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1. 发明授权

US07388215B2 Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus 失效
标题翻译：图案绘制方法，压模制造方法和图案描绘装置
公开(公告)号：US07388215B2
公开(公告)日：2008-06-17
申请号：US11457545
申请日：2006-07-14
申请人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
发明人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
IPC分类号： G21K5/10 , H01J37/30
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G11B5/82 , G11B5/855 , H01J37/3174
摘要： A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-shaped exposure area extending in a direction of rotation of the substrate from one end to the other end of the belt-shaped exposure area in the direction of rotation of the substrate, the belt-shaped exposure area being defined within a formation region, in which one of the convex or concave portions is to be formed, to thereby irradiate the drawing beam onto N generally belt-shaped irradiation areas extending in the direction of rotation of the substrate.
摘要翻译：一种图形绘制方法，其能够绘制使内周侧和外周侧的形成区域的相对端基本线性地形成的图案。拉伸梁被间歇地照射N次到沿着基板的旋转方向延伸的大致带状的曝光区域，从基板的旋转方向的带状曝光区域的一端到另一端，带形状的曝光区域被限定在其中要形成一个凸部或凹部的形成区域内，从而将拉伸光束照射到在基板的旋转方向上延伸的N个大致带状的照射区域上。

2. 发明授权

US07531103B2 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium 失效
标题翻译：掩模形成方法，掩模形成功能层，干蚀刻方法和信息记录介质的制造方法
公开(公告)号：US07531103B2
公开(公告)日：2009-05-12
申请号：US10947289
申请日：2004-09-23
申请人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
发明人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
IPC分类号： B44C1/22
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/24802
摘要： A mask forming method forms an A mask forming functional layer with an amorphous structure so as to cover an etched body, forms a B mask forming functional layer so as to cover the formed A mask forming functional layer, forms a convex/concave pattern in the formed B mask forming functional layer by carrying out a predetermined process to form a B mask on the A mask forming functional layer, and forms an A mask on the etched body by forming a convex/concave pattern in the A mask forming functional layer by dry etching the A mask forming functional layer using the B mask. By doing so, a convex/concave pattern with extremely small pattern fluctuations can be formed in the A mask forming functional layer.
摘要翻译：掩模形成方法形成具有非晶结构的A掩模形成功能层以覆盖蚀刻体，形成B掩模形成功能层，以覆盖所形成的A掩模形成功能层，在其中形成凸/凹图案通过在A掩模形成功能层上进行预定处理以形成B掩模形成B掩模形成功能层，并且通过在A掩模形成功能层中通过干燥形成凸/凹图案在蚀刻体上形成A掩模使用B掩模蚀刻形成A掩模的功能层。通过这样做，可以在A掩模形成功能层中形成具有极小图案波动的凸/凹图案。

3. 发明申请

US20070023704A1 PATTERN DRAWING METHOD, STAMPER MANUFACTURING METHOD, AND PATTERN DRAWING APPARATUS 失效
标题翻译：图案绘图方法，冲压器制造方法和图案绘图装置
公开(公告)号：US20070023704A1
公开(公告)日：2007-02-01
申请号：US11457545
申请日：2006-07-14
申请人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
发明人： Katsuyuki Nakada , Kazuhiro Hattori , Shuichi Okawa
IPC分类号： G21K5/10
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G11B5/82 , G11B5/855 , H01J37/3174
摘要： A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-shaped exposure area extending in a direction of rotation of the substrate from one end to the other end of the belt-shaped exposure area in the direction of rotation of the substrate, the belt-shaped exposure area being defined within a formation region, in which one of the convex or concave portions is to be formed, to thereby irradiate the drawing beam onto N generally belt-shaped irradiation areas extending in the direction of rotation of the substrate.
摘要翻译：一种图形绘制方法，其能够绘制使内周侧和外周侧的形成区域的相对端基本线性地形成的图案。拉伸梁被间歇地照射N次到沿着基板的旋转方向延伸的大致带状的曝光区域，从基板的旋转方向的带状曝光区域的一端到另一端，带形状的曝光区域被限定在其中要形成一个凸部或凹部的形成区域内，从而将拉伸光束照射到在基板的旋转方向上延伸的N个大致带状的照射区域上。

