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    • 1. 发明授权
    • Ion doping system, ion doping method and semiconductor device
    • 离子掺杂系统,离子掺杂法和半导体器件
    • US07230256B2
    • 2007-06-12
    • US10559128
    • 2004-05-31
    • Ken NakanishiHiroshi Aichi
    • Ken NakanishiHiroshi Aichi
    • H01L29/04
    • H01J27/08H01J37/08H01J2237/31701H01L21/265H01L29/66757
    • An ion doping system includes a chamber 11, an exhausting section 13 for exhausting gases from the chamber, an ion source 12 provided for the chamber, and an accelerating section 23 for extracting the ions, generated in the ion source 12, from the ion source 12 and accelerating the ions toward a target. The ion source 12 includes an inlet port 14 to introduce a gas including a dopant element, a filament 15 emitting thermo electrons, and an anode electrode 17 to produce an arc discharge between the filament and itself. The ion source 12 decomposes the gas through the arc discharge, thereby generating ions including the dopant element. The ion doping system controls the arc discharge such that a constant amount of arc current flows between the filament and the anode electrode.
    • 离子掺杂系统包括:腔室11,用于从腔室排出气体的排气部分13,为腔室提供的离子源12;以及用于从离子源12中提取离子源中产生的离子的加速部分23; 12并将离子加速到靶。 离子源12包括用于引入包括掺杂剂元素的气体,发射热电子的灯丝15和阳极电极17的入口端口14,以在灯丝本身之间产生电弧放电。 离子源12通过电弧放电分解气体,从而产生包括掺杂元素的离子。 离子掺杂系统控制电弧放电,使得恒定量的电弧电流在灯丝和阳极之间流动。
    • 2. 发明申请
    • Ion doping system, ion doping method and semiconductor device
    • 离子掺杂系统,离子掺杂法和半导体器件
    • US20060151786A1
    • 2006-07-13
    • US10559128
    • 2004-05-31
    • Ken NakanishiHiroshi Aichi
    • Ken NakanishiHiroshi Aichi
    • H01L29/04
    • H01J27/08H01J37/08H01J2237/31701H01L21/265H01L29/66757
    • An ion doping system includes a chamber 11, an exhausting section 13 for exhausting gases from the chamber, an ion source 12 provided for the chamber, and an accelerating section 23 for extracting the ions, generated in the ion source 12, from the ion source 12 and accelerating the ions toward a target. The ion source 12 includes an inlet port 14 to introduce a gas including a dopant element, a filament 15 emitting thermo electrons, and an anode electrode 17 to produce an arc discharge between the filament and itself. The ion source 12 decomposes the gas through the arc discharge, thereby generating ions including the dopant element. The ion doping system controls the arc discharge such that a constant amount of arc current flows between the filament and the anode electrode.
    • 离子掺杂系统包括:腔室11,用于从腔室排出气体的排气部分13,为腔室提供的离子源12;以及用于从离子源12中提取离子源中产生的离子的加速部分23; 12并将离子加速到靶。 离子源12包括用于引入包括掺杂剂元素的气体,发射热电子的灯丝15和阳极电极17的入口端口14,以在灯丝本身之间产生电弧放电。 离子源12通过电弧放电分解气体,从而产生包括掺杂元素的离子。 离子掺杂系统控制电弧放电,使得恒定量的电弧电流在灯丝和阳极之间流动。
    • 3. 发明授权
    • Display device equipped with touch sensor
    • 显示设备配有触摸传感器
    • US08810762B2
    • 2014-08-19
    • US13700818
    • 2011-05-27
    • Tatsuya KawasakiHiroshi Aichi
    • Tatsuya KawasakiHiroshi Aichi
    • G02F1/1343H01L27/15G02F1/1347G02F1/1362G02F1/133G02F1/1333G06F3/041G06F3/042
    • G02F1/13318G02F1/13338G02F1/13471G02F1/136286G06F3/0412G06F3/042H01L27/156
    • Disclosed is a display device that has a light detecting element (D1) disposed in a pixel region (1), an opening (a through hole) (19a) formed in an insulating film (19) that is disposed above the light detecting element (D1), and a transparent electrode (20) formed in the opening (19a), and that can reduce occurrence of leakage between the transparent electrode (20) and other wiring line (SL). Specifically disclosed is a display device that has an active matrix substrate (100) in which a first wiring line (SL) and a second wiring line (GL) are formed so as to cross each other, and a light detecting element (D1) disposed on a pixel region (1) in the active matrix substrate (100). The display device has a first insulating film (17) formed between the first wiring line (SL) and the second wiring line (GL), a second insulating film (19) disposed on the first insulating film (17), and a transparent electrode (20) formed above the light detecting element (D1) so as to enter a through hole (19a) formed in the second insulating film (19). The first wiring line (SL) has a discontinuous section at a part adjacent to the light detecting element, and both ends of the discontinuous section are electrically connected to each other through an auxiliary wiring line (16) disposed in the same layer as that of the second wiring line (GL).
