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    • 5. 发明授权
    • Norbornane skeleton structure-containing organosilicon compound and method of producing same
    • 含有降冰片烷骨架结构的有机硅化合物及其制造方法
    • US08034965B2
    • 2011-10-11
    • US12265802
    • 2008-11-06
    • Kazuhiro Tsuchida
    • Kazuhiro Tsuchida
    • C07F7/18C07F7/12
    • C07F7/12C07F7/1804
    • Disclosed are a radiation-polymerizable functional group-containing organosilicon compound, including (A) a norbornane skeleton structure, (B) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (C) a radiation-polymerizable functional group bonded to the norbornane skeleton structure, either directly or via a carbon atom, a hetero atom, or a combination thereof, and a method of producing the radiation-polymerizable functional group-containing organosilicon compound. Also disclosed are a haloalkyl group-containing organosilicon compound, including (D) a norbornane skeleton structure, (E) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (F) a haloalkyl group, which is bonded directly to the norbornane skeleton structure and either contains or does not contain a hetero atom, and a method of producing the haloalkyl group-containing organosilicon compound. These organosilicon compounds are useful as silane coupling agents having superior heat resistance stability.
    • 公开了含有(A)降冰片烷骨架结构的(A)降冰片烷骨架结构的(A)直接与降冰片烷骨架结构键合的水解性甲硅烷基的(R)可降解聚合官能团的有机硅化合物,(C) 降冰片烷骨架结构,直接或通过碳原子,杂原子或其组合,以及制造含有辐射聚合性官能团的有机硅化合物的方法。 还公开了含有卤代烷基的有机硅化合物,其包括(D)降冰片烷基骨架结构,(E)与降冰片烷骨架结构直接键合的可水解甲硅烷基,和(F)直接键合在降冰片烷上的卤代烷基 骨架结构,含有或不含杂原子,以及含有卤代烷基的有机硅化合物的制造方法。 这些有机硅化合物可用作具有优异的耐热稳定性的硅烷偶联剂。
    • 7. 发明申请
    • Photocurable and thermosetting coating composition and article having cured coating of such coating composition
    • 光固化和热固性涂料组合物和具有这种涂料组合物固化涂层的制品
    • US20080097066A1
    • 2008-04-24
    • US11976317
    • 2007-10-23
    • Kazuhiro TsuchidaMasaaki Yamaya
    • Kazuhiro TsuchidaMasaaki Yamaya
    • C08G77/04
    • C09D183/04
    • A photocurable and thermosetting coating composition which is solventless and liquid at room temperature is provided. This coating composition provides scratch resistance, crack resistance, smudge resistance, and removability of oil-base felted markers by wiping with the underlying substrate, and this coating composition contains a silicone resin represented by: (R1R2R3SiO1/2)a(R4R5SiO2/2)b(R6SiO3/2)c(SiO4/2)d(O1/2X)e   (1) wherein X is hydrogen atom or an alkyl group; R1 to R6 are respectively at least one monovalent organic group which is a monovalent aliphatic hydrocarbon group or a monovalent aromatic hydrocarbon group optionally substituted with a substituent such as a poly(hexafluoropropylene oxide) structure-containing group; a, b, d, and e are 0 or a positive number; c is a positive number; and a+b+c+d is 1. The silicone resin contains at least one group represented by: CH2═C(R7)COOCH2—   (2) wherein R7 is hydrogen atom or methyl group.
    • 提供在室温下为无溶剂且液体的光固化性和热固性涂料组合物。 该涂料组合物通过用下面的基材擦拭来提供油基毡标记物的耐刮擦性,抗裂纹性,耐污染性和可除去性,并且该涂料组合物含有由以下公式表示的硅酮树脂:<?in-line-formula description =“In “公式”end =“lead”?>(R 1)1 2 (R 4)4(R 5)2 SiO 2/2)(R (SiO 2/2/2)d(SiO 2/2/2)n(SiO 2/2/2) (1)<?in-line-formula description =“In-line Formulas”end =“tail”?>其中X是氢 原子或烷基; R 1至R 6分别为至少一个一价有机基团,其为单价脂族烃基或任选被取代基取代的单价芳族烃基,例如聚( 六氟环氧丙烷)结构基团; a,b,d和e为0或正数; c是正数; 并且a + b + c + d为1.硅树脂含有至少一个由下式表示的基团:<?in-line-formula description =“In-line Formulas”end =“lead”?> CH 2 (2)<?in-line-formula description =“In-line Formulas”end =“tail”? 其中R 7为氢原子或甲基。