03F7/093H01L51/5206
    • A manufacturing method for an electronic device, the method including forming a transparent conductive film, including conductive polymers, on a base material, and irradiating ultraviolet light onto a part of the transparent conductive film such that first regions of the transparent conductive film are not irradiated and second regions, adjacent to the first regions, are irradiated, thus forming irradiated portions and non-irradiated portions. The irradiated portions having an electrical resistance value higher than that of the non-irradiated portions. The ultraviolet light includes a wavelength that exhibits an absorbance in an absorption spectrum of the conductive polymers, of the transparent conductive film, two or more times higher than that of a background.
    • 一种电子器件的制造方法,该方法包括在基材上形成包含导电聚合物的透明导电膜,并将紫外光照射到透明导电膜的一部分上,使得透明导电膜的第一区域不被照射 并且与第一区域相邻的第二区域被照射,从而形成照射部分和未照射部分。 所述照射部的电阻值高于未照射部的电阻值。 紫外线包括透明导电膜的导电性聚合物的吸收光谱中的吸光度的波长比背景的两倍以上。