    • 公开了一种显示装置,其具有设置在像素区域(1)中的光检测元件(D1),形成在绝缘膜(19)中的开口(通孔)(19a),该绝缘膜设置在光检测元件 D1)和形成在开口(19a)中的透明电极(20),并且可以减少透明电极(20)和其它布线(SL)之间的泄漏发生。 具体公开了一种具有有源矩阵基板(100)的显示装置,其中第一布线(SL)和第二布线(GL)形成为彼此交叉,并且设置有光检测元件(D1) 在有源矩阵基板(100)中的像素区域(1)上。 显示装置具有形成在第一布线(SL)和第二布线(GL)之间的第一绝缘膜(17),设置在第一绝缘膜(17)上的第二绝缘膜(19)和透明电极 (20)形成在光检测元件(D1)上方,以进入形成在第二绝缘膜(19)中的通孔(19a)。 第一布线(SL)在与光检测元件相邻的部分处具有不连续部分,并且不连续部分的两端通过与布置在相同层中的辅助布线(16)彼此电连接, 第二布线(GL)。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE AND DISPLAY DEVICE EQUIPPED WITH SAME
    • 具有相同功能的半导体器件和显示器件
    • US20130082267A1
    • 2013-04-04
    • US13703248
    • 2011-06-14
    • Hiroshi Aichi
    • Hiroshi Aichi
    • H01L29/786
    • H01L29/786H01L27/1214H01L27/1446
    • Disclosed is a semiconductor device 1000 including a substrate 1, a thin film diode 100 that is supported by the substrate 1 and has a first semiconductor layer 10 having a light-receiving region 10i, a thin film transistor 200 that is supported by the substrate 1 and has a second semiconductor layer 20, and a metal layer 22a that has an inclined surface 23 that is inclined to the surface of the substrate 1, in which the thin film diode 100 can detect light that enters the light-receiving region 10i and has a prescribed wavelength, in which both the first semiconductor layer 10 and the second semiconductor layer 20 are composed of the same semiconductor film, and in which the inclined surface 23 of the metal layer 22a faces at least a part of the side faces 3R and 3L of the first semiconductor layer 10. This constitution enables an increase in the amount of light absorbed by the thin film diode and an improvement in the effective light reception sensitivity of an optical sensor part.
    • 公开了一种半导体器件1000,其包括基板1,薄膜二极管100,其被基板1支撑并具有由受光区域10i构成的第一半导体层10,由基板1支撑的薄膜晶体管200 并且具有第二半导体层20和具有与基板1的表面倾斜的倾斜表面23的金属层22a,其中薄膜二极管100可以检测进入光接收区域10i的光并且具有 其中第一半导体层10和第二半导体层20都由相同的半导体膜组成,其中金属层22a的倾斜表面23面向至少一部分侧面3R和3L的规定波长 这种结构使得能够增加由薄膜二极管吸收的光量并提高光学传感器部件的有效光接收灵敏度。
    • 6. 发明授权
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US08766337B2
    • 2014-07-01
    • US13512034
    • 2010-11-24
    • Hiroshi Aichi
    • Hiroshi Aichi
    • H01L31/062H01L27/146G02F1/1368H01L29/786G06F3/041
    • G02F1/1368G06F3/0412H01L27/14621H01L27/14623H01L27/14645H01L27/14678H01L29/78633
    • A first thin film diode (100A) has a first semiconductor layer (10A) and a first light blocking layer (12A) disposed on the substrate side of the first semiconductor layer. A second thin film diode (100B) has a second semiconductor layer (10B) and a second light blocking layer (12B) disposed on the substrate side of the second semiconductor layer. An insulating film (14) is formed between the first semiconductor layer (10A) and the first light blocking layer (12A) and between the second semiconductor layer (10B) and the second light blocking layer (12B). A thickness D1 of a portion of the insulating film (14) positioned between the first semiconductor layer (10A) and the first light blocking layer (12A) is different from a thickness D2 of a portion of the insulating film (14) positioned between the second semiconductor layer (10B) and the second light blocking layer (12B). The intensity of light in a first wavelength region incident on the first semiconductor layer (10A) is higher than the intensity of light in the first wavelength region incident on the second semiconductor layer (10B). The intensity of light in a second wavelength region including a wavelength longer than the maximum wavelength of the first wavelength region incident on the second semiconductor layer (10B) is higher than the intensity of light in the second wavelength region incident on the first semiconductor layer (10A).
