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1. 发明授权

US06888023B2 Process for producing pyromellitic acid 失效
标题翻译：制备均苯四酸的方法
公开(公告)号：US06888023B2
公开(公告)日：2005-05-03
申请号：US10440255
申请日：2003-05-19
申请人： Kazuo Tanaka , Hiroshi Ogawa , Ikutraro Maruki , Atsushi Okoshi
发明人： Kazuo Tanaka , Hiroshi Ogawa , Ikutraro Maruki , Atsushi Okoshi
IPC分类号： C07C51/265 , C07C51/23
CPC分类号： C07C51/265 , C07C63/313
摘要： A process for producing pyromellitic acid which comprises oxidizing 2,4,5-trimethylbenzaldehyde and/or its oxidized derivative in the presence of a catalyst containing iron, manganese and bromine, or additionally containing zirconium or cerium continuously or semi-continuously using aqueous acetic acid solvent and 0.05-2% by weight of bromide ion. The catalyst used in the present invention has high activity, and the catalyst solution has low corrosive because the reaction is performed at low bromide concentration by using a solvent of aqueous acetic acid. So pyromellitic acid is produced industrially advantageously in high yield continuously or semi-continuously which has been a major difficulty up to now.
摘要翻译：一种制备均苯四酸的方法，其包括在含铁，锰和溴的催化剂存在下氧化2,4,5-三甲基苯甲醛和/或其氧化的衍生物，或者使用乙酸水溶液连续或半连续地加入锆或铈溶剂和0.05-2重量％的溴离子。本发明中使用的催化剂具有高活性，催化剂溶液具有低腐蚀性，因为通过使用乙酸水溶液的低溴化物浓度进行反应。所以均苯四酸在工业上有利地以高产率连续或半连续地产生，这在现在是一个主要的困难。

2. 发明授权

US06458994B2 Process for producing aromatic polycarboxylic acid 失效
公开(公告)号：US06458994B2
公开(公告)日：2002-10-01
申请号：US09861629
申请日：2001-05-22
申请人： Atsushi Okoshi , Etsuo Urabe , Masashi Yabuno , Hiroshi Ogawa , Kazuo Tanaka
发明人： Atsushi Okoshi , Etsuo Urabe , Masashi Yabuno , Hiroshi Ogawa , Kazuo Tanaka
IPC分类号： C07C5116
CPC分类号： C07C51/235 , C07C63/307
摘要： A process for producing a polycarboxylic acid which comprises performing liquid phase oxidation of polyalkyl-substituted aromatic aldehyde and/or oxide derivative of polyalkyl-substituted aromatic aldehyde as raw material for oxidation with molecular oxygen at two stages in water solvent in the presence of a catalyst comprising bromine or both bromine and a heavy metal(s) at a temperature of 180 to 280 ° C., thereby producing trimellitic acid or pyromellitic acid, wherein said liquid phase oxidation is performed in a continuous operation at the first stage and in a continuous operation or in a batch operation at the second stage and a total amount of bromine in said catalyst is divided to add separately at each the first stage and the second stage.

3. 发明授权

US06472540B1 Process for producing &egr;-caprolactone 失效
标题翻译：生产ε-己内酯的方法
公开(公告)号：US06472540B1
公开(公告)日：2002-10-29
申请号：US09617547
申请日：2000-07-14
申请人： Kazuo Tanaka , Atsushi Okoshi , Hiroshi Ogawa
发明人： Kazuo Tanaka , Atsushi Okoshi , Hiroshi Ogawa
IPC分类号： C07D31304
CPC分类号： C07D313/04
摘要： What is disclosed is a process for producing &egr;-caprolactone which comprises removing impurities by distillation from a reaction mixture obtained by co-oxidation of cyclohexanone and aldehyde, wherein &egr;-caprolactone separated from a purifying column is contacted with oxygen containing gas in the presence of cobalt. High boiling point components are removed to give an acid value of lower than 0.15 mgKOH/g. Thereby, a high quality &egr;-caprolactone providing improved polymer appearance is produced advantageously on an industrial scale without repeated purifying distillations or without using expensive stabilizer or adsorbent for the improvement of color.
摘要翻译：公开的是一种生产ε-己内酯的方法，其包括通过环己酮和醛的共氧化反应获得的反应混合物中的杂质除去杂质，其中在纯化塔分离的ε-己内酯与含氧气体在存在下接触钴。除去高沸点成分，得到低于0.15mgKOH / g的酸值。因此，提供改善的聚合物外观的高品质ε-己内酯有利地在工业规模上生产，而无需重复纯化蒸馏或不使用昂贵的稳定剂或吸附剂来改善颜色。