4. 发明授权

US07417826B2 Magnetic recording medium 失效
标题翻译：磁记录介质
公开(公告)号：US07417826B2
公开(公告)日：2008-08-26
申请号：US10805354
申请日：2004-03-22
申请人： Kazuhiro Hattori , Shuichi Okawa , Katsuyuki Nakada
发明人： Kazuhiro Hattori , Shuichi Okawa , Katsuyuki Nakada
IPC分类号： G11B5/714
CPC分类号： B82Y10/00 , G11B5/584 , G11B5/59633 , G11B5/74 , G11B5/743 , G11B5/82 , G11B5/855 , Y10T428/12465
摘要： A magnetic recording medium on which servo information is recorded efficiently with a sufficient output amplitude for favorable read accuracy of the servo information. In servo areas, a magnetic layer is separated into a plurality of servo pattern unit parts forming a predetermined servo pattern and servo pattern peripheral parts/part surrounding the servo pattern unit parts. The servo pattern unit parts and the servo pattern peripheral parts/part are formed in different sizes so as to have different magnetic properties.
摘要翻译：一种以足够的输出幅度有效地记录伺服信息的磁记录介质，以获得伺服信息的良好的读取精度。在伺服区域中，磁性层被分成形成预定的伺服模式的多个伺服图案单元部分和围绕伺服图案单元部分的伺服模式外围部分/部分。伺服图案单元部件和伺服图形周边部件/部件形成为不同的尺寸，以具有不同的磁性。

5. 发明申请

US20060269791A1 Magnetic recording medium, magnetic recording and reproducing apparatus, stamper, method of manufacturing stamper, and method of manufacturing magnetic recording medium 审中-公开
标题翻译：磁记录介质，磁记录和再现装置，压模，压模制造方法以及制造磁记录介质的方法
公开(公告)号：US20060269791A1
公开(公告)日：2006-11-30
申请号：US11442258
申请日：2006-05-30
申请人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
发明人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
IPC分类号： G11B5/86 , B05D5/12 , G11B5/64
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , G11B5/865
摘要： A magnetic recording medium which has a recording layer of concavo-convex pattern and has high production efficiency, a magnetic recording and reproducing apparatus which has the magnetic recording medium, a stamper for manufacturing the magnetic recording medium, a method of manufacturing the stamper, and a method of manufacturing the magnetic recording medium are provided. Part of servo areas of the recording layer are formed in an irregular servo concavo-convex pattern in which at least some of either concave portions or convex portions are divided in a radial direction as compared with those of a basic servo concavo-convex pattern, the basic servo concavo-convex pattern having concave portions consisting of concave unit areas corresponding to cell areas for recording either an information on 0 or an information on 1, and convex portions consisting of convex unit areas corresponding to the other cell areas for recording the other information.
摘要翻译：具有凹凸图案的记录层并且具有高生产效率的磁记录介质，具有磁记录介质的磁记录和再现装置，用于制造磁记录介质的压模，制造压模的方法和提供了制造磁记录介质的方法。记录层的伺服区域的一部分形成为不规则的伺服凹凸图案，其中与基本伺服凹凸图案相比，凹部或凸部中的至少一些在径向方向上分开，基本的伺服凹凸图案，具有由对应于用于记录关于0的信息的单元区域的凹部单元区域或与1对应的信息组成的凹部，以及由对应于其他单元区域的凸单位区域构成的凸部，用于记录其他信息。

