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1. 发明申请

US20080299783A1 SYSTEMS AND METHODS FOR PROCESSING SEMICONDUCTOR STRUCTURES USING LASER PULSES LATERALLY DISTRIBUTED IN A SCANNING WINDOW 有权
标题翻译：使用在扫描窗口中分布的激光脉冲处理半导体结构的系统和方法
公开(公告)号：US20080299783A1
公开(公告)日：2008-12-04
申请号：US11757232
申请日：2007-06-01
申请人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
发明人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
IPC分类号： H01L21/26 , G11B11/00
CPC分类号： B23K26/0622 , B23K26/082 , B23K2101/40
摘要： Systems and methods process structures on or within a semiconductor substrate using a series of laser pulses. In one embodiment, a deflector is configured to selectively deflect the laser pulses within a processing window. The processing window is scanned over the semiconductor substrate such that a plurality of laterally spaced rows of structures simultaneously pass through the processing window. As the processing window is scanned, the deflector selectively deflects the series of laser pulses among the laterally spaced rows within the processing window. Thus, multiple rows of structures may be processed in a single scan.
摘要翻译：系统和方法使用一系列激光脉冲在半导体衬底上或内部处理结构。在一个实施例中，偏转器被配置为在处理窗口内选择性地偏转激光脉冲。在半导体衬底上扫描处理窗口，使得多个横向间隔开的行结构同时通过处理窗口。当扫描处理窗口时，偏转器选择性地偏转处理窗口内的横向间隔的行中的一系列激光脉冲。因此，可以在单次扫描中处理多行结构。

2. 发明授权

US08026158B2 Systems and methods for processing semiconductor structures using laser pulses laterally distributed in a scanning window 有权
标题翻译：使用横向分布在扫描窗口中的激光脉冲来处理半导体结构的系统和方法
公开(公告)号：US08026158B2
公开(公告)日：2011-09-27
申请号：US11757232
申请日：2007-06-01
申请人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
发明人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： B23K26/0622 , B23K26/082 , B23K2101/40
摘要： Systems and methods process structures on or within a semiconductor substrate using a series of laser pulses. In one embodiment, a deflector is configured to selectively deflect the laser pulses within a processing window. The processing window is scanned over the semiconductor substrate such that a plurality of laterally spaced rows of structures simultaneously pass through the processing window. As the processing window is scanned, the deflector selectively deflects the series of laser pulses among the laterally spaced rows within the processing window. Thus, multiple rows of structures may be processed in a single scan.
摘要翻译：系统和方法使用一系列激光脉冲在半导体衬底上或内部处理结构。在一个实施例中，偏转器被配置为在处理窗口内选择性地偏转激光脉冲。在半导体衬底上扫描处理窗口，使得多个横向间隔开的行结构同时通过处理窗口。当扫描处理窗口时，偏转器选择性地偏转处理窗口内的横向间隔的行中的一系列激光脉冲。因此，可以在单次扫描中处理多行结构。

3. 发明申请

US20110210103A1 SYSTEMS AND METHODS FOR PROCESSING SEMICONDUCTOR STRUCTURES USING LASER PULSES LATERALLY DISTRIBUTED IN A SCANNING WINDOW 审中-公开
标题翻译：使用在扫描窗口中分布的激光脉冲处理半导体结构的系统和方法
公开(公告)号：US20110210103A1
公开(公告)日：2011-09-01
申请号：US13104837
申请日：2011-05-10
申请人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
发明人： Kelly J. Bruland , Mark A. Unrath , Douglas E. Holmgren
IPC分类号： B23K26/00
CPC分类号： B23K26/0622 , B23K26/082 , B23K2101/40
摘要： Systems and methods process structures on or within a semiconductor substrate using a series of laser pulses. In one embodiment, a deflector is configured to selectively deflect the laser pulses within a processing window. The processing window is scanned over the semiconductor substrate such that a plurality of laterally spaced rows of structures simultaneously pass through the processing window. As the processing window is scanned, the deflector selectively deflects the series of laser pulses among the laterally spaced rows within the processing window. Thus, multiple rows of structures may be processed in a single scan.
摘要翻译：系统和方法使用一系列激光脉冲在半导体衬底上或内部处理结构。在一个实施例中，偏转器被配置为在处理窗口内选择性地偏转激光脉冲。在半导体衬底上扫描处理窗口，使得多个横向间隔开的行结构同时通过处理窗口。当扫描处理窗口时，偏转器选择性地偏转处理窗口内的横向间隔的行中的一系列激光脉冲。因此，可以在单次扫描中处理多行结构。

4. 发明申请

US20130163091A1 MULTIPLE BEAM COMBINER FOR LASER PROCESSING APPARATUS 有权
公开(公告)号：US20130163091A1
公开(公告)日：2013-06-27
申请号：US13715804
申请日：2012-12-14
申请人： STEPHEN MOFFATT , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： STEPHEN MOFFATT , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： G02B27/10 , G02B27/14 , G02B27/12
CPC分类号： G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
摘要： Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.