4. 发明授权

US5994565A Process for producing purified .epsilon.-caprolactone 失效
标题翻译：纯化ε-己内酯的制备方法
公开(公告)号：US5994565A
公开(公告)日：1999-11-30
申请号：US271966
申请日：1999-03-18
申请人： Kazuo Tanaka , Atsushi Okoshi , Hiroshi Ogawa
发明人： Kazuo Tanaka , Atsushi Okoshi , Hiroshi Ogawa
IPC分类号： C07D201/16 , C07D313/04
CPC分类号： C07D313/04
摘要： A process for producing purified .epsilon.-caprolactone from an .epsilon.-caprolactone-containing reaction product produced by the oxidation of cyclohexanone comprising subjecting the .epsilon.-caprolactone-containing reaction product to an alkali-treatment in the presence of an inert gas atmosphere or to a heat treatment in the presence of an inert gas atmosphere or to a combined alkali-treatment and heat treatment, and distilling the treated reaction product.
摘要翻译：由通过环己酮氧化制备的含有ε-己内酯的反应产物制备纯化的ε-己内酯的方法，包括在含有ε-己内酯的反应产物在惰性气体气氛或热的存在下进行碱处理在惰性气体气氛的存在下进行处理或进行组合的碱处理和热处理，并蒸馏处理的反应产物。

5. 发明授权

US06579990B2 Process for producing refined pyromellitic acid and refined pyromellitic anhydride 失效
公开(公告)号：US06579990B2
公开(公告)日：2003-06-17
申请号：US09933075
申请日：2001-08-21
申请人： Kazuo Tanaka , Atsushi Okoshi , Kengi Nakaya
发明人： Kazuo Tanaka , Atsushi Okoshi , Kengi Nakaya
IPC分类号： C07D49300
CPC分类号： C07C51/56 , C07C51/43 , C07C51/573 , C07C63/313
摘要： A process for refined pyromellitic anhydride which comprises dissolving crude pyromellitic acid or crude pyromellitic anhydride in water, then cooling an aqueous solution thus obtained to perform crystallization as pyromellitic acid, then separating a crystal thus obtained from water, then anhydrating the crystal of pyromellitic acid thus separated with heating to produce pyromellitic anhydride, then vaporizing pyromellitic anhydride thus produced, cooling vapor of pyromellitic anhydride thus obtained, and thereby, recovering a refined crystal of pyromellitic anhydride.

6. 发明授权

US5895820A Process for the production of trimellitic acid and process for the production of trimellitic acid anhydride 失效
标题翻译：偏苯三酸的制备方法和偏苯三酸酐的制备方法
公开(公告)号：US5895820A
公开(公告)日：1999-04-20
申请号：US115993
申请日：1998-07-15
申请人： Kazuo Tanaka , Masashi Yabuno , Hiroshi Ogawa , Atsushi Ohkoshi
发明人： Kazuo Tanaka , Masashi Yabuno , Hiroshi Ogawa , Atsushi Ohkoshi
IPC分类号： C07C51/265 , C07C51/573
CPC分类号： C07C51/265 , C07C51/573
摘要： A process for the production of a trimellitic acid by oxidizing dialkyl aromatic aldehyde and/or its oxide derivative in a liquid phase, the oxidation being carried out in a lower aliphatic carboxylic acid solvent having a water content of 5 to 70% by weight in the presence of a catalyst containing a heavy metal and bromine or being carried out in a solvent containing a lower aliphatic carboxylic acid in the presence of a bromine-manganese catalyst system containing zirconium and/or cerium, and a process for the production of high-quality trimellitic acid anhydride from the trimellitic acid.
摘要翻译：通过在液相中氧化二烷基芳族醛和/或其氧化物衍生物来生产偏苯三酸的方法，该氧化是在含水量为5-70重量％的低级脂族羧酸溶剂中进行的在含有锆和/或铈的溴 - 锰催化剂体系的存在下，存在含有重金属和溴的催化剂或在含有低级脂肪族羧酸的溶剂中进行的催化剂，以及生产高质量的方法偏苯三酸的偏苯三酸酐。

