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    • 3. 发明授权
    • Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing
    • 用于区分多个激光束的反射用于半导体结构处理的校准的系统和方法
    • US08110775B2
    • 2012-02-07
    • US11499394
    • 2006-08-03
    • Ho Wai LoDavid Martin HemenwayBrady NilsenKelly J. Bruland
    • Ho Wai LoDavid Martin HemenwayBrady NilsenKelly J. Bruland
    • B23K26/04
    • H01L23/5258G11C17/14G11C17/143H01L2924/0002H01L2924/00
    • A system determines relative positions of a semiconductor substrate and a plurality of laser beam spots on or within the semiconductor substrate in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system comprises a laser source, first and second laser beam propagation paths, first and second reflection sensors, and a processor. The laser source produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor is configured to determine, based on the reflection signals, positions of the spots on or within the substrate.
    • 系统确定半导体衬底和机器中半导体衬底上或半导体衬底内的多个激光束点的相对位置,用于使用多个激光束选择性地照射衬底上或衬底内的结构。 该系统包括激光源,第一和第二激光束传播路径,第一和第二反射传感器以及处理器。 激光源至少产生第一和第二激光束,其分别沿着第一和第二传播路径朝着衬底传播,其具有在相应的第一和第二点处与衬底相交的相应的第一和第二轴。 反射传感器被定位成检测点的反射,因为光点相对于基板移动,从而产生反射信号。 处理器被配置为基于反射信号确定基板上或内部的斑点的位置。
    • 10. 发明申请
    • Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing
    • 用于区分多个激光束的反射用于半导体结构处理的校准的系统和方法
    • US20070008534A1
    • 2007-01-11
    • US11499394
    • 2006-08-03
    • Ho LoDavid HemenwayBrady NilsenKelly Bruland
    • Ho LoDavid HemenwayBrady NilsenKelly Bruland
    • G01B11/00
    • H01L23/5258G11C17/14G11C17/143H01L2924/0002H01L2924/00
    • A system determines relative positions of a semiconductor substrate and a plurality of laser beam spots on or within the semiconductor substrate in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system comprises a laser source, first and second laser beam propagation paths, first and second reflection sensors, and a processor. The laser source produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor is configured to determine, based on the reflection signals, positions of the spots on or within the substrate.
    • 系统确定半导体衬底和机器中半导体衬底上或半导体衬底内的多个激光束点的相对位置,用于使用多个激光束选择性地照射衬底上或衬底内的结构。 该系统包括激光源,第一和第二激光束传播路径,第一和第二反射传感器以及处理器。 激光源至少产生第一和第二激光束,其分别沿着第一和第二传播路径朝着衬底传播,其具有在相应的第一和第二点处与衬底相交的相应的第一和第二轴。 反射传感器被定位成检测点的反射,因为光点相对于基板移动,从而产生反射信号。 处理器被配置为基于反射信号确定基板上或内部的斑点的位置。