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    • 4. 发明授权
    • Sulfonium salts
    • 锍盐
    • US07396960B2
    • 2008-07-08
    • US11724221
    • 2007-03-15
    • Jun IwabuchiYosuke Osawa
    • Jun IwabuchiYosuke Osawa
    • C07D285/00C07C319/00
    • C07C381/12C07D285/16
    • The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.
    • 本发明提供可用作光酸产生剂的锍盐,锍盐不会引起与具有酸解离性基团的光致抗蚀剂聚合物的相容性差。 锍盐由式(1)表示:其中R 1表示直链或支链C 2至C 9二价烃基; R 2至R 5中的每一个表示氢原子或直链或支链C 1至C 3烃基; R 6和R 7中的每一个表示有机基团; R 6和R 7可以连接在一起形成二价有机基团; 而X - > - 表示阴离子。
    • 5. 发明申请
    • Sulfonium salts
    • 锍盐
    • US20070219368A1
    • 2007-09-20
    • US11724221
    • 2007-03-15
    • Jun IwabuchiYosuke Osawa
    • Jun IwabuchiYosuke Osawa
    • C07D285/00C07C319/00
    • C07C381/12C07D285/16
    • The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.
    • 本发明提供可用作光酸产生剂的锍盐,锍盐不会引起与具有酸解离性基团的光致抗蚀剂聚合物的相容性差。 锍盐由式(1)表示:其中R 1表示直链或支链C 2至C 9二价烃基; R 2至R 5中的每一个表示氢原子或直链或支链C 1至C 3烃基; R 6和R 7中的每一个表示有机基团; R 6和R 7可以连接在一起形成二价有机基团; 而X - > - 表示阴离子。