    • 第一薄膜二极管(100A)具有设置在第一半导体层的基板侧上的第一半导体层(10A)和第一遮光层(12A)。 第二薄膜二极管(100B)具有设置在第二半导体层的基板侧上的第二半导体层(10B)和第二遮光层(12B)。 在第一半导体层(10A)和第一遮光层(12A)之间以及第二半导体层(10B)和第二遮光层(12B)之间形成绝缘膜(14)。 位于第一半导体层(10A)和第一遮光层(12A)之间的绝缘膜(14)的一部分的厚度D1不同于绝缘膜(14)的位于第一半导体层 第二半导体层(10B)和第二遮光层(12B)。 入射在第一半导体层(10A)上的第一波长区域的光的强度高于入射在第二半导体层(10B)上的第一波长区域中的光的强度。 包括入射在第二半导体层(10B)上的比第一波长区域的最大波长长的波长的第二波长区域的光的强度高于入射在第一半导体层上的第二波长区域的光的强度( 10A)。
    • 8. 发明授权
    • Semiconductor device and display device equipped with same
    • 半导体装置及其配备的显示装置
    • US09018631B2
    • 2015-04-28
    • US13703248
    • 2011-06-14
    • Hiroshi Aichi
    • Hiroshi Aichi
    • H01L29/786H01L27/12H01L27/144
    • H01L29/786H01L27/1214H01L27/1446
    • Disclosed is a semiconductor device 1000 including a substrate 1, a thin film diode 100 that is supported by the substrate 1 and has a first semiconductor layer 10 having a light-receiving region 10i, a thin film transistor 200 that is supported by the substrate 1 and has a second semiconductor layer 20, and a metal layer 22a that has an inclined surface 23 that is inclined to the surface of the substrate 1, in which the thin film diode 100 can detect light that enters the light-receiving region 10i and has a prescribed wavelength, in which both the first semiconductor layer 10 and the second semiconductor layer 20 are composed of the same semiconductor film, and in which the inclined surface 23 of the metal layer 22a faces at least a part of the side faces 3R and 3L of the first semiconductor layer 10. This constitution enables an increase in the amount of light absorbed by the thin film diode and an improvement in the effective light reception sensitivity of an optical sensor part.
    • 公开了一种半导体器件1000,其包括基板1,薄膜二极管100,其被基板1支撑并具有由受光区域10i构成的第一半导体层10,由基板1支撑的薄膜晶体管200 并且具有第二半导体层20和具有与基板1的表面倾斜的倾斜表面23的金属层22a,其中薄膜二极管100可以检测进入光接收区域10i的光并且具有 其中第一半导体层10和第二半导体层20都由相同的半导体膜组成,其中金属层22a的倾斜表面23面向至少一部分侧面3R和3L的规定波长 这种结构使得能够增加由薄膜二极管吸收的光量并提高光学传感器部件的有效光接收灵敏度。
    • 9. 发明申请
    • DISPLAY DEVICE EQUIPPED WITH TOUCH SENSOR
    • 显示设备配有触摸传感器
    • US20130083258A1
    • 2013-04-04
    • US13700818
    • 2011-05-27
    • Tatsuya KawasakiHiroshi Aichi
    • Tatsuya KawasakiHiroshi Aichi
    • G02F1/133H01L27/15
    • G02F1/13318G02F1/13338G02F1/13471G02F1/136286G06F3/0412G06F3/042H01L27/156
    • Disclosed is a display device that has a light detecting element (D1) disposed in a pixel region (1), an opening (a through hole) (19a) formed in an insulating film (19) that is disposed above the light detecting element (D1), and a transparent electrode (20) formed in the opening (19a), and that can reduce occurrence of leakage between the transparent electrode (20) and other wiring line (SL). Specifically disclosed is a display device that has an active matrix substrate (100) in which a first wiring line (SL) and a second wiring line (GL) are formed so as to cross each other, and a light detecting element (D1) disposed on a pixel region (1) in the active matrix substrate (100). The display device has a first insulating film (17) formed between the first wiring line (SL) and the second wiring line (GL), a second insulating film (19) disposed on the first insulating film (17), and a transparent electrode (20) formed above the light detecting element (D1) so as to enter a through hole (19a) formed in the second insulating film (19). The first wiring line (SL) has a discontinuous section at a part adjacent to the light detecting element, and both ends of the discontinuous section are electrically connected to each other through an auxiliary wiring line (16) disposed in the same layer as that of the second wiring line (GL).