6. 发明申请

US20050067371A1 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium 失效
标题翻译：掩模形成方法，掩模形成功能层，干蚀刻方法和信息记录介质的制造方法
公开(公告)号：US20050067371A1
公开(公告)日：2005-03-31
申请号：US10947289
申请日：2004-09-23
申请人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
发明人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
IPC分类号： G03F7/11 , B44C1/22 , C23F1/02 , C23F4/00 , G03F7/40 , G11B5/855
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/24802
摘要： A mask forming method forms an A mask forming functional layer with an amorphous structure so as to cover an etched body, forms a B mask forming functional layer so as to cover the formed A mask forming functional layer, forms a convex/concave pattern in the formed B mask forming functional layer by carrying out a predetermined process to form a B mask on the A mask forming functional layer, and forms an A mask on the etched body by forming a convex/concave pattern in the A mask forming functional layer by dry etching the A mask forming functional layer using the B mask. By doing so, a convex/concave pattern with extremely small pattern fluctuations can be formed in the A mask forming functional layer.
摘要翻译：掩模形成方法形成具有非晶结构的A掩模形成功能层以覆盖蚀刻体，形成B掩模形成功能层，以覆盖所形成的A掩模形成功能层，在其中形成凸/凹图案通过在A掩模形成功能层上进行预定处理以形成B掩模形成B掩模形成功能层，并且通过在A掩模形成功能层中通过干燥形成凸/凹图案在蚀刻体上形成A掩模使用B掩模蚀刻形成A掩模的功能层。通过这样做，可以在A掩模形成功能层中形成具有极小图案波动的凸/凹图案。

7. 发明申请

US20060275692A1 Method for forming concavo-convex pattern, method for manufacturing master disk, method for manufacturing stamper, and method for manufacturing magnetic recording medium 审中-公开
标题翻译：用于形成凹凸图案的方法，用于制造母盘的方法，用于制造压模的方法以及制造磁记录介质的方法
公开(公告)号：US20060275692A1
公开(公告)日：2006-12-07
申请号：US11445336
申请日：2006-06-02
申请人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
发明人： Shuichi Okawa , Katsuyuki Nakada , Kazuhiro Hattori , Mitsuru Takai
IPC分类号： G03C5/00
CPC分类号： G11B5/855
摘要： A method for forming a concavo-convex pattern that can form a fine and complex concavo-convex pattern such as that corresponding to servo information with high precision, a method for manufacturing a master disk, a method for manufacturing a stamper, and a method for manufacturing a magnetic recording medium using that method for forming a concavo-convex pattern are provided. A resin layer formed over a resin layer supporting member is processed into an irregular concavo-convex pattern in which a dividing convex portion is formed in a part of concave portions of a predetermined basic concavo-convex pattern and at least some of concave portions are divided as compared with corresponding concave portions of the basic concavo-convex pattern. A recording layer (the resin layer supporting member) is etched based on the resin layer to be processed into a concavo-convex pattern obtained by bringing the irregular concavo-convex pattern close to the basic concavo-convex pattern.
摘要翻译：一种用于形成能够以高精度形成与伺服信息相对应的精细复杂凹凸图案的凹凸图案的方法，制造母盘的方法，制造压模的方法，以及用于制造使用这种形成凹凸图案的方法的磁记录介质。形成在树脂层支撑构件上的树脂层被加工成不规则的凹凸图案，其中在预定的基本凹凸图案的凹部的一部分中形成有分割凸部，并且至少部分凹部被分割与基本凹凸图案的相应凹部相比较。基于要加工的树脂层将记录层（树脂层支撑构件）蚀刻成通过使不规则凹凸图案接近基本凹凸图案而获得的凹凸图案。

