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1. 发明申请

US20110017124A1 METHOD AND EQUIPMENT FOR PRODUCING SAPPHIRE SINGLE CRYSTAL 审中-公开
标题翻译：用于生产SAPPHIRE单晶的方法和设备
公开(公告)号：US20110017124A1
公开(公告)日：2011-01-27
申请号：US12837201
申请日：2010-07-15
申请人： Keigo HOSHIKAWA , Chihiro Miyagawa , Taichi Nakamura
发明人： Keigo HOSHIKAWA , Chihiro Miyagawa , Taichi Nakamura
IPC分类号： C30B11/02 , C30B15/14
CPC分类号： C30B29/20 , C30B11/002 , Y10T117/1024
摘要： The method is capable of producing a sapphire single crystal without forming cracks and without using an expensive crucible. The method comprises the steps of: putting a seed crystal and a raw material in a crucible; setting the crucible in a cylindrical heater; heating the crucible; and producing temperature gradient in the cylindrical heater so as to sequentially crystallize a melt. The crucible is composed of a material having a specific linear expansion coefficient which is capable of preventing mutual stress, which is caused by a difference between a linear expansion coefficient of the crucible and that of the sapphire single crystal in a direction perpendicular to a growth axis thereof, from generating in the crucible and the sapphire single crystal, or which is capable of preventing deformation of the crucible without generating a crystal defect caused by the mutual stress in the sapphire single crystal.
摘要翻译：该方法能够生产蓝宝石单晶而不形成裂纹，而不使用昂贵的坩埚。该方法包括以下步骤：将晶种和原料放入坩埚中; 将坩埚放置在圆柱形加热器中; 加热坩埚; 并在圆筒形加热器中产生温度梯度，以使熔体顺序结晶。坩埚由具有特定的线性膨胀系数的材料构成，该材料能够防止由坩埚的线性膨胀系数与蓝宝石单晶垂直于成长轴的方向的线膨胀系数之间的差异引起的相互应力在坩埚和蓝宝石单晶中产生，或者能够防止坩埚变形而不产生由蓝宝石单晶中的相互应力引起的晶体缺陷。

2. 发明申请

US20110056430A1 EQUIPMENT FOR GROWING SAPPHIRE SINGLE CRYSTAL 审中-公开
标题翻译：用于生长SAPPHIRE单晶的设备
公开(公告)号：US20110056430A1
公开(公告)日：2011-03-10
申请号：US12873617
申请日：2010-09-01
申请人： Keigo HOSHIKAWA , Chihiro Miyagawa , Taichi Nakamura
发明人： Keigo HOSHIKAWA , Chihiro Miyagawa , Taichi Nakamura
IPC分类号： C30B15/14
CPC分类号： C30B29/20 , C30B11/00 , C30B11/003 , Y10T117/1068
摘要： The equipment for growing a sapphire single crystal is capable of easily improving shape accuracy and positioning accuracy of a thermal shield which influence temperature distribution in a growth furnace. The thermal shield is provided in the growth furnace and encloses the cylindrical heater so as to form a hot zone. The thermal shield is constituted by a plurality of cylindrical sections, which are vertically stacked and whose radial positions are defined by a positioning mechanism. The cylindrical sections are composed of carbon felt.
摘要翻译：用于生长蓝宝石单晶的设备能够容易地改善影响生长炉中的温度分布的热屏蔽的形状精度和定位精度。热屏蔽设置在生长炉中并包围圆柱形加热器以形成热区。热屏蔽由多个垂直堆叠的圆柱形部分构成，其径向位置由定位机构限定。圆柱形部分由碳毡组成。

3. 发明授权

US06497047B1 Flatness measuring equipment 有权
标题翻译：平整度测量设备
公开(公告)号：US06497047B1
公开(公告)日：2002-12-24
申请号：US09517836
申请日：2000-03-02
申请人： Chihiro Miyagawa , Yoshio Nakamura
发明人： Chihiro Miyagawa , Yoshio Nakamura
IPC分类号： G01B525
CPC分类号： G01B11/306
摘要： The flatness measuring equipment can highly precisely measure flatness of a surface of a large-sized planar member, e.g., an abrasive plate. In the equipment, an elongated member is provided above and parallel to the surface of the planar member to be measured. A movable member is provided to the elongated member and capable of moving along the elongated member. A distance sensor, which is provided to the movable member, measures distance between the movable member and the surface of the planar member. A laser beam source emits a laser beam, at a fixed level, toward the movable member. A light receiving sensor detects a variation of a level of the movable member with respect of the fixed level of the laser beam.
摘要翻译：平坦度测量设备可以高度精确地测量大尺寸平面构件（例如研磨板）的表面的平整度。在设备中，细长构件设置在待测量的平面构件的表面上方并平行。可动构件设置在细长构件上并且能够沿着细长构件移动。设置在可动构件上的距离传感器测量可动构件与平面构件表面之间的距离。激光束源朝向可移动部件发射固定水平的激光束。光接收传感器检测可动构件相对于激光束的固定水平的水平的变化。

4. 发明授权

US06705929B1 Cloth cleaning device and polishing machine 失效
标题翻译：布清洁装置和抛光机
公开(公告)号：US06705929B1
公开(公告)日：2004-03-16
申请号：US09716398
申请日：2000-11-20
申请人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
发明人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
IPC分类号： B24B700
CPC分类号： B24B53/017 , B08B3/024
摘要： Cloth cleaning device of a polishing machine which is capable of fully cleaning a polishing cloth including a part in the vicinity of a center roller. The cloth cleaning device includes an arm movable in a plane parallel to the polishing cloth between a first position above the polishing cloth and a second position outside of the polishing cloth. A jet nozzle is attached to the arm and directs high pressure water toward the polishing cloth. An enclosing member encloses the jet nozzle so as to prevent the high pressure water, which has been directed out from the jet nozzle, from scattering. The jet nozzle is oriented toward the center roller and the high pressure water is directed toward the part of the polishing cloth in the vicinity of the center roller when the arm moves the jet nozzle close to the center roller.
摘要翻译：能够完全清洁包括中心辊附近的部分的抛光布的抛光机的布料清洗装置。布清洁装置包括在抛光布上方的第一位置和抛光布之外的第二位置的平行于抛光布的平面中可移动的臂。喷嘴连接到臂上，并将高压水引向抛光布。封闭构件包围喷嘴，以防止从喷嘴喷出的高压水不会飞散。当喷嘴靠近中心辊移动喷嘴时，喷嘴朝向中心辊定向，高压水指向中心辊附近的抛光布的部分。

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