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    • 9. 发明授权
    • Multilayer ceramic substrate with interlayered capacitor
    • 带层间电容器的多层陶瓷基板
    • US4567542A
    • 1986-01-28
    • US603109
    • 1984-04-23
    • Yuzo ShimadaKazuaki UtsumiTeruyuki IkedaMasanori Suzuki
    • Yuzo ShimadaKazuaki UtsumiTeruyuki IkedaMasanori Suzuki
    • H05K1/03H05K1/09H05K1/16H05K3/46H01G4/10
    • H05K3/4611H05K1/162H05K3/4629H05K1/0306H05K1/092H05K3/4688
    • A multilayer ceramic substrate with an interlayered capacitor has a large electrostatic capacity and a high flexural strength, such as 1,500 Kg/cm.sup.2 or more, and yet is manufactured at a relatively low firing or sintering temperature. A first ceramic body includes a plurality of laminated first ceramic sheets with a high dielectric constant and with a plurality of internal electrodes sandwiching the respective first ceramic sheets to form capacitors therebetween. A second ceramic body is laminated over one side of the first ceramic body and has a plurality of laminated second ceramic sheets with a low dielectric constant. A plurality of first wiring layers are sandwiched between the second ceramic sheets. A third ceramic body is laminated over the other side of the first ceramic body and has a plurality of laminated third ceramic sheets formed of the same ceramic material that is used to make the second ceramic sheets. The second and third ceramic bodies are thicker than the first ceramic body. A second embodiment of the invention is a hybrid ceramic structure made of glass-ceramic insulator layers sandwiching at least one dielectric layer with interposed circuit patterns formed thereon.
    • 具有层间电容器的多层陶瓷基板具有大的静电容量和高弯曲强度,例如1500Kg / cm 2以上,并且在相对低的烧制或烧结温度下制造。 第一陶瓷体包括具有高介电常数的多个叠层的第一陶瓷片和多个内部电极,夹着各自的第一陶瓷片以在它们之间形成电容器。 第二陶瓷体层压在第一陶瓷体的一侧上,并且具有多个具有低介电常数的叠层的第二陶瓷片。 多个第一布线层被夹在第二陶瓷片之间。 第三陶瓷体层叠在第一陶瓷体的另一侧上,并且具有由用于制造第二陶瓷片的相同陶瓷材料形成的多个叠层的第三陶瓷片。 第二陶瓷体和第三陶瓷体比第一陶瓷体厚。 本发明的第二实施例是由玻璃 - 陶瓷绝缘体层制成的混合陶瓷结构,其夹持形成在其上的插入的电路图案的至少一个电介质层。
    • 10. 发明授权
    • Multilayer substrate including layers of an alumina and
borosilicate-lead-glass ceramic material
    • 包括氧化铝和硼硅酸盐 - 铅 - 玻璃陶瓷材料层的多层衬底
    • US4536435A
    • 1985-08-20
    • US434238
    • 1982-10-14
    • Kazuaki UtsumiYuzo ShimadaMasanori SuzukiHideo Takamizawa
    • Kazuaki UtsumiYuzo ShimadaMasanori SuzukiHideo Takamizawa
    • H05K3/28B32B9/00B32B15/04B32B18/00C03C10/00H01B3/12H01L23/15H05K1/00H05K1/03H05K3/46B32B3/00
    • H01L23/15C03C10/0054H01L2924/0002H01L2924/09701H05K1/0306H05K3/4629H05K3/4676Y10S428/901Y10T428/24917Y10T428/24926
    • A multilayer glass-ceramic substrate comprises insulator layers of a composition consisting essentially of, when components are expressed as oxides in percent by weight, 40-60 percent of aluminum oxide, 1-40 percent of lead oxide, 1-30 percent of boron oxide, 2-40 percent of silicon dioxide, 0.01-25 percent of at least one oxide of chemical element(s) of Group II of the periodic table, and 0.01-10 percent of at least one oxide of Group IV element(s) except carbon, silicon, and lead. Each insulator layer may be only from 190 microns down to 10 microns thick. The substrate has a flexural strength of 2,100 kg/cm.sup.2 or more. Preferably, the Group II element(s) is magnesium, calcium, strontium, barium, and/or zinc. The Group IV element(s) is zirconium, titanium, germanium, and/or tin. When the percentages are 40-60 for aluminum oxide, 4.1-16.6 for lead oxide, 1.0-10.0 for boron oxide, 14.0-39.1 for silicon dioxide, 0.1-4.8 for magnesium oxide, 2.0-10.0 for calcium oxide, 0.05-3.0 for barium oxide, 0.01-3.0 for zirconium oxide, and 0.01-2.5 for titanium oxide, the substrate has a flexural strength of 3,000 kg/cm.sup.2 or more and an interlayer leakage current of 8 microamperes or less. Each insulator layer has a structure of a vitreous network of borosilicate-lead series glass with the interstices occupied by crystals of aluminum oxide and microcrystalline structures which are obtained by reaction of aluminum oxide and glass of the borosilicate lead series.
    • 多层玻璃陶瓷基板包括绝缘体层,其组成基本上由组分按百分比表示为氧化物,40-60%的氧化铝,1-40%的氧化铅,1-30%的氧化硼 ,2-40%的二氧化硅,0.01-25%的至少一种元素周期表第II族化学元素的氧化物和0.01-10%的至少一种IV族元素的氧化物,除了 碳,硅和铅。 每个绝缘体层可以仅为190微米至10微米厚。 基材的弯曲强度为2100公斤/厘米2以上。 优选地,II族元素是镁,钙,锶,钡和/或锌。 IV族元素是锆,钛,锗和/或锡。 当氧化铝的百分比为40-60,氧化铅为4.1-16.6,氧化硼为1.0-10.0,二氧化硅为14.0-39.1,氧化镁为0.1-4.8,氧化钙为2.0-10.0,氧化钙为0.05〜3.0 氧化钡,氧化锆为0.01-3.0,氧化钛为0.01〜2.5,基板的挠曲强度为3000kg / cm 2以上,层间漏电流为8微安以上。 每个绝缘体层具有硼硅酸盐 - 铅系列玻璃的玻璃质网络的结构,其中通过氧化铝和硼硅酸铅系列的玻璃的反应获得氧化铝晶体和微晶结构所占据的空隙。