8. 发明申请

US20050138803A1 Stamper for pattern transfer and manufacturing method thereof 审中-公开
标题翻译：图案转印用压模及其制造方法
公开(公告)号：US20050138803A1
公开(公告)日：2005-06-30
申请号：US10974834
申请日：2004-10-28
申请人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
发明人： Shuichi Okawa , Kazuhiro Hattori , Katsuyuki Nakada , Mitsuru Takai
IPC分类号： B29C33/38 , B29L17/00 , B41C3/06 , C23F1/00 , C25D1/00 , G11B5/855 , G11B7/26 , B29C35/00 , A01J21/00 , H05K1/03
CPC分类号： G11B5/855 , B41C3/06 , G11B7/263 , Y10T29/49155
摘要： In a stamper which is used as a mold for pattern transfer, the problem is resolved in such a manner that at least the convex extreme surface of the stamper is formed of a material 110 with no crystalline peak in X-ray diffraction. Such a stamper can be manufactured by the method comprising the steps of forming a convex-concave pattern on a substrate, forming, on the convex-concave pattern, a layer of a material 110 with no crystalline peak in X-ray diffraction, and removing the layer of the material with no crystalline peak in X-ray diffraction from said substrate and convex-concave pattern in intimate contact with the layer.
摘要翻译：在用作图案转印用模具的压模中，解决了这样的问题，即，在X射线衍射中，至少压模的凸极的表面由材料110形成，没有结晶峰。这样的压模可以通过以下方法制造：包括以下步骤：在基板上形成凸凹图案，在凸凹图案上形成在X射线衍射中没有结晶峰的材料层110，以及去除在与所述基底的X射线衍射中没有结晶峰的材料层和与该层紧密接触的凸凹图案。

9. 发明申请

US20050079448A1 Method for forming resist pattern 审中-公开
标题翻译：形成抗蚀剂图案的方法
公开(公告)号：US20050079448A1
公开(公告)日：2005-04-14
申请号：US10925038
申请日：2004-08-25
申请人： Katsuyuki Nakada , Mitsuru Takai , Kazuhiro Hattori
发明人： Katsuyuki Nakada , Mitsuru Takai , Kazuhiro Hattori
IPC分类号： G03F7/09 , G03F7/00 , G03F7/20 , G11B5/84 , G11B5/855 , H01L21/027
CPC分类号： G11B5/855 , G03F7/0017
摘要： A material having an amorphous structure is used as a ground material on which a resist layer is applied. After the resist layer is irradiated with an exposure electron beam to form latent images, the latent images are developed so that a predetermined line-and-space pattern is formed in the resist layer.
摘要翻译：使用具有非晶结构的材料作为施加抗蚀剂层的研磨材料。在用曝光电子束照射抗蚀剂层以形成潜像之后，潜像显影，使得在抗蚀剂层中形成预定的线间距图案。

10. 发明授权

US07247251B2 Method for manufacturing a magnetic recording medium 失效
标题翻译：磁记录介质的制造方法
公开(公告)号：US07247251B2
公开(公告)日：2007-07-24
申请号：US11050769
申请日：2005-02-07
申请人： Kazuhiro Hattori , Shuichi Okawa , Takahiro Suwa , Mikiharu Hibi
发明人： Kazuhiro Hattori , Shuichi Okawa , Takahiro Suwa , Mikiharu Hibi
IPC分类号： H01F1/00
CPC分类号： G11B5/855 , H01F41/32
摘要： A method for manufacturing a magnetic recording medium is provided, which can efficiently manufacture a magnetic recording medium that includes a recording layer formed in a concavo-convex pattern, has a sufficiently flat surface, and provides good recording and reproduction precision. The method includes: a non-magnetic material filling step of depositing a non-magnetic material over a recording layer formed in a predetermined concavo-convex pattern over a substrate, thereby filling a concave portion of the concavo-convex pattern with the non-magnetic material; and a flattening step of removing the excess part of the non-magnetic material above the recording layer by ion beam etching to flatten the surfaces of the non-magnetic layer and the recording layer.
摘要翻译：提供了一种用于制造磁记录介质的方法，其可以有效地制造包括以凹凸图案形成的记录层的磁记录介质，具有足够平坦的表面，并且提供良好的记录和再现精度。该方法包括：非磁性材料填充步骤，将非磁性材料沉积在基板上以预定的凹凸图案形成的记录层上，从而用非磁性填充凹凸图案的凹部材料; 以及通过离子束蚀刻去除记录层上方的非磁性材料的剩余部分的平坦化步骤，以使非磁性层和记录层的表面变平。

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