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    • 2. 发明申请
    • Manufacturing method of magnetic head slider, magnetic head slider and magnetic device
    • 磁头滑块,磁头滑块和磁性装置的制造方法
    • US20050231851A1
    • 2005-10-20
    • US11085051
    • 2005-03-22
    • Kazuhiro YoshidaJun ItoKan TakahashiMitsunobu Hanyu
    • Kazuhiro YoshidaJun ItoKan TakahashiMitsunobu Hanyu
    • C23F1/04G11B5/187G11B5/60G11B21/21
    • G11B5/1871G11B5/6082Y10T29/49021Y10T29/49046Y10T29/49048
    • A manufacturing method of a magnetic head slider 5 is to perform milling processes for at least three times to a slider main body 50 to form a flying surface, and thereby, the milling process is performed at variety of depths more than the number of milling processes. These three times milling process composed of: for example, a first milling processes forming a first mask on the slider main body 50 and performing a milling at a first depth; a second milling process changing the first mask to a second mask and performing the milling at a second depth, after the first milling process; and a third milling process changing the second mask to a third mask and performing the milling at a third depth, after the second milling process. Namely, a cycle of the masking, the milling, and a removal of the mask is performed three cycles, and thereby, milling surfaces with at least four varieties of heights or more can be formed easily.
    • 磁头滑块5的制造方法是对滑块主体50进行至少三次的铣削加工,以形成飞行面,从而在多个深度上进行比铣削加工次数多的铣削加工 。 这三次铣削工艺由以下部件组成:例如,在滑块主体50上形成第一掩模的第一铣削加工,并在第一深度进行铣削; 在第一研磨过程之后,将第一掩模改变为第二掩模并在第二深度进行研磨的第二研磨工艺; 以及在第二研磨过程之后,将第二掩模改变为第三掩模并在第三深度进行研磨的第三研磨工艺。 即,进行掩模,研磨和去除掩模的循环三个循环,从而可以容易地形成具有至少四种高度或更高的铣削表面。
    • 3. 发明申请
    • Flying head slider and magnetic disk apparatus
    • 飞头滑块和磁盘设备
    • US20050213253A1
    • 2005-09-29
    • US11085015
    • 2005-03-21
    • Kan TakahashiMitsunobu HanyuKazuhiro YoshidaJun Ito
    • Kan TakahashiMitsunobu HanyuKazuhiro YoshidaJun Ito
    • G11B5/60G11B15/64G11B17/32G11B21/20G11B21/21
    • G11B5/6082
    • A pair of side pads, which are arranged to face each other by having a negative pressure generating part in the direction orthogonal to an air flow direction of a slider therebetween, are made to have three or more steps, respectively. Of the respective surfaces having the plural steps, the surfaces having a highest height respectively are not subject to a milling, and the respective surfaces of having plural steps are made to gradually have a deeper cavity depth as the surface comes closer to the air inflow end. Further, it is also effective for improving the efficiency in positive pressure generation to surround the second side pad region partially by the region of the surface being not subject to the milling, and to surround the third side pad region partially by the second surface region.
    • 通过在与它们之间的滑块的空气流动方向正交的方向上具有负压产生部件而相互配置的一对侧垫分别具有三个或更多个步骤。 在具有多个台阶的各个表面中,分别具有最高高度的表面不进行研磨,并且当表面接近空气流入端时,使具有多个台阶的各个表面逐渐具有更深的腔深度 。 此外,通过部分由不经过铣削的表面的区域,以及部分地由第二表面区域包围第三侧垫区域,也能有效地提高正压力产生的效率以包围第二侧焊盘区域。
    • 4. 发明申请
    • Disk device
    • 磁盘设备
    • US20060082928A1
    • 2006-04-20
    • US11251800
    • 2005-10-18
    • Kan TakahashiKazuhiro YoshidaMitsunobu Hanyu
    • Kan TakahashiKazuhiro YoshidaMitsunobu Hanyu
    • G11B5/60
    • G11B5/6005G11B5/6082
    • A slider of a head has a negative-pressure cavity formed in a facing surface, a leading step portion and a leading pad which protrude from the facing surface and are situated on the upstream side of the negative-pressure cavity with respect to an airflow, and a trailing step portion and a trailing pad which protrude from the facing surface and are situated on the downstream side of the negative-pressure cavity with respect to the airflow. The surface area of the trailing pad accounts for 1.5% or more of the area of the disk facing surface of the slider, and at least the surface of the trailing pad is microtexured. The surface roughness of a recording medium that faces the slider is 0.8 nm or less in terms of Ra, and the head suspension applies a head load of 1 gf or more to the head.
