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    • 2. 发明申请
    • METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    • 制造半导体器件的方法
    • US20080009089A1
    • 2008-01-10
    • US11773649
    • 2007-07-05
    • Tetsuya HAYASHIMasakatsu HOSHIYoshio SHIMOIDAHideaki TANAKAShigeharu YAMAGAMI
    • Tetsuya HAYASHIMasakatsu HOSHIYoshio SHIMOIDAHideaki TANAKAShigeharu YAMAGAMI
    • H01L21/00
    • H01L29/7828H01L29/0623H01L29/1608H01L29/267H01L29/66068
    • A semiconductor substrate made of a semiconductor material is prepared, and a hetero semiconductor region is formed on the semiconductor substrate to form a heterojunction in an interface between the hetero semiconductor region and the semiconductor substrate. The hetero semiconductor region is made of a semiconductor material having a bandgap different from that of the semiconductor material, and a part of the hetero semiconductor region includes a film thickness control portion whose film thickness is thinner than that of the other part thereof. By oxidizing the hetero semiconductor region with a thickness equal to the film thickness of the film thickness control portion, a gate insulating film adjacent to the heterojunction is formed. A gate electrode is formed on the gate insulating film. This makes it possible to manufacture a semiconductor device including the gate insulating film with a lower ON resistance, and with a higher insulating characteristic and reliability.
    • 制备由半导体材料制成的半导体衬底,并且在半导体衬底上形成异质半导体区域,以在异质半导体区域和半导体衬底之间的界面中形成异质结。 异质半导体区域由具有与半导体材料的带隙不同的带隙的半导体材料制成,并且异质半导体区域的一部分包括膜厚度比其他部分薄的膜厚控制部分。 通过以等于膜厚控制部分的膜厚的厚度氧化杂半导体区域,形成与异质结相邻的栅极绝缘膜。 在栅极绝缘膜上形成栅电极。 这使得可以制造包括具有较低导通电阻的栅极绝缘膜以及更高的绝缘特性和可靠性的半导体器件。