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    • 1. 发明申请
    • Manufacturing Method of Display Device
    • 显示设备制造方法
    • US20090155933A1
    • 2009-06-18
    • US12331546
    • 2008-12-10
    • Ken OHARATsunenori YamamotoSusumu EdoYoshiaki NakayoshiHiroshi Saito
    • Ken OHARATsunenori YamamotoSusumu EdoYoshiaki NakayoshiHiroshi Saito
    • H01L21/66H01L33/00
    • H01L27/1288G02F1/134363G02F1/1362G02F2001/13625H01L27/1214
    • To suppress the occurrence of image quality irregularities in a liquid crystal display device having a TFT substrate which is manufactured by performing steps a plurality of times in such a manner that one region is divided into a plurality of exposure regions, and the plurality of exposure regions is exposed. In a manufacturing method of a display device which performs, for a preliminarily determined one region on a surface of an insulation substrate, an exposure/development step including a step of exposing a formed film made of a photosensitive material and a step of developing an exposed film made of the photosensitive material a plurality of times, said each exposure step is performed such that said one region is divided into the plurality of exposure regions by a boundary line which has no overlapping portion and is not aligned with a boundary line between the exposure regions in the exposure step for at least one time out of other exposure steps, and the whole of said one region is exposed by individually exposing the respective exposure regions.
    • 为了抑制具有TFT基板的液晶显示装置的出现,该TFT基板是通过以一个区域被分成多个曝光区域的方式多次进行制造的,并且多个曝光区域 被暴露。 在显示装置的制造方法中,对于绝缘基板的表面上的预先确定的一个区域,进行曝光/显影步骤,该曝光/显影步骤包括使由感光材料制成的成膜的曝光步骤和使曝光 所述各曝光步骤被执行为使得所述一个区域被不具有重叠部分的边界线分成多个曝光区域,并且不与曝光之间的边界线对齐 曝光步骤中的曝光步骤中的至少一次的区域,并且通过分别曝光各个曝光区域来曝光整个所述一个区域。