7. 发明授权

US06410753B1 Process for producing trimellitic anhydride 有权
公开(公告)号：US06410753B1
公开(公告)日：2002-06-25
申请号：US09861627
申请日：2001-05-22
申请人： Kazuo Tanaka , Hiroshi Ogawa , Ikutaro Maruki
发明人： Kazuo Tanaka , Hiroshi Ogawa , Ikutaro Maruki
IPC分类号： C07D30789
摘要： A process for producing trimellitic anhydride which comprises performing liquid phase oxidation of pseudocumene containing 5% by weight or above of dimethyl bezaldehyde as a raw material for oxidation with air in aliphatic monocarboxylic acid having 1 to 5 carbon atoms as a solvent in the presence of a catalyst comprising both each metal of cobalt, manganese and zirconium and bromine to obtain trimellitic acid and then heat dehydrating trimellitic acid thus obtained or heat treating trimellitic acid thus obtained in the presence of a catalyst comprising 10 ppm or above of Ni thereby producing trimellitic anhydride.

8. 发明授权

US6018077A Process for producing 2,6-naphthalenedicarboxylic acid 失效
标题翻译： 2,6-萘二甲酸的制备方法
公开(公告)号：US6018077A
公开(公告)日：2000-01-25
申请号：US48494
申请日：1998-03-26
申请人： Fumio Ohkoshi , Hiroshi Ogawa , Kazuo Tanaka , Masato Inari , Hiroshi Machida
发明人： Fumio Ohkoshi , Hiroshi Ogawa , Kazuo Tanaka , Masato Inari , Hiroshi Machida
IPC分类号： C07C51/265 , C07C51/16
CPC分类号： C07C51/265
摘要： A process for producing 2,6-naphthalenedicarboxylic acid comprising oxidizing 2,6-dimethylnaphthalene with a gas containing oxygen in a solvent comprising a lower aliphatic carboxylic acid in the presence of a catalyst comprising cobalt, manganese, and bromine, wherein the total amount of cobalt and manganese in the catalyst is 50 to 300 mg atom per 1 g mol of 2,6-dimethylnaphthalene, a ratio by g atom of manganese to cobalt in the catalyst is 20:1 to 4:1, and the oxidation is conducted at a temperature of 200 to 250.degree. C.; and a process as described above, wherein a mother liquor which is obtained from a slurry of a product of the oxidation via a step of solid-liquid separation is recyled to a step of oxidation after heat treatment at a temperature of 150.degree. C. or higher. In accordance with the processes, accumulation of substances which affect the oxidation adversely is prevented. Moreover, a large fraction of a mother liquor of oxidation can be recycled without decrease in the yield of the reaction, and the catalyst components and the solvent components in the mother liquor of oxidation can be utilized efficiently.
摘要翻译：一种2,6-萘二甲酸的制造方法，其特征在于，在包含钴，锰，溴的催化剂的存在下，在含有低级脂肪族羧酸的溶剂中，在含有氧的气体中，使2,6-二甲基萘氧化，催化剂中的钴和锰在每1克摩尔2,6-二甲基萘中为50〜300mg原子，催化剂中锰与钴的原子比为20：1〜4：1，氧化反应在温度为200〜250℃。和如上所述的方法，其中将通过固液分离步骤的氧化产物的浆料获得的母液在150℃的温度下再热处理至氧化步骤，或更高。根据这些方法，可以防止影响氧化的物质的积累。此外，大部分的氧化母液可以循环使用而不会降低反应的产率，并且可有效地利用氧化母液中的催化剂组分和溶剂组分。