    • 头部的滑块具有形成在相对表面中的负压腔,引导台阶部分和引导垫,其从相对表面突出并相对于气流位于负压腔的上游侧, 以及从相对表面突出并相对于气流位于负压腔的下游侧的后缘部分和后垫。 拖曳垫的表面积占滑块面对盘面的面积的1.5%以上,至少后垫的表面是微纹理的。 面向滑块的记录介质的表面粗糙度以Ra计为0.8nm以下,磁头悬架对磁头施加1gf以上的磁头负载。
    • 7. 发明授权
    • Method for manufacturing electronic component
    • 电子元件制造方法
    • US08382934B2
    • 2013-02-26
    • US13183511
    • 2011-07-15
    • Hiroki HoriguchiYuji KimuraKazuhiro Yoshida
    • Hiroki HoriguchiYuji KimuraKazuhiro Yoshida
    • B29C65/02B32B37/14
    • G01P15/18B81B2201/0235B81B2203/0118B81C1/00269G01P1/023G01P15/0802G01P15/123G01P2015/0828H01L21/50H01L23/10H01L2924/0002Y10T29/49002Y10T156/10H01L2924/00
    • A triaxial acceleration sensor which has a structure including a cover joined to a substrate including a mechanically operable functional unit to be sealed, is adapted in such a way that the joined state can be reliably obtained so as to not interfere with a displacement of the functional unit. A sealing frame is made of a heated polyimide on a periphery of an upper main surface of a substrate provided with a functional unit, and a sealing layer made of a polyimide is formed over an entire lower main surface of a cover. For integrating the substrate and the cover so as to seal the functional unit, the sealing frame and the sealing layer are joined to each other by heating and pressurizing the sealing frame and the sealing layer at a temperature that is about 50° C. to about 150° C. higher than a glass transition temperature of the polyimide while bringing the sealing frame and the sealing layer into contact with each other. In this case, a recess is formed in the vicinity of a portion of the sealing layer to be brought into contact with the sealing frame so that a bump, generated from the sealing layer which is deformed in the joining step, is prevented from protruding toward the functional unit.
    • 一种三轴加速度传感器,其具有包括接合到包括要被密封的机械可操作功能单元的基板的盖的结构,使得可以可靠地获得接合状态,以便不干扰功能的位移 单元。 密封框架由设置有功能单元的基板的上主表面的周边上的加热的聚酰亚胺制成,并且在盖的整个下主表面上形成由聚酰亚胺制成的密封层。 为了整合基板和盖以便密封功能单元,密封框架和密封层通过在约50℃到约50℃的温度下加热和加压密封框架和密封层而彼此接合 比使聚酰亚胺的玻璃化转变温度高150℃,同时使密封框和密封层相互接触。 在这种情况下,在密封层的一部分附近形成凹部以与密封框架接触,从而防止在接合步骤中变形的密封层产生的凸块朝向 功能单元。
    • 10. 发明授权
    • Semiconductor device having a dummy gate
    • 具有虚拟栅极的半导体器件
    • US08026536B2
    • 2011-09-27
    • US11391286
    • 2006-03-29
    • Kazuhiro Yoshida
    • Kazuhiro Yoshida
    • H01L23/52
    • H01L27/092H01L23/5222H01L27/0207H01L2924/0002H01L2924/00
    • A semiconductor device includes a plurality of MOS transistors, wherein each of the MOS transistors has a drain region, a pair of source regions sandwiching therebetween the drain region, and a pair of normal gates each overlying a space between the drain region and a corresponding one of the source regions. A plurality of dummy gates are provided each between adjacent two of the MOS transistors. The dummy gate electrodes are maintained at an equi-potential with the adjacent drain regions. MOS transistors include a row of pMOS transistors and nMOS transistors, wherein each of pMOS transistors and a corresponding nMOS transistor configure a CMOS gate, and a plurality of CMOS gates configure a ring oscillator.
    • 一种半导体器件包括多个MOS晶体管,其中每个MOS晶体管具有漏极区域,一对源极区域夹在它们之间的漏极区域以及一对法向栅极,每对栅极覆盖漏极区域和相应的一个漏极区域之间的空间 的源地区。 在相邻的两个MOS晶体管之间设置多个伪栅极。 虚拟栅极电极与相邻的漏极区域保持等电位。 MOS晶体管包括一行pMOS晶体管和nMOS晶体管,其中pMOS晶体管和相应的nMOS晶体管中的每一个构成CMOS栅极,并且多个CMOS栅极配置环形振荡器。