    • 公开了一种显示装置,其具有设置在像素区域(1)中的光检测元件(D1),形成在绝缘膜(19)中的开口(通孔)(19a),该绝缘膜设置在光检测元件 D1)和形成在开口(19a)中的透明电极(20),并且可以减少透明电极(20)和其它布线(SL)之间的泄漏发生。 具体公开了一种具有有源矩阵基板(100)的显示装置,其中第一布线(SL)和第二布线(GL)形成为彼此交叉,并且设置有光检测元件(D1) 在有源矩阵基板(100)中的像素区域(1)上。 显示装置具有形成在第一布线(SL)和第二布线(GL)之间的第一绝缘膜(17),设置在第一绝缘膜(17)上的第二绝缘膜(19)和透明电极 (20)形成在光检测元件(D1)上方,以进入形成在第二绝缘膜(19)中的通孔(19a)。 第一布线(SL)在与光检测元件相邻的部分处具有不连续部分,并且不连续部分的两端通过与布置在相同层中的辅助布线(16)彼此电连接, 第二布线(GL)。
    • 10. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • US20120241825A1
    • 2012-09-27
    • US13512034
    • 2010-11-24
    • Hiroshi Aichi
    • Hiroshi Aichi
    • H01L31/113H01L31/18
    • G02F1/1368G06F3/0412H01L27/14621H01L27/14623H01L27/14645H01L27/14678H01L29/78633
    • A first thin film diode (100A) has a first semiconductor layer (10A) and a first light blocking layer (12A) disposed on the substrate side of the first semiconductor layer. A second thin film diode (100B) has a second semiconductor layer (10B) and a second light blocking layer (12B) disposed on the substrate side of the second semiconductor layer. An insulating film (14) is formed between the first semiconductor layer (10A) and the first light blocking layer (12A) and between the second semiconductor layer (10B) and the second light blocking layer (12B). A thickness D1 of a portion of the insulating film (14) positioned between the first semiconductor layer (10A) and the first light blocking layer (12A) is different from a thickness D2 of a portion of the insulating film (14) positioned between the second semiconductor layer (10B) and the second light blocking layer (12B). The intensity of light in a first wavelength region incident on the first semiconductor layer (10A) is higher than the intensity of light in the first wavelength region incident on the second semiconductor layer (10B). The intensity of light in a second wavelength region including a wavelength longer than the maximum wavelength of the first wavelength region incident on the second semiconductor layer (10B) is higher than the intensity of light in the second wavelength region incident on the first semiconductor layer (10A).
    • 第一薄膜二极管(100A)具有设置在第一半导体层的基板侧上的第一半导体层(10A)和第一遮光层(12A)。 第二薄膜二极管(100B)具有设置在第二半导体层的基板侧上的第二半导体层(10B)和第二遮光层(12B)。 在第一半导体层(10A)和第一遮光层(12A)之间以及第二半导体层(10B)和第二遮光层(12B)之间形成绝缘膜(14)。 位于第一半导体层(10A)和第一遮光层(12A)之间的绝缘膜(14)的一部分的厚度D1不同于绝缘膜(14)的位于第一半导体层 第二半导体层(10B)和第二遮光层(12B)。 入射在第一半导体层(10A)上的第一波长区域的光的强度高于入射在第二半导体层(10B)上的第一波长区域中的光的强度。 包括入射在第二半导体层(10B)上的比第一波长区域的最大波长长的波长的第二波长区域的光的强度高于入射在第一半导体层上的第二波长区域的光的强度( 10A)。