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    • 1. 发明授权
    • Process for production of silicon nitride sintered material
    • 氮化硅烧结体的制造方法
    • US5833917A
    • 1998-11-10
    • US879484
    • 1997-06-19
    • Keiichiro WatanabeYouky Bessyo
    • Keiichiro WatanabeYouky Bessyo
    • C04B35/626C04B35/584C04B35/593C03B15/02C04B35/58
    • C04B35/5935
    • In a process for producing a silicon nitride sintered material, a silicon nitride raw material powder selected from raw material powder lots such that the silicon nitride raw material powder has a dispersion .delta.N.beta..sub.1 of weight fraction of .beta.-silicon nitride, of 65% or less, is used. A process for producing a silicon nitride sintered material controls the firing conditions so that the raw material being fired gives, at any stage of firing, a dispersion .delta.N.beta..sub.2 of weight fraction of .beta.-silicon nitride, of 65% or less between the surface portion and the central portion. The first process allows for production of a silicon nitride sintered material having excellent properties in high-temperature strength, etc., at a high reproducibility and stability. The second process allows for production, of in any production batch, a silicon nitride sintered material very low in scattering of properties (e.g., density and strength) between the central portion and the surface portion.
    • 在制造氮化硅烧结体的方法中,选自原料粉末批料的氮化硅原料粉末,使得氮化硅原料粉末具有65%的氮化硅原料粉末的重量分数的分散度Nβ1, 或更少。 一种制造氮化硅烧结材料的方法控制烧制条件,使烧制的原料在任何烧成阶段得到β-硅氮化物重量分数的分散体δNβ2在65% 表面部分和中心部分。 第一种方法允许以高再现性和稳定性生产具有优异的高温强度等性能的氮化硅烧结材料。 第二种方法允许在任何生产批次中生产在中心部分和表面部分之间非常低的散射特性(例如密度和强度)的氮化硅烧结材料。