5. 发明授权

US08970963B2 Multiple beam combiner for laser processing apparatus 有权
标题翻译：用于激光加工设备的多光束组合器
公开(公告)号：US08970963B2
公开(公告)日：2015-03-03
申请号：US13715804
申请日：2012-12-14
申请人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： G02B27/12 , G02B27/10 , G02B27/14 , G02B17/08
CPC分类号： G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
摘要： Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
摘要翻译：公开了用于组合放大辐射束的装置和方法。光束组合器具有准直光学器件，其被定位成以相对于准直光学器件的光轴的恒定入射角接收多个相干辐射束。在一些实施例中，相应的入射角也可以不同。准直光学元件具有使光束准直的光学特性。光学性质可以是折射或反射的，或其组合。还可以提供收集光学器件以将多个光束引导到准直光学元件。光束组合器可以用在热处理装置中，以将多于两个的相干放大辐射束（例如激光器）组合成单个光束。

6. 发明申请

US20120325784A1 NOVEL THERMAL PROCESSING APPARATUS 审中-公开
公开(公告)号：US20120325784A1
公开(公告)日：2012-12-27
申请号：US13194552
申请日：2011-07-29
申请人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： B23K26/00
CPC分类号： H01L21/477 , B23K26/0006 , B23K26/03 , B23K26/032 , B23K26/04 , B23K26/0608 , B23K26/0622 , B23K26/08 , B23K26/127 , B23K26/354 , B23K2101/40 , B23K2103/56 , F27B5/14 , H01L21/268 , H01S3/0057
摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.

7. 发明授权

US08569187B2 Thermal processing apparatus 有权
标题翻译：热处理设备
公开(公告)号：US08569187B2
公开(公告)日：2013-10-29
申请号：US13194775
申请日：2011-07-29
申请人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： H01L21/00 , H01L21/20 , H01L21/36 , B23K26/00
CPC分类号： H01L21/477 , B23K26/0006 , B23K26/03 , B23K26/032 , B23K26/04 , B23K26/0608 , B23K26/0622 , B23K26/08 , B23K26/127 , B23K26/354 , B23K2101/40 , B23K2103/56 , F27B5/14 , H01L21/268 , H01S3/0057
摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.
摘要翻译：本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。用于光学系统的能量源通常是多个激光器，其被组合以形成能量场。

8. 发明申请

US20120329178A1 NOVEL THERMAL PROCESSING APPARATUS 有权
标题翻译：新型热处理装置
公开(公告)号：US20120329178A1
公开(公告)日：2012-12-27
申请号：US13194775
申请日：2011-07-29
申请人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： H01L21/66
CPC分类号： H01L21/477 , B23K26/0006 , B23K26/03 , B23K26/032 , B23K26/04 , B23K26/0608 , B23K26/0622 , B23K26/08 , B23K26/127 , B23K26/354 , B23K2101/40 , B23K2103/56 , F27B5/14 , H01L21/268 , H01S3/0057
摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.
摘要翻译：本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。用于光学系统的能量源通常是多个激光器，其被组合以形成能量场。

9. 发明授权

US06448568B1 Electron beam column using high numerical aperture photocathode source illumination 失效
标题翻译：电子束柱采用高数值孔径光电阴极源照明
公开(公告)号：US06448568B1
公开(公告)日：2002-09-10
申请号：US09365604
申请日：1999-07-30
申请人： Paul C. Allen , Xiaolan Chen , Douglas E. Holmgren , Samuel C. Howells
发明人： Paul C. Allen , Xiaolan Chen , Douglas E. Holmgren , Samuel C. Howells
IPC分类号： H01J4006
CPC分类号： B82Y10/00 , G03F7/70325 , G03F7/70375 , G03F7/70808 , H01J37/073 , H01J2237/3175
摘要： A lithography apparatus including both a laser beam source and an electron beam column, where the electron beam column has a support(in one embodiment a window in the column housing) having an index of refraction n. The support, having a photocathode source material disposed on its remote surface, is located in some embodiments such that the internal angle of the incident laser beam is &thgr; with respect to a line perpendicular to the remote surface. The numerical aperture of the substrate(equal to nsin &thgr;) is greater than one in one embodiment, resulting in a high resolution spot size diameter incident on the photocathode source material at the remote surface. Incident energy from the laser beam thereby emits a corresponding high resolution electron beam from the photocathode source material. Electromagnetic lens components are disposed downstream in the electron beam column to demagnify the electron beam. This apparatus allows the continuously decreasing minimum feature dimension sizes for semiconductor electron beam lithography.
摘要翻译：包括激光束源和电子束列的光刻设备，其中电子束柱具有折射率n的支撑（在一个实施例中为柱壳体中的窗口）。具有设置在其远程表面上的光电阴极源材料的支撑件位于一些实施例中，使得入射激光束的内角相对于垂直于远程表面的线是θ。在一个实施例中，衬底的数值孔径（等于nsinθ）大于一个，导致入射到远端表面的光电阴极源材料上的高分辨率光斑尺寸直径。因此来自激光束的入射能量由此从光电阴极源材料发射出相应的高分辨率电子束。电磁透镜部件设置在电子束列的下游，以使电子束缩小。该装置允许连续减小用于半导体电子束光刻的最小特征尺寸尺寸。

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