9. 发明授权

US08973253B2 Method and apparatus for manufacturing metal plate chip resistors 有权
标题翻译：制造金属板片式电阻器的方法和装置
公开(公告)号：US08973253B2
公开(公告)日：2015-03-10
申请号：US14074858
申请日：2013-11-08
申请人： Tatsuki Hirano , Kazuo Tanaka
发明人： Tatsuki Hirano , Kazuo Tanaka
IPC分类号： H01C17/00 , H01C17/245
CPC分类号： H01C17/006 , H01C17/245
摘要： The object of the invention is to provide a method and an apparatus that allow production of metal plate chip resistors having a relatively low resistance with high accuracy and yield through simple process. The object is achieved by apparatus for manufacturing metal plate chip resistors including cutting mold for cutting intermediate product strip transversely to obtain worked product chip, ohm meter for measuring the resistance of the worked product chip, control device having a calculating part for performing a calculation using the resistance measured by the ohm meter to work out a width in which the strip is to be cut transversely so as to obtain a worked product chip of a desired resistance, and cutting width adjustor for making an adjustment so that the strip is to be cut transversely in the width obtained from the calculating part.
摘要翻译：本发明的目的是提供一种通过简单的工艺制造具有相对较低电阻的金属板片式电阻器的方法和装置，其具有高精度和高产率。该目的是通过用于制造金属板片电阻器的装置实现的，包括用于横向切割中间产品带的切割模具，以获得加工产品芯片，用于测量加工产品芯片的电阻的欧姆表，具有用于执行计算的计算部分的控制装置由欧姆计测量的电阻以横向切割条的宽度，以获得期望电阻的加工产品芯片，以及用于进行调整的切割宽度调节器，使得条被切割横向于从计算部分获得的宽度。

10. 发明授权

US08590141B2 Method and apparatus for manufacturing metal plate chip resistors 有权
标题翻译：制造金属板片式电阻器的方法和装置
公开(公告)号：US08590141B2
公开(公告)日：2013-11-26
申请号：US13196078
申请日：2011-08-02
申请人： Tatsuki Hirano , Kazuo Tanaka
发明人： Tatsuki Hirano , Kazuo Tanaka
IPC分类号： H01C17/00
CPC分类号： H01C17/006 , H01C17/245
摘要： The object of the invention is to provide a method and an apparatus that allow production of metal plate chip resistors having a relatively low resistance with high accuracy and yield through simple process. The object is achieved by apparatus 10 for manufacturing metal plate chip resistors including cutting mold 21 for cutting intermediate product strip 14 transversely to obtain worked product chip 16a, ohm meter 22 for measuring the resistance of the worked product chip 16a, control device 23 having a calculating part for performing a calculation using the resistance measured by the ohm meter 22 to work out a width in which the strip 14 is to be cut transversely so as to obtain a worked product chip of a desired resistance, and cutting width adjusting means 26, 27 for making an adjustment so that the strip 14 is to be cut transversely in the width obtained from the calculating part.
摘要翻译：本发明的目的是提供一种通过简单的工艺制造具有相对较低电阻的金属板片式电阻器的方法和装置，其具有高精度和高产率。该目的是通过用于制造金属板片式电阻器的装置10实现的，包括用于横向切割中间产品条带14的切割模具21，以获得加工产品芯片16a，用于测量加工产品芯片16a的电阻的欧姆计22，具有使用由欧姆计22测量的电阻进行计算的计算部分，以计算要横向切割条带14的宽度，以获得期望电阻的加工产品芯片;以及切割宽度调节装置26， 27，用于进行调整，使得条带14在从计算部分获得的宽度上横向切割。

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